SCHEMBL599290

SCHEMBL599290

Cc1ccc(C(=O)N(Cc2ccccc2)c2ccc(F)c([Ti](C3=CC=CC3)(C3=CC=CC3)c3c(F)ccc(N(Cc4ccccc4)C(=O)c4ccc(C)cc4)c3F)c2F)cc1

nearest known ligand 0.41

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
RAB9A P51151 2/20 0.36
NPC1 O15118 2/20 0.36
KMT2A Q03164 3/20 0.36
ALDH1A1 P00352 1/20 0.35
LMNA P02545 1/20 0.35
GAA P10253 1/20 0.35
MAPT P10636 1/20 0.35
HPGD P15428 1/20 0.35
SMN1; SMN2 Q16637 1/20 0.35
MEN1 O00255 2/20 0.34
CNR2 P34972 1/20 0.34
LIMK2 P53671 1/20 0.34
TP53 P04637 1/20 0.34
TRPM8 Q7Z2W7 1/20 0.33
NR1H4 Q96RI1 1/20 0.33
PKM P14618 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL482723 0.96 KMT2A (0.34) RAB9ANPC1KMT2AALDH1A1LMNA
SCHEMBL483001 0.94 TSHR (0.37) RAB9ANPC1KMT2AGAAMEN1
SCHEMBL599345 0.92 CNR2 (0.37) RAB9ANPC1KMT2AGAAMAPT
SCHEMBL599929 0.88 NPC1 (0.35) RAB9ANPC1KMT2AALDH1A1MEN1
SCHEMBL599368 0.85 CYP1A2 (0.32) ALDH1A1PKM
SCHEMBL597724 0.85 BCHE (0.32) ALDH1A1
SCHEMBL599113 0.84 S1PR1 (0.35) ALDH1A1MAPT
SCHEMBL483042 0.83 POLB (0.40) RAB9AKMT2AALDH1A1LMNASMN1; SMN2
SCHEMBL483356 0.83 ADRA2C (0.37) KMT2ALMNAMEN1
SCHEMBL482976 0.82 LPAR1 (0.32) TRPM8

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-114402256-A Organic film, method for producing same, composition, laminate, and semiconductor device 富士胶片株式会社 2022-04-26 CN disclosed
US-8114569-B2 Maskless photopolymer exposure process and apparatus PHOTOCENTRIC LIMITED (GB) 2012-02-14 US disclosed
US-20090190107-A1 MASKLESS PHOTOPOLYMER EXPOSURE PROCESS AND APPARATUS PHOTOCENTRIC LIMITED (GB) 2009-07-30 US disclosed