Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP1A2 | P05177 | 1/20 | 0.32 |
| ▸ | POLB | P06746 | 1/20 | 0.32 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.32 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.32 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.32 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.32 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.31 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.31 |
| ▸ | PKM | P14618 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL599929 | 0.96 | NPC1 (0.35) | CYP1A2POLBCYP3A4CYP2C9CYP2C19 | |
| SCHEMBL597724 | 0.87 | BCHE (0.32) | ALDH1A1HSD17B10 | |
| SCHEMBL599113 | 0.86 | S1PR1 (0.35) | NPSR1ALDH1A1HSD17B10 | |
| SCHEMBL599447 | 0.85 | S1PR1 (0.33) | ALDH1A1HSD17B10 | |
| SCHEMBL599290 | 0.85 | RAB9A (0.36) | ALDH1A1PKM | |
| SCHEMBL599345 | 0.85 | CNR2 (0.37) | POLB | |
| SCHEMBL598466 | 0.84 | PDK1 (0.33) | CYP1A2CYP2C19ALDH1A1HSD17B10 | |
| SCHEMBL482723 | 0.83 | KMT2A (0.34) | ALDH1A1 | |
| SCHEMBL599437 | 0.81 | SMN1; SMN2 (0.41) | CYP1A2CYP2C9CYP2C19ALDH1A1HSD17B10 | |
| SCHEMBL482957 | 0.78 | S1PR1 (0.39) | ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8114569-B2 | Maskless photopolymer exposure process and apparatus | PHOTOCENTRIC LIMITED (GB) | 2012-02-14 | — | — | US | disclosed |
| US-20090190107-A1 | MASKLESS PHOTOPOLYMER EXPOSURE PROCESS AND APPARATUS | PHOTOCENTRIC LIMITED (GB) | 2009-07-30 | — | — | US | disclosed |