Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP1A2 | P05177 | 7/20 | 0.64 |
| ▸ | CYP3A4 | P08684 | 7/20 | 0.64 |
| ▸ | CYP2C9 | P11712 | 4/20 | 0.64 |
| ▸ | CYP2B6 | P20813 | 2/20 | 0.64 |
| ▸ | AHR | P35869 | 2/20 | 0.64 |
| ▸ | NR1I3 | Q14994 | 2/20 | 0.64 |
| ▸ | VDR | P11473 | 1/20 | 0.64 |
| ▸ | ADORA2A | P29274 | 1/20 | 0.62 |
| ▸ | CYP2D6 | P10635 | 6/20 | 0.59 |
| ▸ | MAPK1 | P28482 | 5/20 | 0.59 |
| ▸ | KMT2A | Q03164 | 4/20 | 0.59 |
| ▸ | USP2 | O75604 | 4/20 | 0.59 |
| ▸ | CYP2C19 | P33261 | 4/20 | 0.59 |
| ▸ | CLK4 | Q9HAZ1 | 4/20 | 0.59 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.59 |
| ▸ | HSD17B10 | Q99714 | 3/20 | 0.59 |
| ▸ | ALOX15 | P16050 | 2/20 | 0.59 |
| ▸ | HPGD | P15428 | 2/20 | 0.59 |
| ▸ | F2 | P00734 | 1/20 | 0.59 |
| ▸ | MAPT | P10636 | 3/20 | 0.57 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29587463 | 1.00 | CYP1A2 (0.64) | CYP1A2CYP3A4CYP2C9CYP2B6AHR | |
| SCHEMBL32679263 | 0.85 | ESR1 (0.63) | CYP1A2CYP3A4CYP2C9CYP2B6AHR | |
| SCHEMBL28364890 | 0.85 | ESR1 (0.63) | CYP1A2CYP3A4CYP2C9CYP2B6AHR | |
| SCHEMBL29043030 | 0.85 | ESR1 (0.63) | CYP1A2CYP3A4CYP2C9CYP2B6AHR | |
| SCHEMBL28669752 | 0.83 | ALOX5 (0.60) | CYP1A2CYP3A4CYP2C9CYP2B6AHR | |
| SCHEMBL602200 | 0.83 | SMN1; SMN2 (0.62) | MAPK1KMT2AUSP2ALDH1A1HSD17B10 | |
| SCHEMBL29587729 | 0.83 | SMN1; SMN2 (0.62) | MAPK1KMT2AUSP2ALDH1A1HSD17B10 | |
| SCHEMBL31061121 | 0.82 | CYP1A2 (0.63) | CYP1A2CYP3A4CYP2C9CYP2B6AHR | |
| SCHEMBL304562 | 0.81 | KDM4E (0.61) | CYP1A2CYP2C9ADORA2AKMT2ACYP2C19 | |
| SCHEMBL29834187 | 0.80 | MAPT (0.64) | CYP1A2CYP3A4CYP2C9CYP2D6KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 39 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-110357989-B | Tertiary amine photosensitizer, preparation method thereof, photosensitive resin composition containing tertiary amine photosensitizer and application of photosensitive resin composition | 常州强力电子新材料股份有限公司 | 2022-04-22 | — | — | CN | claimed |
| CN-108241259-B | Resist composition with good hole masking function and capable of directly depicting, exposing and imaging | 杭州福斯特电子材料有限公司 | 2021-08-10 | — | — | CN | claimed |
| CN-110357989-A | Tertiary amine photosensitizer, preparation method, comprising its photosensitive polymer combination and photosensitive polymer combination application | 常州强力电子新材料股份有限公司 | 2019-10-22 | — | — | CN | claimed |
| CN-109976095-A | It is a kind of directly to describe the anti-corrosion agent composition and layered product being imaged by light | 杭州福斯特应用材料股份有限公司 | 2019-07-05 | — | — | CN | claimed |
| CN-108241259-A | A kind of anti-corrosion agent composition that can directly describe exposure image with good hole masking function | 浙江福斯特新材料研究院有限公司 | 2018-07-03 | — | — | CN | claimed |
| US-5346805-A | Initiator comprising an onium compound and an acridine derivative; printing plate, resist, photomask | FUJI PHOTO FILM CO., LTD. (JP) | 1994-09-13 | — | — | US | claimed |
| US-4587200-A | Photopolymerizable composition comprising an acridine and a heterocyclic thiol compound as a photopolymerization initiator and a photographic process using said photopolymerizable composition | FUJI PHOTO FILM CO., LTD. (JP) | 1986-05-06 | — | — | US | claimed |
| CN-113156764-B | Photosensitive resin composition and resist laminate | 杭州福斯特电子材料有限公司 | 2024-04-26 | — | — | CN | disclosed |
| CN-111315828-B | Composition, cured product, optical filter, and method for producing cured product | 株式会社艾迪科 | 2023-09-29 | — | — | CN | disclosed |
| CN-112154167-B | Composition, cured product, optical filter, and method for producing cured product | 株式会社艾迪科 | 2023-08-22 | — | — | CN | disclosed |
| CN-115047714-A | Resist composition and laminate thereof | 杭州福斯特电子材料有限公司 | 2022-09-13 | — | — | CN | disclosed |
| CN-110114376-B | Curable composition, method for producing cured product, cured product thereof, and adhesive using same | 株式会社ADEKA | 2022-06-14 | — | — | CN | disclosed |
| CN-110357989-B | Tertiary amine photosensitizer, preparation method thereof, photosensitive resin composition containing tertiary amine photosensitizer and application of photosensitive resin composition | 常州强力电子新材料股份有限公司 | 2022-04-22 | — | — | CN | disclosed |
| CN-102844709-A | Photosensitive resin composition, photoresist film using same, method for forming resist pattern, and method for manufacturing printed wiring board | NICHIGO MORTON CO LTD | 2012-12-26 | — | — | CN | disclosed |
| US-20120040290-A1 | PHOTOSENSITIVE RESIN COMPOSITION, AND PHOTOSENSITIVE ELEMENT, RESIST PATTERN FORMATION METHOD AND PRINTED CIRCUIT BOARD PRODUCTION METHOD EACH UTILIZING SAME | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2012-02-16 | — | — | US | disclosed |
| CN-102341753-A | Photosensitive resin composition, and photosensitive element, resist pattern formation method and printed circuit board production method each utilizing same | HITACHI CHEMICAL CO LTD | 2012-02-01 | — | — | CN | disclosed |
| CN-101779165-A | Photosensitive resin composition and laminate thereof | ASAHI KASEI EMD CORP | 2010-07-14 | — | — | CN | disclosed |
| US-20100159691-A1 | PHOTOSENSITIVE RESIN COMPOSITION AND LAMINATE | ASAHI KASEI EMD CORPORATION (JP) | 2010-06-24 | — | — | US | disclosed |
| US-5346805-A | Initiator comprising an onium compound and an acridine derivative; printing plate, resist, photomask | FUJI PHOTO FILM CO., LTD. (JP) | 1994-09-13 | — | — | US | disclosed |
| US-4587200-A | Photopolymerizable composition comprising an acridine and a heterocyclic thiol compound as a photopolymerization initiator and a photographic process using said photopolymerizable composition | FUJI PHOTO FILM CO., LTD. (JP) | 1986-05-06 | — | — | US | disclosed |