Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SMN1; SMN2 | Q16637 | 4/20 | 0.62 |
| ▸ | TP53 | P04637 | 3/20 | 0.62 |
| ▸ | BRD4 | O60885 | 1/20 | 0.52 |
| ▸ | BRD2 | P25440 | 1/20 | 0.52 |
| ▸ | CREBBP | Q92793 | 1/20 | 0.52 |
| ▸ | ESR1 | P03372 | 2/20 | 0.51 |
| ▸ | ESR2 | Q92731 | 2/20 | 0.51 |
| ▸ | KMT2A | Q03164 | 6/20 | 0.50 |
| ▸ | MAPT | P10636 | 5/20 | 0.50 |
| ▸ | MEN1 | O00255 | 5/20 | 0.50 |
| ▸ | HPGD | P15428 | 4/20 | 0.50 |
| ▸ | KDM4E | B2RXH2 | 4/20 | 0.50 |
| ▸ | NPSR1 | Q6W5P4 | 2/20 | 0.50 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.50 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.50 |
| ▸ | POLB | P06746 | 1/20 | 0.50 |
| ▸ | OPRM1 | P35372 | 1/20 | 0.50 |
| ▸ | OPRD1 | P41143 | 1/20 | 0.50 |
| ▸ | RAD52 | P43351 | 1/20 | 0.50 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.50 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29587729 | 1.00 | SMN1; SMN2 (0.62) | SMN1; SMN2TP53BRD4BRD2CREBBP | |
| SCHEMBL600195 | 0.88 | MAPT (0.64) | SMN1; SMN2TP53ESR1ESR2KMT2A | |
| SCHEMBL29834187 | 0.88 | MAPT (0.64) | SMN1; SMN2TP53ESR1ESR2KMT2A | |
| SCHEMBL29042705 | 0.87 | ESR1 (0.58) | SMN1; SMN2TP53ESR1ESR2KMT2A | |
| SCHEMBL29587463 | 0.83 | CYP1A2 (0.64) | SMN1; SMN2TP53ESR1ESR2KMT2A | |
| SCHEMBL601233 | 0.83 | CYP1A2 (0.64) | SMN1; SMN2TP53ESR1ESR2KMT2A | |
| SCHEMBL29488297 | 0.83 | KDM4E (0.61) | SMN1; SMN2TP53ESR1ESR2KMT2A | |
| SCHEMBL600607 | 0.83 | KDM4E (0.61) | SMN1; SMN2TP53ESR1ESR2KMT2A | |
| SCHEMBL27847547 | 0.82 | FGFR1 (0.50) | SMN1; SMN2TP53BRD4BRD2CREBBP | |
| SCHEMBL30338775 | 0.78 | RXRA (0.70) | SMN1; SMN2TP53BRD4BRD2CREBBP |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 21 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-110357989-B | Tertiary amine photosensitizer, preparation method thereof, photosensitive resin composition containing tertiary amine photosensitizer and application of photosensitive resin composition | 常州强力电子新材料股份有限公司 | 2022-04-22 | — | — | CN | claimed |
| CN-108241259-B | Resist composition with good hole masking function and capable of directly depicting, exposing and imaging | 杭州福斯特电子材料有限公司 | 2021-08-10 | — | — | CN | claimed |
| US-5346805-A | Initiator comprising an onium compound and an acridine derivative; printing plate, resist, photomask | FUJI PHOTO FILM CO., LTD. (JP) | 1994-09-13 | — | — | US | claimed |
| US-4587200-A | Photopolymerizable composition comprising an acridine and a heterocyclic thiol compound as a photopolymerization initiator and a photographic process using said photopolymerizable composition | FUJI PHOTO FILM CO., LTD. (JP) | 1986-05-06 | — | — | US | claimed |
| CN-113156764-B | Photosensitive resin composition and resist laminate | 杭州福斯特电子材料有限公司 | 2024-04-26 | — | — | CN | disclosed |
| US-20230016182-A1 | EO/PO-MODIFIED 9-PHENYLACRIDINE PHOTOSENSITIZERS AND APPLICATION THEREOF | CHANGZHOU TRONLY ADVANCED ELECTRONIC MATERIALS CO., LTD. (CN) | 2023-01-19 | — | — | US | disclosed |
| CN-115047714-A | Resist composition and laminate thereof | 杭州福斯特电子材料有限公司 | 2022-09-13 | — | — | CN | disclosed |
| CN-110114376-B | Curable composition, method for producing cured product, cured product thereof, and adhesive using same | 株式会社ADEKA | 2022-06-14 | — | — | CN | disclosed |
| CN-110357989-B | Tertiary amine photosensitizer, preparation method thereof, photosensitive resin composition containing tertiary amine photosensitizer and application of photosensitive resin composition | 常州强力电子新材料股份有限公司 | 2022-04-22 | — | — | CN | disclosed |
| EP-3339331-B1 | COMPOSITION | ADEKA CORP (JP) | 2022-02-16 | — | — | EP | disclosed |
| CN-108419438-B | Coloring composition | 株式会社艾迪科 | 2021-10-01 | — | — | CN | disclosed |
| CN-108241259-B | Resist composition with good hole masking function and capable of directly depicting, exposing and imaging | 杭州福斯特电子材料有限公司 | 2021-08-10 | — | — | CN | disclosed |
| CN-112154167-A | Composition, cured product, optical filter, and method for producing cured product | 株式会社艾迪科 | 2020-12-29 | — | — | CN | disclosed |
| CN-111566173-A | Coating composition, method for curing the composition, barrier film, and method for producing cured product | 株式会社艾迪科 | 2020-08-21 | — | — | CN | disclosed |
| CN-111221215-A | Photosensitive resin composition and application thereof | 常州强力先端电子材料有限公司 | 2020-06-02 | — | — | CN | disclosed |
| WO-2020021969-A1 | COMPOSITION, CURED PRODUCT, OPTICAL FILTER, AND PRODUCTION METHOD FOR CURED PRODUCT | 株式会社ADEKA | 2020-01-30 | — | — | WO | disclosed |
| EP-3339331-A1 | COMPOSITION | Adeka Corporation (JP) | 2018-06-27 | — | — | EP | disclosed |
| US-20120040290-A1 | PHOTOSENSITIVE RESIN COMPOSITION, AND PHOTOSENSITIVE ELEMENT, RESIST PATTERN FORMATION METHOD AND PRINTED CIRCUIT BOARD PRODUCTION METHOD EACH UTILIZING SAME | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2012-02-16 | — | — | US | disclosed |
| US-20100159691-A1 | PHOTOSENSITIVE RESIN COMPOSITION AND LAMINATE | ASAHI KASEI EMD CORPORATION (JP) | 2010-06-24 | — | — | US | disclosed |
| US-5346805-A | Initiator comprising an onium compound and an acridine derivative; printing plate, resist, photomask | FUJI PHOTO FILM CO., LTD. (JP) | 1994-09-13 | — | — | US | disclosed |