SCHEMBL6002065

SCHEMBL6002065

Cc1cc(C)c(O)cc1C.Cc1cc(O)cc(C)c1C

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP3A4 P08684 6/20 0.50
ALDH1A1 P00352 4/20 0.50
ALOX15 P16050 2/20 0.50
MAPK1 P28482 2/20 0.50
MAPT P10636 2/20 0.50
KDM4E B2RXH2 1/20 0.50
CYP1A2 P05177 1/20 0.50
CYP2D6 P10635 1/20 0.50
G6PD P11413 1/20 0.50
CYP2C9 P11712 1/20 0.50
PKM P14618 1/20 0.50
HPGD P15428 1/20 0.50
ALOX12 P18054 1/20 0.50
CYP2C19 P33261 1/20 0.50
CCR6 P51684 1/20 0.50
HIF1A Q16665 1/20 0.50
NPSR1 Q6W5P4 1/20 0.50
HSD17B10 Q99714 1/20 0.50
CHRM1 P11229 1/20 0.44
MAOA P21397 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL395019 0.84 KDM4E (0.67) CYP3A4ALDH1A1ALOX15MAPK1MAPT
SCHEMBL253926 0.84 CYP3A4 (0.58) CYP3A4ALDH1A1ALOX15MAPK1CHRM1
Dimethylamine SCHEMBL4467419 0.81 ALDH1A1 (0.57) CYP3A4ALDH1A1ALOX15MAPK1MAPT
Methane SCHEMBL27301821 0.81 CYP3A4 (0.55) CYP3A4ALDH1A1ALOX15MAPK1CHRM1
SCHEMBL70123 0.78 MAPT (0.75) CYP3A4ALDH1A1ALOX15MAPK1MAPT
SCHEMBL8081031 0.76 ACHE (0.56) CYP3A4ALDH1A1ALOX15MAPK1MAPT
SCHEMBL69242 0.76 CYP3A4 (0.50) CYP3A4ALDH1A1ALOX15MAPK1MAPT
SCHEMBL29429337 0.76 CYP3A4 (0.50) CYP3A4ALDH1A1ALOX15MAPK1MAPT
SCHEMBL47929 0.74 ALDH1A1 (0.61) CYP3A4ALDH1A1ALOX15MAPK1MAPT
Diethylamine SCHEMBL11661297 0.73 CYP3A4 (0.48) CYP3A4ALDH1A1ALOX15MAPK1MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1724640-A1 POSITIVE LIGHT-SENSITIVE RESIN COMPOSITION, RELIEF PATTERN USING THE SAME, AND SOLID IMAGING ELEMENT TORAY INDUSTRIES, INC. (JP) 2006-11-22 EP disclosed