SCHEMBL601056

SCHEMBL601056

CCCOc1c2ccccc2c(OCCC)c2cc(CC)ccc12

nearest known ligand 0.45

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KIF11 P52732 1/20 0.45
CYP1A2 P05177 1/20 0.40
CYP2A6 P11509 1/20 0.40
PGR P06401 1/20 0.38
RORA P35398 1/20 0.38
RORC P51449 1/20 0.38
RORB Q92753 1/20 0.38
PTGER4 P35408 1/20 0.38
GABRP O00591 1/20 0.37
GABRD O14764 1/20 0.37
GABRA1 P14867 1/20 0.37
GABRB1 P18505 1/20 0.37
GABRG2 P18507 1/20 0.37
GABRB3 P28472 1/20 0.37
GABRA5 P31644 1/20 0.37
GABRA3 P34903 1/20 0.37
GABRA2 P47869 1/20 0.37
GABRB2 P47870 1/20 0.37
GABRA4 P48169 1/20 0.37
GABRE P78334 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL30044659 1.00 KIF11 (0.45) KIF11CYP1A2CYP2A6PGRRORA
SCHEMBL29366945 1.00 KIF11 (0.45) KIF11CYP1A2CYP2A6PGRRORA
SCHEMBL29372007 0.92 KIF11 (0.44) KIF11CYP1A2CYP2A6PGRRORA
SCHEMBL2180474 0.92 KIF11 (0.44) KIF11CYP1A2CYP2A6PGRRORA
SCHEMBL29371407 0.90 PGR (0.43) KIF11CYP1A2CYP2A6PGRRORA
SCHEMBL15512984 0.90 PGR (0.43) KIF11CYP1A2CYP2A6PGRRORA
SCHEMBL23089962 0.89 FAAH (0.42) KIF11CYP1A2CYP2A6PGRRORA
SCHEMBL23089974 0.89 FAAH (0.42) KIF11CYP1A2CYP2A6PGRRORA
SCHEMBL15513063 0.89 FAAH (0.42) KIF11CYP1A2CYP2A6PGRRORA
SCHEMBL23271961 0.89 FAAH (0.42) KIF11CYP1A2CYP2A6PGRRORA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 290 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11635688-B2 Photoimageable compositions and processes for fabrication of relief patterns on low surface energy substrates KAYAKU ADVANCED MATERIALS, INC. (US) 2023-04-25 US claimed
US-20150024326-A1 PHOTOIMAGEABLE COMPOSITIONS AND PROCESSES FOR FABRICATION OF RELIEF PATTERNS ON LOW SURFACE ENERGY SUBSTRATES KAYAKU ADVANCED MATERIALS, INC. 2015-01-22 US claimed
WO-2013134104-A2 PHOTOIMAGEABLE COMPOSITIONS AND PROCESSES FOR FABRICATION OF RELIEF PATTERNS ON LOW SURFACE ENERGY SUBSTRATES MICROCHEM CORP. (US) 2013-09-12 WO claimed
US-12624392-B2 Molecular array generation using photoresist 10X GENOMICS, INC. (US) 2026-05-12 US disclosed
US-12454637-B2 Silicone hybrid pressure sensitive adhesive and methods for its preparation and use in protective films for (opto)electronic device fabrication DOW SILICONES CORPORATION (US) 2025-10-28 US disclosed
US-20250327961-A1 POLARIZING PLATE AND OPTICAL DISPLAY APPARATUS Wuxi Hengxin Optoelectronic Materials Co., Ltd. (CN) 2025-10-23 US disclosed
EP-4516394-A2 HIGH DEFINITION MOLECULAR ARRAY FEATURE GENERATION USING PHOTORESIST 10x Genomics, Inc. (US) 2025-03-05 EP disclosed
WO-2025041519-A1 PHOTOSENSITIVE RESIN COMPOSITION AND CURED PRODUCT OF SAME 日本化薬株式会社 2025-02-27 WO disclosed
US-12189291-B2 Epoxy formulations and processes for fabrication of relief patterns on low surface energy substrates KAYAKU ADVANCED MATERIALS, INC. (US) 2025-01-07 US disclosed
EP-4481059-A2 MOLECULAR ARRAY GENERATION USING PHOTORESIST 10x Genomics, Inc. (US) 2024-12-25 EP disclosed
EP-4405094-B1 HIGH DEFINITION MOLECULAR ARRAY FEATURE GENERATION USING PHOTORESIST 10X GENOMICS INC (US) 2024-12-18 EP disclosed
US-6677390-B1 CURABLE MIXTURES COMPRISING SENSITIZERS AND HALOGEN COMPOUNDS SUCH AS 4-CARBOXYMETHOXYPHENYL-2',4',6'-TRIMETHYLPHENYL-IODONIUM HEXAFLUOROPHOSPHATE, USED AS NONTOXIC ACID GENERATORS OR CATALYSTS; QUICK SETTING NIPPON SODA CO., LTD. (JP) 2004-01-13 US disclosed
EP-0846681-B1 NOVEL SULFONIUM SALT COMPOUNDS, POLYMERIZATION INITIATOR, CURABLE COMPOSITION, AND CURING METHOD NIPPON SODA CO (JP) 2003-12-03 EP disclosed
US-6558871-B1 Photopolymerization initiator comprising at least one of diaryliodonium salt NIPPON SODA CO. LTD. (JP) 2003-05-06 US disclosed
EP-1201638-A1 PHOTOCURABLE COMPOSITION CONTAINING IODONIUM SALT COMPOUND NIPPON SODA CO., LTD. (JP) 2002-05-02 EP disclosed
US-6313188-B1 USED AS CATALYSTS FOR CATIONIC PHOTOPOLYMERIZATION NIPPON SODA CO., LTD. (JP) 2001-11-06 US disclosed
EP-1106639-A1 PHOTOCURABLE COMPOSITION CONTAINING IODONIUM SALT COMPOUND NIPPON SODA CO., LTD. (JP) 2001-06-13 EP disclosed
US-6093753-A CURABLE COMPOSITION COMPRISING A CATIONIC POLYMERIZABLE COMPOUND WHICH IS AN ALICYCLIC EPOXY COMPOUND OR A VINYL ETHER COMPOUND AND A CATIONIC POLYMERIZATION INITIATOR; PAINTS, ADHESIVES, INKS, PHOTORESISTS NIPPON SODA CO., LTD. (JP) 2000-07-25 US disclosed
EP-0927726-A1 PHOTOCATALYTIC COMPOSITION NIPPON SODA CO., LTD. (JP) 1999-07-07 EP disclosed
EP-0846681-A1 NOVEL SULFONIUM SALT COMPOUNDS, POLYMERIZATION INITIATOR, CURABLE COMPOSITION, AND CURING METHOD NIPPON SODA CO., LTD. (JP) 1998-06-10 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-12624392-B2 Molecular array generation using photoresist POLL, LIG4, LIG3 KIF11 2345/4885CYP1A2 1583/4885CYP2A6 2201/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.