SCHEMBL6011037

SCHEMBL6011037

C=C(CC(C)C1CC2CCC1O2)C(=O)O

nearest known ligand 0.33

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
TET2 Q6N021 3/20 0.33
TET3 O43151 1/20 0.33
TET1 Q8NFU7 1/20 0.33
GPBAR1 Q8TDU6 1/20 0.33
NR1H4 Q96RI1 1/20 0.33
GRIK1 P39086 1/20 0.33
GRIK2 Q13002 1/20 0.33
GRM1 Q13255 1/20 0.33
GRM2 Q14416 1/20 0.33
SLC6A4 P31645 1/20 0.32
SLC6A3 Q01959 1/20 0.32
MEN1 O00255 1/20 0.30
KMT2A Q03164 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10159703 0.71
SCHEMBL10159629 0.70
SCHEMBL92333 0.69 SLC6A3 (0.32) SLC6A4SLC6A3
SCHEMBL8108407 0.68 MEN1 (0.37) MEN1KMT2A
SCHEMBL25503784 0.68 MEN1 (0.37) MEN1KMT2A
SCHEMBL18643029 0.68 MEN1 (0.37) MEN1KMT2A
SCHEMBL25503785 0.68 MEN1 (0.37) MEN1KMT2A
SCHEMBL23494790 0.68 ALDH1A1 (0.42) TET2TET3TET1GPBAR1NR1H4
SCHEMBL676351 0.67 ALDH1A1 (0.44) TET2TET3TET1GPBAR1NR1H4
SCHEMBL92332 0.67 SLC6A4 (0.30) SLC6A4SLC6A3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1403295-B1 Ester compounds, polymers, resist compositions and patterning process SHINETSU CHEMICAL CO (JP) 2014-10-22 EP disclosed
US-7132215-B2 Ester compounds, polymers, resist compositions and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2006-11-07 US disclosed
US-20060234160-A1 Novel ester compounds, polymers, resist compositions and patterning process HASEGAWA KOJI 2006-10-19 US disclosed
US-20040068124-A1 Novel ester compounds, polymers, resist compositions and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2004-04-08 US disclosed
EP-1403295-A2 Ester compounds, polymers, resist compositions and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2004-03-31 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20040068124-A1 Novel ester compounds, polymers, resist compositions and patterning process DHCR24, EEF1D, MUS81 TET2 1713/4885TET3 660/4885TET1 488/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.