Predicted protein targets (top 19)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ESR1 | P03372 | 3/20 | 0.51 |
| ▸ | ESR2 | Q92731 | 3/20 | 0.51 |
| ▸ | KDM4E | B2RXH2 | 4/20 | 0.47 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.47 |
| ▸ | GAA | P10253 | 2/20 | 0.47 |
| ▸ | HPGD | P15428 | 2/20 | 0.47 |
| ▸ | TP53 | P04637 | 2/20 | 0.46 |
| ▸ | SMN1; SMN2 | Q16637 | 6/20 | 0.46 |
| ▸ | LMNA | P02545 | 2/20 | 0.46 |
| ▸ | MEN1 | O00255 | 2/20 | 0.46 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.46 |
| ▸ | MAPT | P10636 | 3/20 | 0.43 |
| ▸ | NPC1 | O15118 | 2/20 | 0.43 |
| ▸ | RAB9A | P51151 | 2/20 | 0.43 |
| ▸ | RXFP1 | Q9HBX9 | 1/20 | 0.43 |
| ▸ | MITF | O75030 | 1/20 | 0.43 |
| ▸ | PKM | P14618 | 1/20 | 0.43 |
| ▸ | PDE9A | O76083 | 1/20 | 0.41 |
| ▸ | POLB | P06746 | 1/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29488280 | 1.00 | ESR1 (0.51) | ESR1ESR2KDM4EALDH1A1GAA | |
| SCHEMBL600665 | 0.86 | KDM4E (0.58) | ESR1ESR2KDM4EALDH1A1GAA | |
| SCHEMBL29488287 | 0.86 | KDM4E (0.58) | ESR1ESR2KDM4EALDH1A1GAA | |
| SCHEMBL30662419 | 0.84 | TP53 (0.54) | TP53MAPTNPC1RAB9APDE9A | |
| SCHEMBL29488276 | 0.83 | DHODH (0.58) | ESR1ESR2KDM4EALDH1A1GAA | |
| SCHEMBL601489 | 0.83 | DHODH (0.58) | ESR1ESR2KDM4EALDH1A1GAA | |
| SCHEMBL5707689 | 0.81 | ESR1 (0.51) | ESR1ESR2KDM4EALDH1A1GAA | |
| SCHEMBL27651467 | 0.81 | TAAR1 (0.55) | ESR1ESR2KDM4EALDH1A1GAA | |
| SCHEMBL10906078 | 0.81 | ESR1 (0.51) | ESR1ESR2KDM4EALDH1A1GAA | |
| SCHEMBL30543802 | 0.81 | ESR1 (0.51) | ESR1ESR2KDM4EALDH1A1GAA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 22 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-5346805-A | Initiator comprising an onium compound and an acridine derivative; printing plate, resist, photomask | FUJI PHOTO FILM CO., LTD. (JP) | 1994-09-13 | — | — | US | claimed |
| US-4587200-A | Photopolymerizable composition comprising an acridine and a heterocyclic thiol compound as a photopolymerization initiator and a photographic process using said photopolymerizable composition | FUJI PHOTO FILM CO., LTD. (JP) | 1986-05-06 | — | — | US | claimed |
| US-12353130-B2 | Photosensitive resin composition and photosensitive resin multilayer body | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2025-07-08 | — | — | US | disclosed |
| WO-2025018412-A1 | PHOTOSENSITIVE ELEMENT, PHOTOSENSITIVE ELEMENT ROLL, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR FORMING CONDUCTOR PATTERN | 旭化成株式会社 | 2025-01-23 | — | — | WO | disclosed |
| US-20240408595-A1 | STRUCTURE COMPRISING MICROCHANNEL, PRODUCTION METHOD FOR SAID STRUCTURE, AND MICROCHANNEL DEVICE | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2024-12-12 | — | — | US | disclosed |
| US-12032286-B2 | Method for producing multi-layered type microchannel device using photosensitive resin laminate | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2024-07-09 | — | — | US | disclosed |
| US-20240059803-A1 | PHOTOSENSITIVE RESIN MULTILAYER BODY AND METHOD FOR PRODUCING SAME | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2024-02-22 | — | — | US | disclosed |
| US-20230375930-A1 | PHOTOSENSITIVE RESIN MULTILAYER BODY | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2023-11-23 | — | — | US | disclosed |
| WO-2023068276-A1 | STRUCTURE COMPRISING MICROCHANNEL, PRODUCTION METHOD FOR SAID STRUCTURE, AND MICROCHANNEL DEVICE | 旭化成株式会社 | 2023-04-27 | — | — | WO | disclosed |
| US-20230053900-A1 | METHOD FOR PRODUCING MULTI-LAYERED TYPE MICROCHANNEL DEVICE USING PHOTOSENITIVE RESIN LAMINATE | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2023-02-23 | — | — | US | disclosed |
| US-20220390843-A1 | PHOTOSENSITIVE RESIN COMPOSITION AND PHOTOSENSITIVE RESIN MULTILAYER BODY | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2022-12-08 | — | — | US | disclosed |
| US-20200393754-A1 | METHOD FOR PRODUCING MULTI-LAYERED TYPE MICROCHANNEL DEVICE USING PHOTOSENITIVE RESIN LAMINATE | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2020-12-17 | — | — | US | disclosed |
| CN-106393838-B | Photoresist laminated body is rolled up | 旭化成株式会社 | 2018-09-28 | — | — | CN | disclosed |
| EP-3339331-A1 | COMPOSITION | Adeka Corporation (JP) | 2018-06-27 | — | — | EP | disclosed |
| CN-106966074-A | Photoresist layered product is rolled up | 旭化成株式会社 | 2017-07-21 | — | — | CN | disclosed |
| CN-106918993-A | Photosensitive polymer combination, photoresist layered product and protection pattern formation method | 旭化成株式会社 | 2017-07-04 | — | — | CN | disclosed |
| CN-104903207-B | Photosensitive resin laminate roll | 旭化成株式会社 | 2017-04-05 | — | — | CN | disclosed |
| US-20120040290-A1 | PHOTOSENSITIVE RESIN COMPOSITION, AND PHOTOSENSITIVE ELEMENT, RESIST PATTERN FORMATION METHOD AND PRINTED CIRCUIT BOARD PRODUCTION METHOD EACH UTILIZING SAME | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2012-02-16 | — | — | US | disclosed |
| US-20100159691-A1 | PHOTOSENSITIVE RESIN COMPOSITION AND LAMINATE | ASAHI KASEI EMD CORPORATION (JP) | 2010-06-24 | — | — | US | disclosed |
| US-5346805-A | Initiator comprising an onium compound and an acridine derivative; printing plate, resist, photomask | FUJI PHOTO FILM CO., LTD. (JP) | 1994-09-13 | — | — | US | disclosed |