Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | DHODH | Q02127 | 1/20 | 0.58 |
| ▸ | HSD11B1 | P28845 | 2/20 | 0.53 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.50 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.50 |
| ▸ | GAA | P10253 | 1/20 | 0.50 |
| ▸ | HPGD | P15428 | 1/20 | 0.50 |
| ▸ | PARP1 | P09874 | 1/20 | 0.47 |
| ▸ | ESR1 | P03372 | 2/20 | 0.46 |
| ▸ | ESR2 | Q92731 | 2/20 | 0.46 |
| ▸ | PDE10A | Q9Y233 | 1/20 | 0.46 |
| ▸ | PSMB5 | P28074 | 1/20 | 0.46 |
| ▸ | TLR7 | Q9NYK1 | 1/20 | 0.45 |
| ▸ | RARB | P10826 | 1/20 | 0.45 |
| ▸ | ADORA3 | P0DMS8 | 3/20 | 0.45 |
| ▸ | NUDT1 | P36639 | 1/20 | 0.45 |
| ▸ | PDE4A | P27815 | 1/20 | 0.45 |
| ▸ | PDE4B | Q07343 | 1/20 | 0.45 |
| ▸ | PDE4C | Q08493 | 1/20 | 0.45 |
| ▸ | PDE4D | Q08499 | 1/20 | 0.45 |
| ▸ | CTSV | O60911 | 1/20 | 0.45 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL601489 | 1.00 | DHODH (0.58) | DHODHHSD11B1KDM4EALDH1A1GAA | |
| SCHEMBL10476827 | 0.94 | HSD11B1 (0.52) | DHODHHSD11B1KDM4EALDH1A1GAA | |
| SCHEMBL13156610 | 0.93 | DHODH (0.55) | DHODHHSD11B1KDM4EALDH1A1GAA | |
| SCHEMBL29488287 | 0.90 | KDM4E (0.58) | DHODHHSD11B1KDM4EALDH1A1GAA | |
| SCHEMBL600665 | 0.90 | KDM4E (0.58) | DHODHHSD11B1KDM4EALDH1A1GAA | |
| SCHEMBL29587930 | 0.83 | PSMB5 (0.49) | DHODHHSD11B1KDM4EALDH1A1GAA | |
| SCHEMBL600671 | 0.83 | PSMB5 (0.49) | DHODHHSD11B1KDM4EALDH1A1GAA | |
| SCHEMBL601192 | 0.83 | ESR1 (0.51) | KDM4EALDH1A1GAAHPGDESR1 | |
| SCHEMBL29488280 | 0.83 | ESR1 (0.51) | KDM4EALDH1A1GAAHPGDESR1 | |
| Heptane SCHEMBL27733566 | 0.83 | ESR1 (0.56) | KDM4EALDH1A1GAAHPGDESR1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 22 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-110357989-B | Tertiary amine photosensitizer, preparation method thereof, photosensitive resin composition containing tertiary amine photosensitizer and application of photosensitive resin composition | 常州强力电子新材料股份有限公司 | 2022-04-22 | — | — | CN | claimed |
| CN-120044756-A | Photosensitive resin composition | 旭化成株式会社 | 2025-05-27 | — | — | CN | disclosed |
| CN-115524922-B | Photosensitive resin composition | 旭化成株式会社 | 2025-02-18 | — | — | CN | disclosed |
| CN-119148465-A | Photosensitive resin composition, photosensitive dry film and application thereof | 杭州福斯特电子材料有限公司 | 2024-12-17 | — | — | CN | disclosed |
| CN-119024642-A | Photocurable resin composition, application thereof and photosensitive dry film resist laminate | 杭州福斯特电子材料有限公司 | 2024-11-26 | — | — | CN | disclosed |
| CN-118119565-A | Structure having micro-channel, method for manufacturing same, and micro-channel device | 旭化成株式会社 | 2024-05-31 | — | — | CN | disclosed |
| CN-113156764-B | Photosensitive resin composition and resist laminate | 杭州福斯特电子材料有限公司 | 2024-04-26 | — | — | CN | disclosed |
| CN-116981999-A | Photosensitive resin laminate and method for producing same | 旭化成株式会社 | 2023-10-31 | — | — | CN | disclosed |
| CN-111315828-B | Composition, cured product, optical filter, and method for producing cured product | 株式会社艾迪科 | 2023-09-29 | — | — | CN | disclosed |
| CN-111694218-B | Photosensitive resin composition and method for forming circuit pattern | 旭化成株式会社 | 2023-09-08 | — | — | CN | disclosed |
| CN-111596526-B | Photosensitive resin composition and photosensitive resin laminate | 旭化成株式会社 | 2023-07-25 | — | — | CN | disclosed |
| CN-116348294-A | Photosensitive resin laminate | 旭化成株式会社 | 2023-06-27 | — | — | CN | disclosed |
| CN-115524922-A | Photosensitive resin composition | 旭化成株式会社 | 2022-12-27 | — | — | CN | disclosed |
| CN-110325913-B | Photosensitive resin composition | 旭化成株式会社 | 2022-11-01 | — | — | CN | disclosed |
| CN-115047714-A | Resist composition and laminate thereof | 杭州福斯特电子材料有限公司 | 2022-09-13 | — | — | CN | disclosed |
| CN-114667487-A | Photosensitive resin composition and photosensitive resin laminate | 旭化成株式会社 | 2022-06-24 | — | — | CN | disclosed |
| CN-110114376-B | Curable composition, method for producing cured product, cured product thereof, and adhesive using same | 株式会社ADEKA | 2022-06-14 | — | — | CN | disclosed |
| WO-2022085366-A1 | PHOTOSENSITIVE RESIN MULTILAYER BODY | 旭化成株式会社 | 2022-04-28 | — | — | WO | disclosed |
| CN-110357989-B | Tertiary amine photosensitizer, preparation method thereof, photosensitive resin composition containing tertiary amine photosensitizer and application of photosensitive resin composition | 常州强力电子新材料股份有限公司 | 2022-04-22 | — | — | CN | disclosed |
| CN-114296315-A | Photosensitive resin composition | 旭化成株式会社 | 2022-04-08 | — | — | CN | disclosed |