Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4E | B2RXH2 | 5/20 | 0.58 |
| ▸ | HPGD | P15428 | 2/20 | 0.58 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.58 |
| ▸ | GAA | P10253 | 1/20 | 0.58 |
| ▸ | PDE10A | Q9Y233 | 1/20 | 0.55 |
| ▸ | ESR1 | P03372 | 2/20 | 0.49 |
| ▸ | ESR2 | Q92731 | 2/20 | 0.49 |
| ▸ | DHODH | Q02127 | 1/20 | 0.47 |
| ▸ | TSHR | P16473 | 1/20 | 0.45 |
| ▸ | ELANE | P08246 | 1/20 | 0.44 |
| ▸ | NUDT1 | P36639 | 1/20 | 0.43 |
| ▸ | APP | P05067 | 2/20 | 0.42 |
| ▸ | BCHE | P06276 | 2/20 | 0.42 |
| ▸ | ACHE | P22303 | 2/20 | 0.42 |
| ▸ | NPC1 | O15118 | 3/20 | 0.42 |
| ▸ | RAB9A | P51151 | 3/20 | 0.42 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.42 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.42 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.42 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.42 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29488287 | 1.00 | KDM4E (0.58) | KDM4EHPGDALDH1A1GAAPDE10A | |
| SCHEMBL29488276 | 0.90 | DHODH (0.58) | KDM4EHPGDALDH1A1GAAPDE10A | |
| SCHEMBL601489 | 0.90 | DHODH (0.58) | KDM4EHPGDALDH1A1GAAPDE10A | |
| SCHEMBL10476827 | 0.87 | HSD11B1 (0.52) | KDM4EHPGDALDH1A1GAADHODH | |
| SCHEMBL29488280 | 0.86 | ESR1 (0.51) | KDM4EHPGDALDH1A1GAAESR1 | |
| SCHEMBL601192 | 0.86 | ESR1 (0.51) | KDM4EHPGDALDH1A1GAAESR1 | |
| SCHEMBL13156610 | 0.84 | DHODH (0.55) | KDM4EHPGDALDH1A1GAAPDE10A | |
| SCHEMBL599894 | 0.82 | KDM4E (0.53) | KDM4EHPGDALDH1A1GAAPDE10A | |
| SCHEMBL29587943 | 0.82 | KDM4E (0.53) | KDM4EHPGDALDH1A1GAAPDE10A | |
| SCHEMBL5707689 | 0.79 | ESR1 (0.51) | KDM4EHPGDALDH1A1GAAESR1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 70 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-110357989-B | Tertiary amine photosensitizer, preparation method thereof, photosensitive resin composition containing tertiary amine photosensitizer and application of photosensitive resin composition | 常州强力电子新材料股份有限公司 | 2022-04-22 | — | — | CN | claimed |
| CN-108241259-B | Resist composition with good hole masking function and capable of directly depicting, exposing and imaging | 杭州福斯特电子材料有限公司 | 2021-08-10 | — | — | CN | claimed |
| CN-110357989-A | Tertiary amine photosensitizer, preparation method, comprising its photosensitive polymer combination and photosensitive polymer combination application | 常州强力电子新材料股份有限公司 | 2019-10-22 | — | — | CN | claimed |
| CN-109976095-A | It is a kind of directly to describe the anti-corrosion agent composition and layered product being imaged by light | 杭州福斯特应用材料股份有限公司 | 2019-07-05 | — | — | CN | claimed |
| CN-108241259-A | A kind of anti-corrosion agent composition that can directly describe exposure image with good hole masking function | 浙江福斯特新材料研究院有限公司 | 2018-07-03 | — | — | CN | claimed |
| US-5346805-A | Initiator comprising an onium compound and an acridine derivative; printing plate, resist, photomask | FUJI PHOTO FILM CO., LTD. (JP) | 1994-09-13 | — | — | US | claimed |
| US-4587200-A | Photopolymerizable composition comprising an acridine and a heterocyclic thiol compound as a photopolymerization initiator and a photographic process using said photopolymerizable composition | FUJI PHOTO FILM CO., LTD. (JP) | 1986-05-06 | — | — | US | claimed |
| US-12353130-B2 | Photosensitive resin composition and photosensitive resin multilayer body | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2025-07-08 | — | — | US | disclosed |
| WO-2025018412-A1 | PHOTOSENSITIVE ELEMENT, PHOTOSENSITIVE ELEMENT ROLL, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR FORMING CONDUCTOR PATTERN | 旭化成株式会社 | 2025-01-23 | — | — | WO | disclosed |
| US-20240408595-A1 | STRUCTURE COMPRISING MICROCHANNEL, PRODUCTION METHOD FOR SAID STRUCTURE, AND MICROCHANNEL DEVICE | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2024-12-12 | — | — | US | disclosed |
| US-12032286-B2 | Method for producing multi-layered type microchannel device using photosensitive resin laminate | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2024-07-09 | — | — | US | disclosed |
| CN-118119565-A | Structure having micro-channel, method for manufacturing same, and micro-channel device | 旭化成株式会社 | 2024-05-31 | — | — | CN | disclosed |
| CN-113156764-B | Photosensitive resin composition and resist laminate | 杭州福斯特电子材料有限公司 | 2024-04-26 | — | — | CN | disclosed |
| US-20120040290-A1 | PHOTOSENSITIVE RESIN COMPOSITION, AND PHOTOSENSITIVE ELEMENT, RESIST PATTERN FORMATION METHOD AND PRINTED CIRCUIT BOARD PRODUCTION METHOD EACH UTILIZING SAME | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2012-02-16 | — | — | US | disclosed |
| CN-102144189-A | Photosensitive resin composition, photosensitive resin laminate, method for forming resist pattern, conductive pattern, printed wiring board, lead frame, base, and method for manufacturing semiconductor package | ASAHI KASEI E MATERIALS CORP | 2011-08-03 | — | — | CN | disclosed |
| CN-1945429-B | Photosensitive resin composition and photosensitive resin laminate using the same | ASAHI KASEI DENSHI K K | 2010-06-09 | — | — | CN | disclosed |
| CN-101438208-A | Photosensitive resin composition | ASAHI KASEI EMD CORP (JP) | 2009-05-20 | — | — | CN | disclosed |
| CN-1945429-A | Photosensitive resin composition and photosensitive resin laminate using the same | ASAHI KASEI DENSHI K K (JP) | 2007-04-11 | — | — | CN | disclosed |
| US-5346805-A | Initiator comprising an onium compound and an acridine derivative; printing plate, resist, photomask | FUJI PHOTO FILM CO., LTD. (JP) | 1994-09-13 | — | — | US | disclosed |
| US-4587200-A | Photopolymerizable composition comprising an acridine and a heterocyclic thiol compound as a photopolymerization initiator and a photographic process using said photopolymerizable composition | FUJI PHOTO FILM CO., LTD. (JP) | 1986-05-06 | — | — | US | disclosed |