SCHEMBL602822

SCHEMBL602822

CCOC(=O)NCO

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18161932 0.83
SCHEMBL29834112 0.81 ACHE (0.54)
SCHEMBL7618800 0.81 GAA (0.50)
SCHEMBL149187 0.81
SCHEMBL1912605 0.80 EGLN1 (0.63)
SCHEMBL604767 0.80
SCHEMBL2651973 0.80 ALDH1A1 (0.46)
SCHEMBL499386 0.80
SCHEMBL2482646 0.80 GAA (0.59)
SCHEMBL19810523 0.79

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 143 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-4933390-A FOR ABSORBENT ARTICLES; FROM CARBOXY ACID, HYDROPHOBIC MONOMER WHICH RETARDS PREMATURE GELLING, AND REACTIVE SELF-CROSSLINKING MONOMER MCNEIL-PPC, INC., A CORP. OF NJ 1990-06-12 US claimed
EP-0206358-A2 In situ crosslinking of polyelectrolytes PERSONAL PRODUCTS COMPANY (US) 1986-12-30 EP claimed
EP-0012587-B1 THERMO-SENSITIVE MULTI-COLOR RECORDING MATERIAL AND PROCESS FOR PREPARATION THEREOF Ricoh Company, Ltd (JP) 1983-05-25 EP claimed
CN-109752923-B Photosensitive resin composition 三星显示有限公司 2025-01-17 CN disclosed
CN-108803240-B Photosensitive resin composition 株式会社东进世美肯 2024-12-03 CN disclosed
CN-115667454-B Water and oil resistant composition, method for producing same, article, and water and oil resistant paper AGC株式会社 2024-03-08 CN disclosed
CN-117342983-B Synthesis method of peracetylated GalNAc-L96 康羽生命科学技术(苏州)有限公司 2024-02-06 CN disclosed
CN-117342983-A Synthesis method of peracetylated GalNAc-L96 康羽生命科学技术(苏州)有限公司 2024-01-05 CN disclosed
CN-114846036-B Fluoropolymer, process for producing the same, water-repellent and oil-repellent composition, and article AGC株式会社 2024-01-02 CN disclosed
CN-116648671-A Negative photosensitive resin composition capable of realizing low-temperature curing and low refractive index 株式会社东进世美肯 2023-08-25 CN disclosed
CN-116510628-A Aerogel material and preparation method thereof 中国科学院苏州纳米技术与纳米仿生研究所 2023-08-01 CN disclosed
EP-0206358-A2 In situ crosslinking of polyelectrolytes PERSONAL PRODUCTS COMPANY (US) 1986-12-30 EP disclosed
US-4584014-A PREEMERGENCE HERBICIDES;CORN, WHEAT AND OATS ROHM AND HAAS COMPANY (US) 1986-04-22 US disclosed
US-4556651-A Secalonic acid derivatives as antitumor agents ASAHI KASEI KOGYO KABUSHIKI KAISHA (JP) 1985-12-03 US disclosed
EP-0064199-B1 NOVEL SECALONIC ACID DERIVATIVES AND METHOD FOR PREPARING THEREOF Asahi Kasei Kogyo Kabushiki Kaisha (JP) 1985-08-21 EP disclosed
US-4418061-A ANTITUMOR AGENTS ASAHI KASEI KOGYO KABUSHIKI KAISHA (JP) 1983-11-29 US disclosed
EP-0064199-A1 Novel secalonic acid derivatives and method for preparing thereof Asahi Kasei Kogyo Kabushiki Kaisha (JP) 1982-11-10 EP disclosed
EP-0009697-A2 Process for preparing N-(alpha-methoxy-alkyl) urethanes and N-(alpha-methoxy-alkyl) urethanes BAYER AG (DE) 1980-04-16 EP disclosed
US-4165384-A ADRENERGIC BLOCKING AGENTS, CARDIOVASCULAR DISORDERS AKTIEBOLAGET HASSLE (SE) 1979-08-21 US disclosed
US-3931112-A POLYURETHANE BAYER AKTIENGESELLSCHAFT (DT) 1976-01-06 US disclosed