Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.62 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.62 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.62 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.62 |
| ▸ | ABCB11 | O95342 | 1/20 | 0.59 |
| ▸ | POLB | P06746 | 1/20 | 0.45 |
| ▸ | TUBB4A | P04350 | 7/20 | 0.43 |
| ▸ | TUBB | P07437 | 7/20 | 0.43 |
| ▸ | TUBA3C | P0DPH7 | 7/20 | 0.43 |
| ▸ | TUBA1B | P68363 | 7/20 | 0.43 |
| ▸ | TUBA4A | P68366 | 7/20 | 0.43 |
| ▸ | TUBB4B | P68371 | 7/20 | 0.43 |
| ▸ | TUBB3 | Q13509 | 7/20 | 0.43 |
| ▸ | TUBB2A | Q13885 | 7/20 | 0.43 |
| ▸ | TUBB8 | Q3ZCM7 | 7/20 | 0.43 |
| ▸ | TUBA3E | Q6PEY2 | 7/20 | 0.43 |
| ▸ | TUBA1A | Q71U36 | 7/20 | 0.43 |
| ▸ | TUBA1C | Q9BQE3 | 7/20 | 0.43 |
| ▸ | TUBB6 | Q9BUF5 | 7/20 | 0.43 |
| ▸ | TUBB2B | Q9BVA1 | 7/20 | 0.43 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL30043104 | 1.00 | KDM4E (0.62) | KDM4EALDH1A1MAPK1SMN1; SMN2ABCB11 | |
| SCHEMBL29368971 | 1.00 | KDM4E (0.62) | KDM4EALDH1A1MAPK1SMN1; SMN2ABCB11 | |
| SCHEMBL9616219 | 0.81 | KDM4E (0.48) | KDM4EALDH1A1MAPK1SMN1; SMN2ABCB11 | |
| SCHEMBL23089904 | 0.81 | ALDH1A1 (0.48) | KDM4EALDH1A1MAPK1SMN1; SMN2ABCB11 | |
| SCHEMBL29366129 | 0.79 | ALDH1A1 (1.00) | KDM4EALDH1A1MAPK1SMN1; SMN2POLB | |
| SCHEMBL52405 | 0.79 | ALDH1A1 (1.00) | KDM4EALDH1A1MAPK1SMN1; SMN2POLB | |
| SCHEMBL30503978 | 0.79 | ATM (0.44) | KDM4EALDH1A1MAPK1SMN1; SMN2ABCB11 | |
| SCHEMBL12603982 | 0.79 | TSHR (0.44) | KDM4EALDH1A1MAPK1SMN1; SMN2ABCB11 | |
| SCHEMBL28796144 | 0.78 | ALDH1A1 (0.75) | KDM4EALDH1A1MAPK1SMN1; SMN2ABCB11 | |
| SCHEMBL29561 | 0.77 | CYP3A4 (0.53) | KDM4EALDH1A1MAPK1SMN1; SMN2ABCB11 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 118 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11635688-B2 | Photoimageable compositions and processes for fabrication of relief patterns on low surface energy substrates | KAYAKU ADVANCED MATERIALS, INC. (US) | 2023-04-25 | — | — | US | claimed |
| US-20150024326-A1 | PHOTOIMAGEABLE COMPOSITIONS AND PROCESSES FOR FABRICATION OF RELIEF PATTERNS ON LOW SURFACE ENERGY SUBSTRATES | KAYAKU ADVANCED MATERIALS, INC. | 2015-01-22 | — | — | US | claimed |
| WO-2013134104-A2 | PHOTOIMAGEABLE COMPOSITIONS AND PROCESSES FOR FABRICATION OF RELIEF PATTERNS ON LOW SURFACE ENERGY SUBSTRATES | MICROCHEM CORP. (US) | 2013-09-12 | — | — | WO | claimed |
| WO-2025041519-A1 | PHOTOSENSITIVE RESIN COMPOSITION AND CURED PRODUCT OF SAME | 日本化薬株式会社 | 2025-02-27 | — | — | WO | disclosed |
| US-12189291-B2 | Epoxy formulations and processes for fabrication of relief patterns on low surface energy substrates | KAYAKU ADVANCED MATERIALS, INC. (US) | 2025-01-07 | — | — | US | disclosed |
| US-12065521-B2 | Compound having polycyclic aromatic skeleton, and endoperoxide compound of same | KAWASAKI KASEI CHEMICALS LTD. (JP) | 2024-08-20 | — | — | US | disclosed |
| US-20240168380-A1 | Photosensitive Resin Composition And Cured Product Therefrom | NIPPON KAYAKU KABUSHIKI KAISHA (JP) | 2024-05-23 | — | — | US | disclosed |
| CN-117950266-A | Photosensitive resin composition and cured product thereof | 日本化药株式会社 | 2024-04-30 | — | — | CN | disclosed |
| CN-111406233-B | Photosensitive resin composition, dry film resist and cured product thereof | 日本化药株式会社 | 2023-12-26 | — | — | CN | disclosed |
| US-11809078-B2 | Photosensitive resin composition, dry film resist, and cured objects obtained therefrom | NIPPON KAYAKU KABUSHIKI KAISHA (JP) | 2023-11-07 | — | — | US | disclosed |
| CN-109471330-B | Photosensitive composition and photopolymerization initiator used therein | 东京应化工业株式会社 | 2023-08-29 | — | — | CN | disclosed |
| WO-2006124552-A2 | METHOD OF FORMING A PHOTORESIST ELEMENT | MICROCHEM CORP. (US) | 2006-11-23 | — | — | WO | disclosed |
| US-20060257785-A1 | Method of forming a photoresist element | MICROCHEM CORP. | 2006-11-16 | — | — | US | disclosed |
| EP-1706791-A2 | PHOTORESIST COMPOSITIONS AND PROCESSESS OF USE | MacroChem Corporation (US) | 2006-10-04 | — | — | EP | disclosed |
| WO-2005119364-A2 | PHOTOIMAGEABLE COATING COMPOSITION AND COMPOSITE ARTICLE THEREOF | MICROCHEM CORP. (US) | 2005-12-15 | — | — | WO | disclosed |
| US-20050266335-A1 | Photoimageable coating composition and composite article thereof | MicroChem Corp., a corporation | 2005-12-01 | — | — | US | disclosed |
| US-20050260522-A1 | Permanent resist composition, cured product thereof, and use thereof | MICROCHEM CORP. | 2005-11-24 | — | — | US | disclosed |
| WO-2005079330-A2 | PERMANENT RESIST COMPOSITION, CURED PRODUCT THEREOF, AND USE THEREOF | MICROCHEM CORP. (US) | 2005-09-01 | — | — | WO | disclosed |
| WO-2005067567-A2 | PHOTORESIST COMPOSITIONS AND PROCESSESS OF USE | MICROCHEM CORP. (US) | 2005-07-28 | — | — | WO | disclosed |
| US-20050147918-A1 | Photoresist compositions, hardened forms thereof, hardened patterns thereof and metal patterns formed using them | MicroChem Corp. a corporation of the state of Massachusetts, US | 2005-07-07 | — | — | US | disclosed |