Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ESR1 | P03372 | 5/20 | 0.56 |
| ▸ | ESR2 | Q92731 | 5/20 | 0.56 |
| ▸ | NR1I3 | Q14994 | 1/20 | 0.55 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.54 |
| ▸ | LMNA | P02545 | 1/20 | 0.54 |
| ▸ | HTT | P42858 | 1/20 | 0.54 |
| ▸ | PDE5A | O76074 | 3/20 | 0.50 |
| ▸ | ABCG2 | Q9UNQ0 | 2/20 | 0.50 |
| ▸ | MAOA | P21397 | 1/20 | 0.50 |
| ▸ | MAOB | P27338 | 1/20 | 0.50 |
| ▸ | TGFBR1 | P36897 | 1/20 | 0.49 |
| ▸ | NPC1 | O15118 | 1/20 | 0.47 |
| ▸ | TP53 | P04637 | 1/20 | 0.47 |
| ▸ | TSHR | P16473 | 1/20 | 0.47 |
| ▸ | NFKB1 | P19838 | 1/20 | 0.47 |
| ▸ | RAB9A | P51151 | 1/20 | 0.47 |
| ▸ | NFKB2 | Q00653 | 1/20 | 0.47 |
| ▸ | RELA | Q04206 | 1/20 | 0.47 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.47 |
| ▸ | ADORA2A | P29274 | 1/20 | 0.45 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29446753 | 1.00 | ESR1 (0.56) | ESR1ESR2NR1I3KDM4ELMNA | |
| SCHEMBL10937700 | 0.87 | ADORA2A (0.54) | ESR1ESR2NR1I3KDM4ELMNA | |
| SCHEMBL18371188 | 0.84 | PTGS1 (0.49) | ESR1ESR2NR1I3KDM4ELMNA | |
| SCHEMBL29059116 | 0.84 | ESR1 (0.67) | ESR1ESR2KDM4ELMNAHTT | |
| SCHEMBL29274261 | 0.82 | ESR1 (0.61) | ESR1ESR2KDM4ELMNAHTT | |
| SCHEMBL5948518 | 0.82 | GABRP (0.46) | ESR2NR1I3KDM4ELMNAHTT | |
| SCHEMBL18371197 | 0.81 | PTGS1 (0.46) | ESR1ESR2NR1I3KDM4ELMNA | |
| SCHEMBL2087364 | 0.81 | ALOX5 (0.52) | ESR1ESR2NR1I3KDM4ELMNA | |
| SCHEMBL5947994 | 0.80 | ALOX5 (0.48) | ESR2NR1I3MAOBNPC1TP53 | |
| SCHEMBL24447857 | 0.80 | NR1I3 (0.54) | ESR1ESR2NR1I3KDM4ELMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 89 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-110357989-B | Tertiary amine photosensitizer, preparation method thereof, photosensitive resin composition containing tertiary amine photosensitizer and application of photosensitive resin composition | 常州强力电子新材料股份有限公司 | 2022-04-22 | — | — | CN | claimed |
| CN-108241259-B | Resist composition with good hole masking function and capable of directly depicting, exposing and imaging | 杭州福斯特电子材料有限公司 | 2021-08-10 | — | — | CN | claimed |
| US-5346805-A | Initiator comprising an onium compound and an acridine derivative; printing plate, resist, photomask | FUJI PHOTO FILM CO., LTD. (JP) | 1994-09-13 | — | — | US | claimed |
| WO-2026105768-A1 | POLYMER, PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR FORMING WIRING PATTERN | 株式会社レゾナック | 2026-05-21 | — | — | WO | disclosed |
| US-12560867-B2 | Photosensitive element and method for producing photosensitive element | RESONAC CORPORATION (JP) | 2026-02-24 | — | — | US | disclosed |
| EP-4067998-B1 | EO/PO MODIFIED 9-PHENYLACRIDINE PHOTOSENSITIZERS FOR USE IN PHOTOSENSITIVE RESINS IN THE MANUFACTURE OF PRINTED CIRCUIT BOARDS | CHANGZHOU TRONLY NEW ELECTRONIC MAT CO LTD (CN) | 2025-11-12 | — | — | EP | disclosed |
| US-20250306461-A1 | PHOTOSENSITIVE ELEMENT AND METHOD FOR FORMING RESIST PATTERN | RESONAC CORPORATION (JP) | 2025-10-02 | — | — | US | disclosed |
| US-20250278024-A1 | PHOTOSENSITIVE ELEMENT, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR MANUFACTURING PRINTED WIRING BOARD | RESONAC CORPORATION (JP) | 2025-09-04 | — | — | US | disclosed |
| US-12353130-B2 | Photosensitive resin composition and photosensitive resin multilayer body | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2025-07-08 | — | — | US | disclosed |
| US-20240408595-A1 | STRUCTURE COMPRISING MICROCHANNEL, PRODUCTION METHOD FOR SAID STRUCTURE, AND MICROCHANNEL DEVICE | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2024-12-12 | — | — | US | disclosed |
| US-20240392048-A1 | POLYMER, PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR FORMING WIRING PATTERN | RESONAC CORP (JP) | 2024-11-28 | — | — | US | disclosed |
| EP-2284611-B1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT, RESIST PATTERN MANUFACTURING METHOD, AND PRINTED CIRCUIT BOARD MANUFACTURING METHOD | HITACHI CHEMICAL CO LTD (JP) | 2013-11-20 | — | — | EP | disclosed |
| US-8460853-B2 | Photosensitive resin composition, photosensitive element, resist pattern manufacturing method, and printed circuit board manufacturing method | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2013-06-11 | — | — | US | disclosed |
| US-20120040290-A1 | PHOTOSENSITIVE RESIN COMPOSITION, AND PHOTOSENSITIVE ELEMENT, RESIST PATTERN FORMATION METHOD AND PRINTED CIRCUIT BOARD PRODUCTION METHOD EACH UTILIZING SAME | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2012-02-16 | — | — | US | disclosed |
| CN-102144189-A | Photosensitive resin composition, photosensitive resin laminate, method for forming resist pattern, conductive pattern, printed wiring board, lead frame, base, and method for manufacturing semiconductor package | ASAHI KASEI E MATERIALS CORP | 2011-08-03 | — | — | CN | disclosed |
| US-20110081616-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT, RESIST PATTERN MANUFACTURING METHOD, AND PRINTED CIRCUIT BOARD MANUFACTURING METHOD | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2011-04-07 | — | — | US | disclosed |
| EP-2284611-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT, RESIST PATTERN MANUFACTURING METHOD, AND PRINTED CIRCUIT BOARD MANUFACTURING METHOD | Hitachi Chemical Company, Ltd. (JP) | 2011-02-16 | — | — | EP | disclosed |
| US-20100159691-A1 | PHOTOSENSITIVE RESIN COMPOSITION AND LAMINATE | ASAHI KASEI EMD CORPORATION (JP) | 2010-06-24 | — | — | US | disclosed |
| US-5346805-A | Initiator comprising an onium compound and an acridine derivative; printing plate, resist, photomask | FUJI PHOTO FILM CO., LTD. (JP) | 1994-09-13 | — | — | US | disclosed |
| US-4587200-A | Photopolymerizable composition comprising an acridine and a heterocyclic thiol compound as a photopolymerization initiator and a photographic process using said photopolymerizable composition | FUJI PHOTO FILM CO., LTD. (JP) | 1986-05-06 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-12560867-B2 | Photosensitive element and method for producing photosensitive element | TERB1, PRDM9, PRPF8 | ESR1 401/4885ESR2 1189/4885NR1I3 3530/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.