SCHEMBL6037018

SCHEMBL6037018

CC(C)(C)OC(=O)Oc1ccc(C=CC(O)=Cc2ccccc2)cc1

nearest known ligand 0.49

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 5/20 0.49
ELANE P08246 1/20 0.49
MEN1 O00255 2/20 0.47
ALDH1A1 P00352 2/20 0.47
NPC1 O15118 2/20 0.47
RAB9A P51151 2/20 0.47
LMNA P02545 1/20 0.47
L3MBTL1 Q9Y468 1/20 0.47
PPARA Q07869 2/20 0.43
GSK3B P49841 3/20 0.43
BACE1 P56817 3/20 0.43
TRPM8 Q7Z2W7 1/20 0.42
MAPT P10636 2/20 0.42
MAOB P27338 2/20 0.42
HSPD1 P10809 1/20 0.42
TNFRSF1A P19438 1/20 0.42
HSPE1 P61604 1/20 0.42
CYP1B1 Q16678 1/20 0.42
BCHE P06276 1/20 0.42
CYP3A4 P08684 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4928930 0.83 THRB (0.58) KMT2AELANEMEN1ALDH1A1NPC1
SCHEMBL15347287 0.82 KMT2A (0.56) KMT2AELANEMEN1ALDH1A1NPC1
SCHEMBL9998805 0.80 KMT2A (0.47) KMT2AMEN1ALDH1A1NPC1RAB9A
SCHEMBL2997719 0.78 EGFR (0.43) KMT2AMEN1ALDH1A1NPC1RAB9A
SCHEMBL8775676 0.78 EGFR (0.49) KMT2AMEN1ALDH1A1NPC1RAB9A
SCHEMBL4144000 0.77 GLA (0.45) KMT2AMEN1ALDH1A1NPC1RAB9A
SCHEMBL13845250 0.77 ELANE (0.53) KMT2AELANEMEN1ALDH1A1NPC1
SCHEMBL13845249 0.77 ELANE (0.53) KMT2AELANEMEN1ALDH1A1NPC1
SCHEMBL4065940 0.77 ELANE (0.53) KMT2AELANEMEN1ALDH1A1NPC1
SCHEMBL17054137 0.76 ELANE (0.55) KMT2AELANEMEN1LMNAMAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20060008711-A1 Mirror for exposure system, reflection mask for exposure system, exposure system and pattern formation method MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) 2006-01-12 US disclosed