Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | EGFR | P00533 | 1/20 | 0.43 |
| ▸ | GLA | P06280 | 1/20 | 0.42 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.42 |
| ▸ | LMNA | P02545 | 4/20 | 0.41 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.41 |
| ▸ | HDAC3 | O15379 | 2/20 | 0.41 |
| ▸ | HDAC4 | P56524 | 2/20 | 0.41 |
| ▸ | HDAC1 | Q13547 | 2/20 | 0.41 |
| ▸ | HDAC2 | Q92769 | 2/20 | 0.41 |
| ▸ | HDAC8 | Q9BY41 | 2/20 | 0.41 |
| ▸ | HDAC6 | Q9UBN7 | 2/20 | 0.41 |
| ▸ | PLIN1 | O60240 | 2/20 | 0.41 |
| ▸ | MAPT | P10636 | 2/20 | 0.41 |
| ▸ | RECQL | P46063 | 2/20 | 0.41 |
| ▸ | PLIN5 | Q00G26 | 2/20 | 0.41 |
| ▸ | ABHD5 | Q8WTS1 | 2/20 | 0.41 |
| ▸ | TNKS | O95271 | 1/20 | 0.41 |
| ▸ | HCAR2 | Q8TDS4 | 1/20 | 0.41 |
| ▸ | HDAC7 | Q8WUI4 | 1/20 | 0.41 |
| ▸ | HDAC10 | Q969S8 | 1/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28120691 | 0.82 | CYP2C19 (0.45) | EGFRGLATDP1LMNAALDH1A1 | |
| SCHEMBL28634688 | 0.82 | CYP2C19 (0.45) | EGFRGLATDP1LMNAALDH1A1 | |
| SCHEMBL4144000 | 0.82 | GLA (0.45) | EGFRGLATDP1LMNAALDH1A1 | |
| SCHEMBL5008693 | 0.82 | EGFR (0.42) | EGFRGLATDP1LMNAALDH1A1 | |
| Styrene SCHEMBL6903124 | 0.81 | ALDH1A1 (0.48) | EGFRGLATDP1LMNAALDH1A1 | |
| Styrene SCHEMBL5008696 | 0.81 | ALDH1A1 (0.48) | EGFRGLATDP1LMNAALDH1A1 | |
| SCHEMBL126771 | 0.80 | GLA (0.55) | EGFRGLATDP1LMNAALDH1A1 | |
| SCHEMBL1006098 | 0.80 | GLA (0.55) | EGFRGLATDP1LMNAALDH1A1 | |
| SCHEMBL6037018 | 0.78 | KMT2A (0.49) | EGFRGLATDP1LMNAALDH1A1 | |
| Styrene SCHEMBL27545176 | 0.78 | ALDH1A1 (0.45) | EGFRGLATDP1LMNAALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9366963-B2 | Resist composition and pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-06-14 | — | — | US | disclosed |
| US-20150147697-A1 | RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-05-28 | — | — | US | disclosed |
| US-20100190107-A1 | CYCLIC COMPOUND, PHOTORESIST BASE MATERIAL AND PHOTORESIST COMPOSITION | IDEMITSU KOSAN CO. LTD (JP) | 2010-07-29 | — | — | US | disclosed |
| EP-1449833-B1 | BISIMIDE COMPOUND, ACID GENERATOR AND RESIST COMPOSITION EACH CONTAINING THE SAME, AND METHOD OF FORMING PATTERN FROM THE COMPOSITION | WAKO PURE CHEM IND LTD (JP) | 2009-09-09 | — | — | EP | disclosed |
| US-7374857-B2 | Bismide compound, acid generator and resist composition each containing the same, and method of forming pattern from the composition | WAKO PURE CHEMICAL INDUSTRIES LTD. (JP) | 2008-05-20 | — | — | US | disclosed |
| US-7318992-B2 | Lift-off positive resist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 2008-01-15 | — | — | US | disclosed |
| US-7312014-B2 | Poly(p-hydroxystyrene/styrene/alkyl acrylate) terpolymer derivative and acid generator comprising triphenylsulfonium benzenesulfonate derivative; forming positive pattern using transcription technology in high vacuum with irradiated energy such as electron beam, extreme ultraviolet ray and X-ray | WAKO PURE CHEMICAL INDUSTRIES LTD. (JP) | 2007-12-25 | — | — | US | disclosed |
| US-20050227171-A1 | Lift-off positive resist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 2005-10-13 | — | — | US | disclosed |
| US-6949329-B2 | Pattern formation method | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 2005-09-27 | — | — | US | disclosed |
| US-20050038261-A1 | Bismide compound, acid generator and resist composition each containing the same, and method of forming pattern from the composition | WAKO PURE CHEMICAL INDUSTRIES LTD. (JP) | 2005-02-17 | — | — | US | disclosed |
| US-20040170918-A1 | Poly(p-hydroxystyrene/styrene/alkyl acrylate) terpolymer derivative and acid generator comprising triphenylsulfonium benzenesulfonate derivative; forming positive pattern using transcription technology in high vacuum with irradiated energy such as electron beam, extreme ultraviolet ray and X-ray | WAKO PURE CHEMICAL INDUSTRIES LTD. (JP) | 2004-09-02 | — | — | US | disclosed |
| EP-1449833-A1 | BISIMIDE COMPOUND, ACID GENERATOR AND RESIST COMPOSITION EACH CONTAINING THE SAME, AND METHOD OF FORMING PATTERN FROM THE COMPOSITION | Wako Pure Chemical Industries, Ltd. (JP) | 2004-08-25 | — | — | EP | disclosed |
| US-20030017425-A1 | Pattern formation method | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 2003-01-23 | — | — | US | disclosed |
| US-6365321-B1 | COPOLYMER WITH ACRYLATE HAVING ACID LABILE GROUP, HOMOGENOUSLY BLENDED WITH PHENOLIC POLYMER WHICH IS PARTIALLY OR WHOLLY PROTECTED | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2002-04-02 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20100190107-A1 | CYCLIC COMPOUND, PHOTORESIST BASE MATERIAL AND PHOTORESIST COMPOSITION | CRY1, PCNA, ERCC4 | EGFR 1953/4885GLA 3383/4885TDP1 3032/4885 |
| US-20050038261-A1 | Bismide compound, acid generator and resist composition each containing the same, and method of forming pattern from the composition | ASIC1, GAR1, RER1 | EGFR 2445/4885GLA 3492/4885TDP1 2088/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.