Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KMT2A | Q03164 | 4/20 | 0.48 |
| ▸ | MEN1 | O00255 | 3/20 | 0.48 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.48 |
| ▸ | CYP2C19 | P33261 | 2/20 | 0.48 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.47 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.46 |
| ▸ | TSHR | P16473 | 1/20 | 0.46 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.46 |
| ▸ | CXCR3 | P49682 | 1/20 | 0.43 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.43 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.42 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.42 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL452144 | 0.87 | KMT2A (0.56) | KMT2AMEN1CYP1A2CYP2C19SMN1; SMN2 | |
| SCHEMBL8756323 | 0.83 | KMT2A (0.48) | KMT2AMEN1CYP1A2CYP2C19SMN1; SMN2 | |
| SCHEMBL18962226 | 0.83 | KMT2A (0.50) | KMT2AMEN1CYP1A2CYP2C19SMN1; SMN2 | |
| SCHEMBL4545352 | 0.83 | KMT2A (0.50) | KMT2AMEN1CYP1A2CYP2C19SMN1; SMN2 | |
| SCHEMBL3981589 | 0.83 | KMT2A (0.45) | KMT2AMEN1CYP1A2CYP2C19SMN1; SMN2 | |
| SCHEMBL452153 | 0.80 | CYP1A2 (0.55) | KMT2AMEN1CYP1A2CYP2C19SMN1; SMN2 | |
| SCHEMBL3829292 | 0.80 | ALDH1A1 (0.49) | KMT2AMEN1CYP1A2CYP2C19SMN1; SMN2 | |
| SCHEMBL5552230 | 0.78 | KMT2A (0.55) | KMT2AMEN1CYP1A2CYP2C19SMN1; SMN2 | |
| SCHEMBL17617812 | 0.78 | KMT2A (0.42) | KMT2AMEN1CYP1A2CYP2C19SMN1; SMN2 | |
| SCHEMBL17231422 | 0.78 | KMT2A (0.44) | KMT2AMEN1CYP1A2CYP2C19SMN1; SMN2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 502 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240077802-A1 | METHOD OF FORMING PHOTORESIST PATTERN | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2024-03-07 | — | — | US | claimed |
| US-11626293-B2 | Method of manufacturing a semiconductor device | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2023-04-11 | — | — | US | claimed |
| US-20220230889-A1 | METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2022-07-21 | — | — | US | claimed |
| US-8557943-B2 | Nanostructured organosilicates from thermally curable block copolymers | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2013-10-15 | — | — | US | claimed |
| US-8426113-B2 | Chemically amplified silsesquioxane resist compositions | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2013-04-23 | — | — | US | claimed |
| US-20120277339-A1 | Nanostructured Organosilicates from Thermally Curable Block Copolymers | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2012-11-01 | — | — | US | claimed |
| WO-2012148659-A2 | NANOSTRUCTURED ORGANOSILICATES FROM THERMALLY CURABLE BLOCK COPOLYMERS | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2012-11-01 | — | — | WO | claimed |
| US-8262961-B2 | Aromatic vinyl ether based reverse-tone step and flash imprint lithography | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2012-09-11 | — | — | US | claimed |
| US-8128832-B2 | Processes and materials for step and flash imprint lithography | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2012-03-06 | — | — | US | claimed |
| US-20120040289-A1 | CHEMICALLY AMPLIFIED SILSESQUIOXANE RESIST COMPOSITIONS | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2012-02-16 | — | — | US | claimed |
| EP-1938149-A2 | LOW ACTIVATION ENERGY DISSOLUTION MODIFICATION AGENTS FOR PHOTORESIST APPLICATIONS | International Business Machines Corporation (US) | 2008-07-02 | — | — | EP | claimed |
| US-7358029-B2 | Polymer, a photoacid generator and a dissolution modification agent; patterning; image resolution | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2008-04-15 | — | — | US | claimed |
| US-20070298176-A1 | AROMATIC VINYL ETHER BASED REVERSE-TONE STEP AND FLASH IMPRINT LITHOGRAPHY | GLOBALFOUNDRIES INC. (KY) | 2007-12-27 | — | — | US | claimed |
| US-20070231734-A1 | Polymer, a photoacid generator and a dissolution modification agent; patterning; image resolution | GLOBALFOUNDRIES U.S. INC. | 2007-10-04 | — | — | US | claimed |
| WO-2007039346-A2 | LOW ACTIVATION ENERGY DISSOLUTION MODIFICATION AGENTS FOR PHOTORESIST APPLICATIONS | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2007-04-12 | — | — | WO | claimed |
| US-20070051697-A1 | Processes and materials for step and flash imprint lithography | GLOBALFOUNDRIES INC. (KY) | 2007-03-08 | — | — | US | claimed |
| US-6365321-B1 | COPOLYMER WITH ACRYLATE HAVING ACID LABILE GROUP, HOMOGENOUSLY BLENDED WITH PHENOLIC POLYMER WHICH IS PARTIALLY OR WHOLLY PROTECTED | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2002-04-02 | — | — | US | claimed |
| EP-0605089-B1 | Photoresist composition | IBM (US) | 1999-01-07 | — | — | EP | claimed |
| US-5492793-A | Photoresist composition | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 1996-02-20 | — | — | US | claimed |
| EP-0605089-A2 | Photoresist composition | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 1994-07-06 | — | — | EP | claimed |