Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HTT | P42858 | 4/20 | 0.48 |
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.48 |
| ▸ | POLB | P06746 | 2/20 | 0.48 |
| ▸ | PKM | P14618 | 1/20 | 0.48 |
| ▸ | SRC | P12931 | 2/20 | 0.46 |
| ▸ | PTGER4 | P35408 | 2/20 | 0.46 |
| ▸ | NPC1 | O15118 | 2/20 | 0.44 |
| ▸ | ATM | Q13315 | 2/20 | 0.44 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.44 |
| ▸ | RAB9A | P51151 | 1/20 | 0.44 |
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.44 |
| ▸ | HPGD | P15428 | 4/20 | 0.44 |
| ▸ | MEN1 | O00255 | 3/20 | 0.43 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.43 |
| ▸ | LMNA | P02545 | 2/20 | 0.43 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.43 |
| ▸ | TSHR | P16473 | 2/20 | 0.43 |
| ▸ | USP2 | O75604 | 2/20 | 0.43 |
| ▸ | MAPT | P10636 | 2/20 | 0.43 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.43 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8158727 | 0.92 | MAPT (0.40) | HTTKDM4EPOLBPKMSRC | |
| SCHEMBL605080 | 0.90 | ALDH1A1 (0.44) | HTTKDM4EPOLBPKMNPC1 | |
| SCHEMBL7132029 | 0.88 | PTGER4 (0.60) | HTTKDM4EPOLBPKMSRC | |
| SCHEMBL553110 | 0.84 | ALDH1A1 (0.49) | HTTKDM4EPOLBPTGER4NPC1 | |
| SCHEMBL146503 | 0.84 | CYP1A2 (0.56) | HTTKDM4EPOLBNPC1RAB9A | |
| SCHEMBL766095 | 0.84 | KDM4E (0.67) | HTTKDM4EPOLBPKMSRC | |
| SCHEMBL31454256 | 0.84 | KDM4E (0.67) | HTTKDM4EPOLBPKMSRC | |
| SCHEMBL4604142 | 0.83 | PTGER4 (0.50) | HTTKDM4EPOLBPTGER4NPC1 | |
| SCHEMBL30874765 | 0.83 | PTGER4 (0.50) | HTTKDM4EPOLBPTGER4NPC1 | |
| SCHEMBL25841829 | 0.81 | CYP19A1 (0.64) | HTTKDM4EPOLBPKMSRC |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 20 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-116333685-A | Method for producing composition for polishing display glass substrate and method for polishing display substrate using the composition | (株)伊诺肯公司 | 2023-06-27 | — | — | CN | disclosed |
| US-20150191607-A1 | Anti-fouling Paints and Coatings | REACTIVE SURFACES, LTD (US) | 2015-07-09 | — | — | US | disclosed |
| US-20140196631-A1 | VISUAL ASSAYS FOR COATINGS INCORPORATING BIOACTIVE ENZYMES FOR CATALYTIC FUNCTIONS | REACTIVE SURFACE, LTD. (US) | 2014-07-17 | — | — | US | disclosed |
| EP-1369906-B1 | POLISHING COMPOUND AND METHOD FOR POLISHING SUBSTRATE | HITACHI CHEMICAL CO LTD (JP) | 2012-06-27 | — | — | EP | disclosed |
| US-20120097194-A1 | Polymeric Coatings Incorporating Bioactive Enzymes for Catalytic Function | REACTIVE SURFACES, LTD. (US) | 2012-04-26 | — | — | US | disclosed |
| EP-2418258-A1 | Polishing slurry and method of polishing substrate | Hitachi Chemical Company, Ltd. (JP) | 2012-02-15 | — | — | EP | disclosed |
| US-20110250626-A1 | Visual Assays for Coatings Incorporating Bioactive Enzymes for Catalytic Functions | REACTIVE SURFACES, LTD. (US) | 2011-10-13 | — | — | US | disclosed |
| US-20110240064-A1 | Polymeric Coatings Incorporating Bioactive Enzymes for Cleaning a Surface | REACTIVE SURFACES, LTD. (US) | 2011-10-06 | — | — | US | disclosed |
| US-8002860-B2 | CMP abrasive, method for polishing substrate and method for manufacturing semiconductor device using the same, and additive for CMP abrasive | HITACHI CHEMICAL CO., LTD. (JP) | 2011-08-23 | — | — | US | disclosed |
| US-20100210745-A1 | Molecular Healing of Polymeric Materials, Coatings, Plastics, Elastomers, Composites, Laminates, Adhesives, and Sealants by Active Enzymes | REACTIVE SURFACES, LTD. (US) | 2010-08-19 | — | — | US | disclosed |
| US-20090253355-A1 | CMP ABRASIVE, METHOD FOR POLISHING SUBSTRATE AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAME, AND ADDITIVE FOR CMP ABRASIVE | KOYAMA NAOYUKI | 2009-10-08 | — | — | US | disclosed |
| US-7410409-B1 | Abrasive compound for CMP, method for polishing substrate and method for manufacturing semiconductor device using the same, and additive for CMP abrasive compound | HITACHI CHEMICAL CO., LTD. (JP) | 2008-08-12 | — | — | US | disclosed |
| US-20070270085-A1 | CHEMICAL MECHANICAL POLISHING SLURRY, CMP PROCESS AND ELECTRONIC DEVICE PROCESS | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2007-11-22 | — | — | US | disclosed |
| US-20070169421-A1 | CMP abrasive, method for polishing substrate and method for manufacturing semiconductor device using the same, and additive for CMP abrasive | KOYAMA NAOYUKI | 2007-07-26 | — | — | US | disclosed |
| WO-2007018376-A1 | PRODUCING METHOD FOR CERIUM-BASED GLASS POLISHING MATERIAL AND METHOD FOR USING THE SAME | JOUNG IN (KR) | 2007-02-15 | — | — | WO | disclosed |
| EP-1691401-A2 | CMP abrasive, method for polishing substrate and method for manufacturing semiconductor device using the same, and additive for CMP abrasive | Hitachi Chemical Co., Ltd. (JP) | 2006-08-16 | — | — | EP | disclosed |
| US-6786945-B2 | Polishing compound and method for polishing substrate | HITACHI CHEMICAL CO., LTD. (JP) | 2004-09-07 | — | — | US | disclosed |
| US-20040065022-A1 | Polishing compound and method for polishing substrate | HITACHI CHEMICAL CO., LTD. (JP) | 2004-04-08 | — | — | US | disclosed |
| EP-1369906-A1 | POLISHING COMPOUND AND METHOD FOR POLISHING SUBSTRATE | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2003-12-10 | — | — | EP | disclosed |
| EP-1205965-A1 | ABRASIVE COMPOUND FOR CMP, METHOD FOR POLISHING SUBSTRATE AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAME, AND ADDITIVE FOR CMP ABRASIVE COMPOUND | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2002-05-15 | — | — | EP | disclosed |