SCHEMBL606047

SCHEMBL606047

Oc1cccc(OI)c1I

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 6/20 0.43
ALOX15 P16050 5/20 0.43
HSD17B10 Q99714 5/20 0.43
LMNA P02545 4/20 0.43
HPGD P15428 4/20 0.43
ALDH1A1 P00352 3/20 0.43
TP53 P04637 2/20 0.43
KDM4E B2RXH2 2/20 0.43
CYP3A4 P08684 2/20 0.43
MAPK1 P28482 2/20 0.43
ALOX12 P18054 1/20 0.43
CA2 P00918 5/20 0.39
CA1 P00915 4/20 0.39
TSHR P16473 3/20 0.39
RECQL P46063 3/20 0.38
TDP1 Q9NUW8 3/20 0.38
EGFR P00533 2/20 0.38
FYN P06241 2/20 0.38
MMP9 P14780 2/20 0.38
ADAMTS4 O75173 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2045969 0.79 MAPT (0.64) MAPTALOX15HSD17B10LMNAHPGD
SCHEMBL18190464 0.79 MAPT (0.38) MAPTALOX15HSD17B10LMNAHPGD
SCHEMBL14959852 0.77
SCHEMBL69649 0.76
SCHEMBL10818742 0.74 ALDH1A1 (0.46) LMNAHPGDALDH1A1TSHRTDP1
SCHEMBL24106181 0.69 ELANE (0.41) MAPTALOX15HSD17B10LMNAHPGD
SCHEMBL10876865 0.69 CA12 (0.41) MAPTALOX15HSD17B10LMNAHPGD
SCHEMBL30897953 0.69 ELANE (0.41) MAPTALOX15HSD17B10LMNAHPGD
SCHEMBL605558 0.69
SCHEMBL24085341 0.69 CA2 (0.45) MAPTALOX15HSD17B10LMNAHPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-104749887-A COMPOSITION FOR FORMING RESIST UNDERLAYER FILM FOR EUV LITHOGRAPHY NISSAN CHEMICAL IND LTD 2015-07-01 CN disclosed
US-9005873-B2 Composition for forming resist underlayer film for EUV lithography NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2015-04-14 US disclosed
US-20140099791-A1 COMPOSITION FOR FORMING RESIST UNDERLAYER FILM FOR EUV LITHOGRAPHY NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2014-04-10 US disclosed
CN-102414619-A Resist underlayer film forming composition for EUV lithography NISSAN CHEMICAL IND LTD 2012-04-11 CN disclosed
US-20120040291-A1 COMPOSITION FOR FORMING RESIST UNDERLAYER FILM FOR EUV LITHOGRAPHY NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2012-02-16 US disclosed