Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 5/20 | 0.48 |
| ▸ | HTT | P42858 | 4/20 | 0.48 |
| ▸ | KMT2A | Q03164 | 4/20 | 0.48 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.48 |
| ▸ | MAPT | P10636 | 3/20 | 0.47 |
| ▸ | MEN1 | O00255 | 3/20 | 0.47 |
| ▸ | NPSR1 | Q6W5P4 | 2/20 | 0.47 |
| ▸ | PLA2G1B | P04054 | 1/20 | 0.47 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.47 |
| ▸ | RAD52 | P43351 | 1/20 | 0.47 |
| ▸ | ATG4B | Q9Y4P1 | 1/20 | 0.47 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.44 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10820967 | 0.96 | LMNA (0.46) | LMNAHTTKMT2AKDM4EMAPT | |
| SCHEMBL10820838 | 0.95 | LMNA (0.50) | LMNAHTTKMT2AKDM4EMAPT | |
| SCHEMBL10820937 | 0.95 | LMNA (0.50) | LMNAHTTKMT2AKDM4EMAPT | |
| SCHEMBL10821102 | 0.92 | KMT2A (0.50) | LMNAHTTKMT2AKDM4EMAPT | |
| SCHEMBL2909233 | 0.87 | LMNA (0.52) | LMNAHTTKMT2AKDM4EMAPT | |
| SCHEMBL6907199 | 0.85 | LMNA (0.50) | LMNAHTTKMT2AKDM4EMAPT | |
| SCHEMBL7029708 | 0.84 | ALDH1A1 (0.53) | LMNAALDH1A1 | |
| SCHEMBL10820997 | 0.81 | KMT2A (0.52) | LMNAHTTKMT2AKDM4EMAPT | |
| SCHEMBL10820857 | 0.81 | KMT2A (0.52) | LMNAHTTKMT2AKDM4EMAPT | |
| SCHEMBL17630047 | 0.78 | LMNA (0.50) | LMNAHTTKMT2AKDM4EMAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 69 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20160272791-A1 | PHOTO-CURABLE RESIN COMPOSITION AND METHOD FOR FORMING A FINE PATTERN USING THE SAME | SAMSUNG DISPLAY CO., LTD. (KR) | 2016-09-22 | — | — | US | claimed |
| US-9939568-B2 | Photosensitive resin composition for color filter and application of the same | CHI MEI CORPORATION (TW) | 2018-04-10 | — | — | US | disclosed |
| US-9676899-B2 | Radiation curable resin composition and rapid three dimensional imaging process using the same | DSM IP ASSETS B.V. (NL) | 2017-06-13 | — | — | US | disclosed |
| US-9631068-B2 | Photo-curable resin composition and method for forming a fine pattern using the same | SAMSUNG DISPLAY CO., LTD. (KR) | 2017-04-25 | — | — | US | disclosed |
| US-9557443-B2 | Photosensitive resin composition, black matrix, color filter, and liquid crystal display device | CHI MEI CORPORATION (TW) | 2017-01-31 | — | — | US | disclosed |
| US-9557444-B2 | Alkali-soluble resin, photosensitive resin composition, color filter, method for manufacturing the same, and liquid crystal display apparatus | CHI MEI CORPORATION (TW) | 2017-01-31 | — | — | US | disclosed |
| US-20170003586-A1 | PHOTOSENSITIVE RESIN COMPOSITION AND USES THEREOF | CHI MEI CORPORATION (TW) | 2017-01-05 | — | — | US | disclosed |
| US-9519208-B2 | Photosensitive resin composition for color filters and uses thereof | CHI MEI CORPORATION (TW) | 2016-12-13 | — | — | US | disclosed |
| US-20160327863-A1 | PHOTOSENSITIVE RESIN COMPOSITION FOR COLOR FILTER AND APPLICATION OF THE SAME | CHI MEI CORPORATION (TW) | 2016-11-10 | — | — | US | disclosed |
| US-20160313639-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PIXEL LAYER, PROTECTIVE FILM, SPACER, THIN-FILM TRANSISTOR, COLOR FILTER, AND LIQUID CRYSTAL DISPLAY APPARATUS | CHI MEI CORPORATION (TW) | 2016-10-27 | — | — | US | disclosed |
| US-20080064780-A1 | Radiation curable resin composition and rapid prototyping process using the same | DSM IP ASSETS B.V. (NL) | 2008-03-13 | — | — | US | disclosed |
| US-20070238047-A1 | Photosensitive resin composition for color filters | CHI-MEI CORPORATION | 2007-10-11 | — | — | US | disclosed |
| US-20070232713-A1 | Radiation Curable Liquid Resin Composition for Optical Three-Dimensional Molding and Optical Molded Article Obtained by Photocuring Same | JSR CORPORATION (JP) | 2007-10-04 | — | — | US | disclosed |
| US-20070228614-A1 | Cationic compositions and methods of making and using the same | DSM IP ASSETS B.V. (NL) | 2007-10-04 | — | — | US | disclosed |
| US-20070043138-A1 | Resin composition for photofabrication of three dimensional objects | YAMAMURA TETSUYA | 2007-02-22 | — | — | US | disclosed |
| US-20050287470-A1 | Curable compositions and rapid prototyping process using the same | DSM IP ASSETS B.V. (NL) | 2005-12-29 | — | — | US | disclosed |
| US-20050175930-A1 | Photosensitive resin composition for black matrix | CHI MEI CORPORATION (TW) | 2005-08-11 | — | — | US | disclosed |
| US-20050171255-A1 | Resin composition for photofabrication of three dimensional objects | YAMAMURA TETSUYA (JP) | 2005-08-04 | — | — | US | disclosed |
| US-20050158659-A1 | Photosensitive resin composition for black matrix | CHI MEI CORPORATION (TW) | 2005-07-21 | — | — | US | disclosed |
| US-4620028-A | Esters of hydroxyalkyl ethers of bornane | SCM CORPORATION (US) | 1986-10-28 | — | — | US | disclosed |