Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 3/20 | 0.50 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.50 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.47 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.47 |
| ▸ | MAPT | P10636 | 2/20 | 0.46 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.45 |
| ▸ | HTT | P42858 | 1/20 | 0.45 |
| ▸ | MEN1 | O00255 | 1/20 | 0.45 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7118885 | 0.88 | LMNA (0.50) | LMNAALDH1A1KMT2AKDM4EMAPT | |
| SCHEMBL23134677 | 0.88 | LMNA (0.50) | LMNAALDH1A1KMT2AKDM4EMAPT | |
| SCHEMBL10821102 | 0.87 | KMT2A (0.50) | LMNAALDH1A1KMT2AKDM4EMAPT | |
| SCHEMBL606150 | 0.85 | LMNA (0.48) | LMNAALDH1A1KMT2AKDM4EMAPT | |
| SCHEMBL10820937 | 0.83 | LMNA (0.50) | LMNAALDH1A1KMT2AKDM4EMAPT | |
| SCHEMBL10820838 | 0.83 | LMNA (0.50) | LMNAALDH1A1KMT2AKDM4EMAPT | |
| SCHEMBL10820967 | 0.82 | LMNA (0.46) | LMNAALDH1A1KMT2AKDM4EMAPT | |
| SCHEMBL22615597 | 0.82 | ALDH1A1 (0.56) | LMNAALDH1A1 | |
| SCHEMBL22619659 | 0.82 | ALDH1A1 (0.56) | LMNAALDH1A1 | |
| SCHEMBL22615598 | 0.82 | ALDH1A1 (0.56) | LMNAALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| JP-11171836-A | — | — | None | — | — | JP | disclosed |
| US-6710150-B2 | SOLUBILITY IN ALKALINE AQUEOUS SOLUTION IN THE PRESENCE OF A PROTON; FOR USE IN PHOTOLITHOGRAPHY | NIPPON SHOKUBAI CO., LTD. (JP) | 2004-03-23 | — | — | US | disclosed |
| US-6649322-B2 | Acid generator and terpolymer, e.g. of p-tert-butoxystyrene, p-hydroxystrene and tert-butyl (alpha-isobornyloxymethyl) acrylate; dry-etching resistance, forms a patterned resist with a good sectional shape | TOKYO OHKA KOGYO CO., LTD. (JP) | 2003-11-18 | — | — | US | disclosed |
| JP-2003048864-A | METHOD FOR PRODUCING ALLYL ETHER DERIVATIVE OR PRECURSOR AND ALLYL ETHER DERIVATIVE PRODUCED BY THE METHOD | NIPPON SHOKUBAI CO LTD | 2003-02-21 | — | — | JP | disclosed |
| US-20020099147-A1 | Solubility in alkaline aqueous solution in the presence of a proton; for use in photolithography | NIPPON SHOKUBAI CO., LTD | 2002-07-25 | — | — | US | disclosed |
| US-20020076649-A1 | Positive resist composition and positive resist base material using the same | TOKYO OHKA KOGYO CO., LTD. | 2002-06-20 | — | — | US | disclosed |
| JP-H11171836-A | ALLYL ETHER DERIVATIVE, ITS PRODUCTION AND POLYMER THEREOF | NIPPON SHOKUBAI CO LTD | 1999-06-29 | — | — | JP | disclosed |