SCHEMBL606877

SCHEMBL606877

CN(C)N(CCCCCCN(C(N)=O)N(C)C)C(N)=O

nearest known ligand 0.35

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.35
TSHR P16473 1/20 0.35
CHRM2 P08172 1/20 0.33
KDM4A O75164 6/20 0.31
KDM4C Q9H3R0 6/20 0.31
KDM5A P29375 1/20 0.31
KDM7A Q6ZMT4 1/20 0.31
PHF8 Q9UPP1 1/20 0.31
KDM2A Q9Y2K7 1/20 0.31
HSD17B10 Q99714 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7830373 0.91 DNM1 (0.44) ALDH1A1TSHRKDM4CKDM5APHF8
SCHEMBL8355330 0.91 DNM1 (0.44) ALDH1A1TSHRKDM4CKDM5APHF8
SCHEMBL27553283 0.86 CA1 (0.40) ALDH1A1KDM4AKDM4CKDM5APHF8
SCHEMBL10903614 0.82 LMNA (0.40) ALDH1A1TSHRPHF8KDM2AHSD17B10
SCHEMBL5631353 0.80 CA12 (0.36) ALDH1A1TSHR
Hydrochloric Acid SCHEMBL10752958 0.78 CA12 (0.34) ALDH1A1TSHR
Hydrochloric Acid SCHEMBL10752962 0.78 CA12 (0.34) ALDH1A1TSHR
SCHEMBL10906150 0.78 LTA4H (0.30)
SCHEMBL10905398 0.76 PHF8 (0.41) ALDH1A1KDM4AKDM4CKDM5AKDM7A
SCHEMBL4599567 0.75 KDM4A (0.32) ALDH1A1TSHRCHRM2KDM4AKDM4C

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 162 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
JP-61009643-A None JP disclosed
JP-62242935-A None JP disclosed
JP-63027514-A None JP disclosed
JP-61025143-A None JP disclosed
EP-4624548-A1 WATER REPELLENT COMPOSITION, METHOD FOR PRODUCING NON-FLUORINE POLYMER, PROCESSING METHOD AND ARTICLE AGC INC. (JP) 2025-10-01 EP disclosed
EP-4624547-A1 WATER REPELLENT COMPOSITION, PRODUCTION METHOD FOR FLUORINE-FREE POLYMER, TREATMENT METHOD AND ARTICLE AGC INC. (JP) 2025-10-01 EP disclosed
EP-4624549-A1 WATER-REPELLING AGENT COMPOSITION, METHOD FOR PRODUCING NON-FLUORINATED POLYMER, TREATMENT METHOD, AND ARTICLE AGC INC. (JP) 2025-10-01 EP disclosed
US-20250277071-A1 WATER REPELLENT COMPOSITION, METHOD FOR PRODUCING NON-FLUORINE POLYMER, PROCESSING METHOD AND ARTICLE AGC Inc. (JP) 2025-09-04 US disclosed
US-20250277070-A1 WATER REPELLENT COMPOSITION, PRODUCTION METHOD FOR FLUORINE-FREE POLYMER, TREATMENT METHOD AND ARTICLE AGC Inc. (JP) 2025-09-04 US disclosed
US-20250277336-A1 WATER-REPELLING AGENT COMPOSITION, METHOD FOR PRODUCING NON-FLUORINATED POLYMER, TREATMENT METHOD, AND ARTICLE AGC Inc. (JP) 2025-09-04 US disclosed
EP-1411070-A1 BLOCK COPOLYMER KANEKA CORPORATION (JP) 2004-04-21 EP disclosed
EP-1403291-A1 PROCESS FOR PRODUCING POLYMER HAVING CROSSLINKABLE SILYL GROUP AND CURABLE COMPOSITION KANEKA CORPORATION (JP) 2004-03-31 EP disclosed
EP-1375531-A1 PROCESS FOR PRODUCING VINYL POLYMER HAVING ALKENYL GROUP AT END, VINYL POLYMER, AND CURABLE COMPOSITION KANEKA CORPORATION (JP) 2004-01-02 EP disclosed
US-6632974-B1 Liquid permeable topsheet, a liquid-impermeable and moisture-permeable leakproof sheet, and a liquid retentive absorbent member interposed between the topsheet and the leakproof sheet. A foamed material is disposed in the KAO CORPORATION (JP) 2003-10-14 US disclosed
EP-1062930-A2 Absorbent article KAO CORPORATION (JP) 2000-12-27 EP disclosed
EP-1026206-A1 POLYURETHANE COMPOSITION Sumitomo Chemical Company, Limited (JP) 2000-08-09 EP disclosed
JP-S6327514-A HEAT-RESISTANT, LIGHT-RESISTANT HIGH POLYMER WATER DISPERSION DAINIPPON INK & CHEM INC 1988-02-05 JP disclosed
JP-S62242935-A DEVELOPING SOLUTION FOR DIAZO COPYING RICOH CO LTD 1987-10-23 JP disclosed
JP-S6125143-A DIAZO COPYING METHOD RICOH CO LTD 1986-02-04 JP disclosed
JP-S619643-A DIAZO COPYING MATERIAL RICOH CO LTD 1986-01-17 JP disclosed