Sugi Predict

Sugi Predict / Compounds / SCHEMBL6076178

SCHEMBL6076178

SCHEMBL6076178

c1ccc(SC(Sc2ccccc2)c2ccccc2)cc1

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ MAPK1 P28482 3/20 0.50
▸ CYP1A2 P05177 1/20 0.50
▸ CYP3A4 P08684 1/20 0.50
▸ CYP2D6 P10635 1/20 0.50
▸ CYP2C9 P11712 1/20 0.50
▸ CYP2C19 P33261 1/20 0.50
▸ LMNA P02545 2/20 0.44
▸ SMN1; SMN2 Q16637 2/20 0.43
▸ MAPT P10636 2/20 0.43
▸ HPGD P15428 1/20 0.43
▸ MGLL Q99685 1/20 0.43
▸ HSD17B10 Q99714 1/20 0.43
▸ ALDH1A1 P00352 3/20 0.41
▸ L3MBTL1 Q9Y468 2/20 0.40
▸ PKM P14618 1/20 0.40
▸ TDP1 Q9NUW8 1/20 0.40
▸ DPP4 P27487 2/20 0.39
▸ F2 P00734 1/20 0.39
▸ TSHR P16473 1/20 0.39
▸ MAOA P21397 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17993792 0.85 CYP3A4 (0.49) MAPK1CYP1A2CYP3A4CYP2D6CYP2C9
SCHEMBL10533407 0.84 SLC6A2 (0.52) MAPK1CYP1A2CYP3A4CYP2D6CYP2C9
SCHEMBL10533187 0.84 CHRNA7 (0.50) MAPK1CYP1A2CYP3A4CYP2D6CYP2C9
SCHEMBL12427037 0.84 IDO1 (0.42) MAPK1CYP1A2CYP3A4CYP2D6CYP2C9
SCHEMBL18235720 0.84 MAPK1 (0.47) MAPK1CYP1A2CYP3A4CYP2D6CYP2C9
Fluoride SCHEMBL28760653 0.81 TDP1 (0.56) MAPK1CYP1A2CYP3A4CYP2D6CYP2C9
SCHEMBL10533482 0.79 ALDH1A1 (0.48) MAPK1CYP1A2CYP3A4CYP2D6CYP2C9
SCHEMBL10533440 0.79 MAPK1 (0.44) MAPK1CYP1A2CYP3A4CYP2D6CYP2C9
SCHEMBL9955937 0.78 TDP1 (0.58) MAPK1CYP1A2CYP3A4CYP2D6CYP2C9
SCHEMBL9652490 0.77 LMNA (0.49) MAPK1CYP2D6LMNASMN1; SMN2MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-118666723-A Method for preparing phenyl bis (phenylthio) methane 常州大学 2024-09-20 — — CN claimed
CN-118666723-A Method for preparing phenyl bis (phenylthio) methane 常州大学 2024-09-20 — — CN disclosed
CN-118666723-A Method for preparing phenyl bis (phenylthio) methane 常州大学 2024-09-20 — — CN disclosed
CN-118666723-A Method for preparing phenyl bis (phenylthio) methane 常州大学 2024-09-20 — — CN disclosed
US-20230119812-A1 HEAT TREATMENT OIL COMPOSITION IDEMITSU KOSAN CO.,LTD. (JP) 2023-04-20 — — US disclosed
CN-115003781-A Heat treatment oil composition 出光兴产株式会社 2022-09-02 — — CN disclosed
US-7087787-B1 Method for producing derivatives of 4-alkylsulfinyl methylarylene methanols COVION ORGANIC SEMICONDUCTORS GMBH (DE) 2006-08-08 — — US disclosed
EP-1114025-B1 METHOD FOR PRODUCING DERIVATIVES OF 4-ALKYLSULFINYL METHYLARYLENE METHANOLS COVION ORGANIC SEMICONDUCTORS (DE) 2003-10-29 — — EP disclosed
EP-0819981-B1 Radiation sensitive resin composition JSR CORP (JP) 2002-06-05 — — EP disclosed
EP-1114025-A1 METHOD FOR PRODUCING DERIVATIVES OF 4-ALKYLSULFINYL METHYLARYLENE METHANOLS Celanese Ventures GmbH (DE) 2001-07-11 — — EP disclosed
WO-2000014059-A1 METHOD FOR PRODUCING DERIVATIVES OF 4-ALKYLSULFINYL METHYLARYLENE METHANOLS CELANESE VENTURES GMBH (DE) 2000-03-16 — — WO disclosed
US-5952150-A COMPRISING A DISULFONYLMETHANE DERIVATIVE, A RESIN PROTECTED BY AN ACID DECOMPOSABLE GROUP OR AN ALKALI-SOLUBLE RESIN AND AN ALKALI SOLUBILITY CONTROL AGENT; PHOTORESISTS JSR CORPORATION (JP) 1999-09-14 — — US disclosed
EP-0819981-A1 Radiation sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1998-01-21 — — EP disclosed