Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.58 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.58 |
| ▸ | LMNA | P02545 | 2/20 | 0.44 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.43 |
| ▸ | TSHR | P16473 | 2/20 | 0.43 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.43 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.43 |
| ▸ | CYP2D6 | P10635 | 2/20 | 0.43 |
| ▸ | CYP2C9 | P11712 | 2/20 | 0.43 |
| ▸ | CYP2C19 | P33261 | 2/20 | 0.43 |
| ▸ | MAPT | P10636 | 2/20 | 0.43 |
| ▸ | SLC6A4 | P31645 | 1/20 | 0.43 |
| ▸ | SLC6A3 | Q01959 | 1/20 | 0.43 |
| ▸ | HPGD | P15428 | 1/20 | 0.43 |
| ▸ | MGLL | Q99685 | 1/20 | 0.43 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.43 |
| ▸ | PKM | P14618 | 1/20 | 0.40 |
| ▸ | DPP4 | P27487 | 2/20 | 0.39 |
| ▸ | F2 | P00734 | 1/20 | 0.39 |
| ▸ | MAPK1 | P28482 | 3/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Fluoride SCHEMBL28760653 | 0.97 | TDP1 (0.56) | TDP1L3MBTL1LMNASMN1; SMN2TSHR | |
| SCHEMBL28967309 | 0.84 | TDP1 (0.46) | TDP1L3MBTL1LMNASMN1; SMN2TSHR | |
| SCHEMBL6530051 | 0.79 | HTT (0.50) | TDP1L3MBTL1LMNASMN1; SMN2TSHR | |
| SCHEMBL6076178 | 0.78 | MAPK1 (0.50) | TDP1L3MBTL1LMNASMN1; SMN2TSHR | |
| Trifluoromethanesulfonic Acid SCHEMBL2422008 | 0.78 | L3MBTL1 (0.42) | TDP1L3MBTL1LMNASMN1; SMN2CYP3A4 | |
| SCHEMBL7105332 | 0.77 | TDP1 (0.45) | TDP1L3MBTL1SMN1; SMN2TSHRCYP1A2 | |
| SCHEMBL4976471 | 0.74 | TSHR (0.50) | TDP1L3MBTL1TSHRCYP1A2CYP3A4 | |
| SCHEMBL11753401 | 0.74 | DPP4 (0.48) | LMNASMN1; SMN2MAPTHPGDMGLL | |
| SCHEMBL3484529 | 0.74 | CES2 (0.44) | TDP1L3MBTL1LMNASMN1; SMN2TSHR | |
| SCHEMBL11370239 | 0.74 | L3MBTL1 (0.50) | TDP1L3MBTL1LMNASMN1; SMN2CYP2D6 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 42 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-105264440-B | Anti-corrosion agent composition | 三菱瓦斯化学株式会社 | 2019-09-24 | — | — | CN | disclosed |
| CN-106133604-B | Protectant composition and protectant pattern forming method | 三菱瓦斯化学株式会社 | 2019-09-06 | — | — | CN | disclosed |
| CN-103733135-B | Resist composition, method for forming resist pattern, polyphenol compound used for the same, and alcohol compound derived from the polyphenol compound | 三菱瓦斯化学株式会社 | 2018-11-27 | — | — | CN | disclosed |
| CN-107533291-A | Compound, resist composition, and resist pattern formation method using same | 三菱瓦斯化学株式会社 | 2018-01-02 | — | — | CN | disclosed |
| CN-107430337-A | RADIATION-SENSITIVE COMPOSITION AND RESIST PATTERN FORMATION METHOD | 三菱瓦斯化学株式会社 | 2017-12-01 | — | — | CN | disclosed |
| CN-107430338-A | RADIATION-SENSITIVE COMPOSITION | 三菱瓦斯化学株式会社 | 2017-12-01 | — | — | CN | disclosed |
| CN-107407874-A | Radiation-sensitive composition, amorphous film and corrosion-resisting pattern forming method | 三菱瓦斯化学株式会社 | 2017-11-28 | — | — | CN | disclosed |
| CN-106957217-A | Polyphenol compound for anti-corrosion agent composition | 三菱瓦斯化学株式会社 | 2017-07-18 | — | — | CN | disclosed |
| CN-106462059-A | Resist material, resist composition, and resist pattern formation method | 三菱瓦斯化学株式会社 | 2017-02-22 | — | — | CN | disclosed |
| CN-106133604-A | Protectant composition and protectant pattern forming method | 三菱瓦斯化学株式会社 | 2016-11-16 | — | — | CN | disclosed |
| CN-102596874-A | Cyclic compound, method for producing same, radiation-sensitive composition, and method for forming resist pattern | MITSUBISHI GAS CHEMICAL CO | 2012-07-18 | — | — | CN | disclosed |
| CN-102597034-A | Cyclic compound, manufacturing method therefor, radiation-sensitive composition, and method for forming a resist pattern | MITSUBISHI GAS CHEMICAL CO | 2012-07-18 | — | — | CN | disclosed |
| WO-2012084855-A2 | METHOD FOR PRODUCING TRIAZINYL-SUBSTITUTED OXINDOLES | BAYER CROPSCIENCE AG (DE) | 2012-06-28 | — | — | WO | disclosed |
| CN-102498104-A | Cyclic compound, process for production of the cyclic compound, radiation-sensitive composition, and method for formation of resist pattern | MITSUBISHI GAS CHEMICAL CO | 2012-06-13 | — | — | CN | disclosed |
| CN-101684166-A | Resin and chemically amplified resist composition comprising the same | SUMITOMO CHEMICAL CO | 2010-03-31 | — | — | CN | disclosed |
| CN-101687781-A | Compound for photoacid generator, resist composition using the same, and pattern-forming method | CENTRAL GLASS CO LTD | 2010-03-31 | — | — | CN | disclosed |
| CN-1258573-C | Solidified composition forming as protective membrane, forming method of the membrance and the membrane | JSR CORP (JP) | 2006-06-07 | — | — | CN | disclosed |
| CN-1414048-A | Solidified composition forming as protective membrane, forming method of the membrance and the membrane | JSR CORP (JP) | 2003-04-30 | — | — | CN | disclosed |
| US-4248795-A | BY OXIDATION OF THE CORRESPONDING SULFIDE WITH AN AQUEOUS PERACID SOLUTION | UNION CARBIDE CORPORATION (US) | 1981-02-03 | — | — | US | disclosed |
| US-4097526-A | OXIDIZING SULFIDE COMPOUND WITH HYDROGEN PEROXIDE, A CARBOXYLIC ACID, MINERAL OR SULFONIC ACID CATALYSTS | UNION CARBIDE CORPORATION (US) | 1978-06-27 | — | — | US | disclosed |