Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KIF11 | P52732 | 1/20 | 0.58 |
| ▸ | PARP1 | P09874 | 1/20 | 0.54 |
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.52 |
| ▸ | KDM4E | B2RXH2 | 5/20 | 0.52 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.52 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.52 |
| ▸ | HPGD | P15428 | 3/20 | 0.50 |
| ▸ | TSHR | P16473 | 1/20 | 0.50 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.50 |
| ▸ | GPR84 | Q9NQS5 | 1/20 | 0.49 |
| ▸ | CA1 | P00915 | 3/20 | 0.49 |
| ▸ | CA2 | P00918 | 3/20 | 0.49 |
| ▸ | CA12 | O43570 | 2/20 | 0.49 |
| ▸ | CA7 | P43166 | 2/20 | 0.49 |
| ▸ | CA9 | Q16790 | 2/20 | 0.49 |
| ▸ | CA14 | Q9ULX7 | 2/20 | 0.49 |
| ▸ | XDH | P47989 | 1/20 | 0.49 |
| ▸ | LMNA | P02545 | 1/20 | 0.48 |
| ▸ | LCK | P06239 | 1/20 | 0.47 |
| ▸ | MAPT | P10636 | 3/20 | 0.46 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL30044523 | 1.00 | KIF11 (0.58) | KIF11PARP1ALDH1A1KDM4EMAPK1 | |
| SCHEMBL601845 | 0.84 | KDM4E (0.54) | PARP1ALDH1A1KDM4EMAPK1SMN1; SMN2 | |
| SCHEMBL6782090 | 0.82 | POLB (0.60) | KIF11ALDH1A1KDM4EHPGDTSHR | |
| SCHEMBL976725 | 0.81 | KIF11 (0.59) | KIF11PARP1ALDH1A1KDM4ESMN1; SMN2 | |
| SCHEMBL27729823 | 0.79 | KIF11 (0.58) | KIF11PARP1ALDH1A1KDM4ESMN1; SMN2 | |
| SCHEMBL2527811 | 0.78 | KIF11 (0.56) | KIF11PARP1ALDH1A1KDM4EHPGD | |
| SCHEMBL15855070 | 0.78 | MAPT (0.49) | KIF11ALDH1A1KDM4EHPGDCA1 | |
| SCHEMBL15855047 | 0.78 | MAPT (0.49) | KIF11ALDH1A1KDM4EHPGDCA1 | |
| SCHEMBL7936413 | 0.77 | KIF11 (0.55) | KIF11PARP1ALDH1A1KDM4EHPGD | |
| SCHEMBL10901105 | 0.77 | KIF11 (0.55) | KIF11PARP1ALDH1A1KDM4EHPGD |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 95 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11635688-B2 | Photoimageable compositions and processes for fabrication of relief patterns on low surface energy substrates | KAYAKU ADVANCED MATERIALS, INC. (US) | 2023-04-25 | — | — | US | claimed |
| US-20150024326-A1 | PHOTOIMAGEABLE COMPOSITIONS AND PROCESSES FOR FABRICATION OF RELIEF PATTERNS ON LOW SURFACE ENERGY SUBSTRATES | KAYAKU ADVANCED MATERIALS, INC. | 2015-01-22 | — | — | US | claimed |
| WO-2013134104-A2 | PHOTOIMAGEABLE COMPOSITIONS AND PROCESSES FOR FABRICATION OF RELIEF PATTERNS ON LOW SURFACE ENERGY SUBSTRATES | MICROCHEM CORP. (US) | 2013-09-12 | — | — | WO | claimed |
| WO-2025041519-A1 | PHOTOSENSITIVE RESIN COMPOSITION AND CURED PRODUCT OF SAME | 日本化薬株式会社 | 2025-02-27 | — | — | WO | disclosed |
| US-12189291-B2 | Epoxy formulations and processes for fabrication of relief patterns on low surface energy substrates | KAYAKU ADVANCED MATERIALS, INC. (US) | 2025-01-07 | — | — | US | disclosed |
| US-20240168380-A1 | Photosensitive Resin Composition And Cured Product Therefrom | NIPPON KAYAKU KABUSHIKI KAISHA (JP) | 2024-05-23 | — | — | US | disclosed |
| CN-117950266-A | Photosensitive resin composition and cured product thereof | 日本化药株式会社 | 2024-04-30 | — | — | CN | disclosed |
| CN-111406233-B | Photosensitive resin composition, dry film resist and cured product thereof | 日本化药株式会社 | 2023-12-26 | — | — | CN | disclosed |
| US-11809078-B2 | Photosensitive resin composition, dry film resist, and cured objects obtained therefrom | NIPPON KAYAKU KABUSHIKI KAISHA (JP) | 2023-11-07 | — | — | US | disclosed |
| EP-2980058-B1 | COMPOSITION CONTAINING VINYL-GROUP-CONTAINING COMPOUND | TOKYO OHKA KOGYO CO LTD (JP) | 2023-05-03 | — | — | EP | disclosed |
| US-11635688-B2 | Photoimageable compositions and processes for fabrication of relief patterns on low surface energy substrates | KAYAKU ADVANCED MATERIALS, INC. (US) | 2023-04-25 | — | — | US | disclosed |
| CN-1934498-A | Permanent resist composition, cured product thereof, and use thereof | MICROCHEM CORP (US) | 2007-03-21 | — | — | CN | disclosed |
| CN-1914561-A | Photoresist compositions and processess of use | MICROCHEM CORP (US) | 2007-02-14 | — | — | CN | disclosed |
| EP-1730592-A2 | PERMANENT RESIST COMPOSITION, CURED PRODUCT THEREOF, AND USE THEREOF | MicroChem Corp. (US) | 2006-12-13 | — | — | EP | disclosed |
| WO-2006124552-A2 | METHOD OF FORMING A PHOTORESIST ELEMENT | MICROCHEM CORP. (US) | 2006-11-23 | — | — | WO | disclosed |
| US-20060257785-A1 | Method of forming a photoresist element | MICROCHEM CORP. | 2006-11-16 | — | — | US | disclosed |
| WO-2005119364-A2 | PHOTOIMAGEABLE COATING COMPOSITION AND COMPOSITE ARTICLE THEREOF | MICROCHEM CORP. (US) | 2005-12-15 | — | — | WO | disclosed |
| US-20050266335-A1 | Photoimageable coating composition and composite article thereof | MicroChem Corp., a corporation | 2005-12-01 | — | — | US | disclosed |
| WO-2005079330-A2 | PERMANENT RESIST COMPOSITION, CURED PRODUCT THEREOF, AND USE THEREOF | MICROCHEM CORP. (US) | 2005-09-01 | — | — | WO | disclosed |
| US-20050147918-A1 | Photoresist compositions, hardened forms thereof, hardened patterns thereof and metal patterns formed using them | MicroChem Corp. a corporation of the state of Massachusetts, US | 2005-07-07 | — | — | US | disclosed |