Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4E | B2RXH2 | 5/20 | 0.54 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.54 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.54 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.54 |
| ▸ | CA1 | P00915 | 2/20 | 0.50 |
| ▸ | CA2 | P00918 | 2/20 | 0.50 |
| ▸ | TPMT | P51580 | 2/20 | 0.50 |
| ▸ | CA12 | O43570 | 1/20 | 0.50 |
| ▸ | CA4 | P22748 | 1/20 | 0.50 |
| ▸ | CA6 | P23280 | 1/20 | 0.50 |
| ▸ | CA7 | P43166 | 1/20 | 0.50 |
| ▸ | CA9 | Q16790 | 1/20 | 0.50 |
| ▸ | CA14 | Q9ULX7 | 1/20 | 0.50 |
| ▸ | TTR | P02766 | 3/20 | 0.49 |
| ▸ | HTT | P42858 | 2/20 | 0.47 |
| ▸ | GRIN2D | O15399 | 1/20 | 0.46 |
| ▸ | GRIN2A | Q12879 | 1/20 | 0.46 |
| ▸ | GRIN2C | Q14957 | 1/20 | 0.46 |
| ▸ | LMNA | P02545 | 1/20 | 0.46 |
| ▸ | RAB9A | P51151 | 1/20 | 0.46 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL30044523 | 0.84 | KIF11 (0.58) | KDM4EMAPK1ALDH1A1SMN1; SMN2CA1 | |
| SCHEMBL609398 | 0.84 | KIF11 (0.58) | KDM4EMAPK1ALDH1A1SMN1; SMN2CA1 | |
| SCHEMBL10012830 | 0.78 | GRIN2D (0.61) | KDM4EALDH1A1TTRGRIN2DGRIN2A | |
| SCHEMBL19177351 | 0.78 | GRIN2D (0.61) | KDM4EALDH1A1TTRGRIN2DGRIN2A | |
| SCHEMBL2343264 | 0.78 | GRIN2D (0.61) | KDM4EALDH1A1TTRGRIN2DGRIN2A | |
| SCHEMBL4280339 | 0.77 | ALDH1A1 (0.53) | KDM4EMAPK1ALDH1A1SMN1; SMN2CA12 | |
| SCHEMBL15855056 | 0.77 | TPMT (0.53) | KDM4EMAPK1SMN1; SMN2CA1CA2 | |
| SCHEMBL15855109 | 0.77 | TPMT (0.53) | KDM4EMAPK1CA1CA2TPMT | |
| SCHEMBL978869 | 0.76 | KDM4E (0.59) | KDM4EALDH1A1SMN1; SMN2TTRGRIN2D | |
| SCHEMBL28826423 | 0.75 | PTGER4 (0.57) | KDM4EMAPK1ALDH1A1SMN1; SMN2HTT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 25 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11635688-B2 | Photoimageable compositions and processes for fabrication of relief patterns on low surface energy substrates | KAYAKU ADVANCED MATERIALS, INC. (US) | 2023-04-25 | — | — | US | claimed |
| US-20150024326-A1 | PHOTOIMAGEABLE COMPOSITIONS AND PROCESSES FOR FABRICATION OF RELIEF PATTERNS ON LOW SURFACE ENERGY SUBSTRATES | KAYAKU ADVANCED MATERIALS, INC. | 2015-01-22 | — | — | US | claimed |
| WO-2013134104-A2 | PHOTOIMAGEABLE COMPOSITIONS AND PROCESSES FOR FABRICATION OF RELIEF PATTERNS ON LOW SURFACE ENERGY SUBSTRATES | MICROCHEM CORP. (US) | 2013-09-12 | — | — | WO | claimed |
| US-12189291-B2 | Epoxy formulations and processes for fabrication of relief patterns on low surface energy substrates | KAYAKU ADVANCED MATERIALS, INC. (US) | 2025-01-07 | — | — | US | disclosed |
| US-11635688-B2 | Photoimageable compositions and processes for fabrication of relief patterns on low surface energy substrates | KAYAKU ADVANCED MATERIALS, INC. (US) | 2023-04-25 | — | — | US | disclosed |
| EP-2753662-B1 | EPOXY FORMULATIONS AND PROCESSES FOR FABRICATION OF RELIEF PATTERNS ON LOW SURFACE ENERGY SUBSTRATES | MICROCHEM CORP (US) | 2020-06-24 | — | — | EP | disclosed |
| CN-103874731-B | Epoxy formulations and methods for producing relief patterns on low surface energy substrates | 微量化学公司 | 2017-02-15 | — | — | CN | disclosed |
| US-20150024326-A1 | PHOTOIMAGEABLE COMPOSITIONS AND PROCESSES FOR FABRICATION OF RELIEF PATTERNS ON LOW SURFACE ENERGY SUBSTRATES | KAYAKU ADVANCED MATERIALS, INC. | 2015-01-22 | — | — | US | disclosed |
| US-20140302430-A1 | EPOXY FORMULATIONS AND PROCESSES FOR FABRICATION OF RELIEF PATTERNS ON LOW SURFACE ENERGY SUBSTRATES | MICROCHEM CORP. (US) | 2014-10-09 | — | — | US | disclosed |
| CN-103874731-A | Epoxy formulations and methods for producing relief patterns on low surface energy substrates | MICROCHEM CORP | 2014-06-18 | — | — | CN | disclosed |
| WO-2013134104-A2 | PHOTOIMAGEABLE COMPOSITIONS AND PROCESSES FOR FABRICATION OF RELIEF PATTERNS ON LOW SURFACE ENERGY SUBSTRATES | MICROCHEM CORP. (US) | 2013-09-12 | — | — | WO | disclosed |
| EP-1880248-A2 | METHOD OF FORMING A PHOTORESIST ELEMENT | MicroChem Corp. (US) | 2008-01-23 | — | — | EP | disclosed |
| CN-1934498-A | Permanent resist composition, cured product thereof, and use thereof | MICROCHEM CORP (US) | 2007-03-21 | — | — | CN | disclosed |
| EP-1730592-A2 | PERMANENT RESIST COMPOSITION, CURED PRODUCT THEREOF, AND USE THEREOF | MicroChem Corp. (US) | 2006-12-13 | — | — | EP | disclosed |
| WO-2006124552-A2 | METHOD OF FORMING A PHOTORESIST ELEMENT | MICROCHEM CORP. (US) | 2006-11-23 | — | — | WO | disclosed |
| US-20060257785-A1 | Method of forming a photoresist element | MICROCHEM CORP. | 2006-11-16 | — | — | US | disclosed |
| WO-2005119364-A2 | PHOTOIMAGEABLE COATING COMPOSITION AND COMPOSITE ARTICLE THEREOF | MICROCHEM CORP. (US) | 2005-12-15 | — | — | WO | disclosed |
| US-20050266335-A1 | Photoimageable coating composition and composite article thereof | MicroChem Corp., a corporation | 2005-12-01 | — | — | US | disclosed |
| WO-2005079330-A2 | PERMANENT RESIST COMPOSITION, CURED PRODUCT THEREOF, AND USE THEREOF | MICROCHEM CORP. (US) | 2005-09-01 | — | — | WO | disclosed |
| US-6180320-B1 | Method of manufacturing a semiconductor device having a fine pattern, and semiconductor device manufactured thereby | MITSUBISHI DENKI KABUSHIKI KAISHA (JP) | 2001-01-30 | — | — | US | disclosed |