⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13994978 | 0.86 | TGM2 (0.34) | — | |
| SCHEMBL5144548 | 0.82 | TSHR (0.36) | — | |
| SCHEMBL3686165 | 0.81 | PKM (0.34) | — | |
| SCHEMBL14446201 | 0.81 | PKM (0.34) | — | |
| SCHEMBL4864866 | 0.81 | — | — | |
| SCHEMBL4114020 | 0.81 | — | — | |
| SCHEMBL954294 | 0.80 | TGM2 (0.38) | — | |
| SCHEMBL4862676 | 0.80 | TGM2 (0.31) | — | |
| SCHEMBL6105134 | 0.80 | POLB (0.38) | — | |
| SCHEMBL13866174 | 0.80 | DPP4 (0.33) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20060058480-A1 | Polymerizable monomer polymeric compound resin compositions for photoresist and method for producing semiconductor | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2006-03-16 | — | — | US | disclosed |
| US-20050282985-A1 | FLUORINE-ATOM-CONTAINING POLYMERIZABLE UNSATURATED-MONOMER, FLUORINE-ATOM-CONTAINING POLYMERIC COMPOUND AND PHOTORESIST RESIN COMPOSITION | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2005-12-22 | — | — | US | disclosed |