Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TGM2 | P21980 | 1/20 | 0.38 |
| ▸ | NPSR1 | Q6W5P4 | 2/20 | 0.36 |
| ▸ | CYP19A1 | P11511 | 4/20 | 0.36 |
| ▸ | CYP17A1 | P05093 | 3/20 | 0.34 |
| ▸ | NAAA | Q02083 | 1/20 | 0.34 |
| ▸ | TSHR | P16473 | 1/20 | 0.33 |
| ▸ | EPHX2 | P34913 | 3/20 | 0.33 |
| ▸ | GAA | P10253 | 1/20 | 0.31 |
| ▸ | CA2 | P00918 | 1/20 | 0.31 |
| ▸ | EPHX1 | P07099 | 3/20 | 0.31 |
| ▸ | CASR | P41180 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13994978 | 0.90 | TGM2 (0.34) | TGM2NPSR1 | |
| SCHEMBL6103535 | 0.86 | TSHR (0.51) | TGM2NPSR1CYP19A1NAAATSHR | |
| SCHEMBL3686165 | 0.84 | PKM (0.34) | TGM2 | |
| SCHEMBL14446201 | 0.84 | PKM (0.34) | TGM2 | |
| SCHEMBL4862676 | 0.83 | TGM2 (0.31) | TGM2 | |
| SCHEMBL5008361 | 0.83 | TGM2 (0.31) | TGM2 | |
| SCHEMBL5144548 | 0.83 | TSHR (0.36) | TGM2NPSR1TSHREPHX2 | |
| SCHEMBL13866174 | 0.83 | DPP4 (0.33) | TGM2NPSR1 | |
| SCHEMBL6105134 | 0.83 | POLB (0.38) | TGM2 | |
| SCHEMBL679915 | 0.82 | NPSR1 (0.40) | NPSR1CYP19A1CYP17A1NAAAEPHX2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 37 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9720322-B2 | Photoresist composition, compound, and production method thereof | JSR CORPORATION (JP) | 2017-08-01 | — | — | US | disclosed |
| US-20160370700-A1 | PHOTORESIST COMPOSITION, COMPOUND, AND PRODUCTION METHOD THEREOF | JSR CORPORATION (JP) | 2016-12-22 | — | — | US | disclosed |
| US-9477149-B2 | Photoresist composition, compound, and production method thereof | JSR CORPORATION (JP) | 2016-10-25 | — | — | US | disclosed |
| US-9395625-B2 | Acrylic acid ester derivative and method for producing same, intermediate and method for producing same, high-molecular-weight compound, and photoresist composition | KURARAY CO., LTD. (JP) | 2016-07-19 | — | — | US | disclosed |
| CN-101631626-B | Organic-inorganic composite coating film, the schemochrome film using it and their manufacture method | DIC CORP. (JP) | 2015-09-09 | — | — | CN | disclosed |
| US-20150037733-A1 | ACRYLIC ACID ESTER DERIVATIVE AND METHOD FOR PRODUCING SAME, INTERMEDIATE AND METHOD FOR PRODUCING SAME, HIGH-MOLECULAR-WEIGHT COMPOUND, AND PHOTORESIST COMPOSITION | KURARAY CO., LTD. (JP) | 2015-02-05 | — | — | US | disclosed |
| EP-2821403-A1 | ACRYLIC ACID ESTER DERIVATIVE AND METHOD FOR PRODUCING SAME, INTERMEDIATE AND METHOD FOR PRODUCING SAME, HIGH-MOLECULAR-WEIGHT COMPOUND, AND PHOTORESIST COMPOSITION | Kuraray Co., Ltd. (JP) | 2015-01-07 | — | — | EP | disclosed |
| US-20150004545-A1 | PHOTORESIST COMPOSITION, COMPOUND, AND PRODUCTION METHOD THEREOF | JSR CORPORATION (JP) | 2015-01-01 | — | — | US | disclosed |
| EP-1637514-B1 | METHOD FOR PRODUCING FLUORINE-CONTAINING ACRYLATE | TOSOH F TECH INC (JP) | 2014-05-07 | — | — | EP | disclosed |
| EP-1637514-B1 | METHOD FOR PRODUCING FLUORINE-CONTAINING ACRYLATE | TOSOH F TECH INC (JP) | 2014-05-07 | — | — | EP | disclosed |
| US-20060058480-A1 | Polymerizable monomer polymeric compound resin compositions for photoresist and method for producing semiconductor | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2006-03-16 | — | — | US | disclosed |
| US-20050282985-A1 | FLUORINE-ATOM-CONTAINING POLYMERIZABLE UNSATURATED-MONOMER, FLUORINE-ATOM-CONTAINING POLYMERIC COMPOUND AND PHOTORESIST RESIN COMPOSITION | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2005-12-22 | — | — | US | disclosed |
| US-20050245706-A1 | 6-Trifluoromethyl-2 vinyloxy-4-oxatricyclo[4.2.1.03,7]noname-5-one, and polymer compound | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2005-11-03 | — | — | US | disclosed |
| US-6846949-B2 | Fluorine-containing monomeric ester compound for base resin in photoresist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 2005-01-25 | — | — | US | disclosed |
| CN-1550894-A | Chemical amplification photo etching glue composition | 住友化学工业株式会社 | 2004-12-01 | — | — | CN | disclosed |
| US-20040122255-A1 | Novel fluorine-containing monomeric ester compound for base resin in photoresist composition | OGATA TOSHIYUKI (JP) | 2004-06-24 | — | — | US | disclosed |
| US-6730451-B2 | FLUOROACRYLATE POLYMERS; TRANSPARENCY; PREVENTING NEGATIVE WORKING; LOW ABSORPTION OF FLUORINE EXCIMER LASER LIGHT; HIGH TRANSMITTANCE TO VACUUM ULTRAVIOLET RADITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2004-05-04 | — | — | US | disclosed |
| US-6683202-B2 | CAN BE POLYMERIZABLE USED FOR LIGHT EXPOSURE WITH ULTRAVIOLET LIGHT OF VERY SHORT WAVELENGTH BY VIRTUE OF THE HIGH TRANSPARENCY TO THE SHORT WAVELENGTH LIGHT | TOKYO OHKA, KOGYO CO., LTD. (JP) | 2004-01-27 | — | — | US | disclosed |
| US-20020115883-A1 | Novel fluorine-containing monomeric ester compound for base resin in photoresist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 2002-08-22 | — | — | US | disclosed |
| US-20010010890-A1 | Polymers, chemical amplification resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2001-08-02 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (5 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20160370700-A1 | PHOTORESIST COMPOSITION, COMPOUND, AND PRODUCTION METHOD THEREOF | RARA, H1-0, NR2E3 | TGM2 4318/4885NPSR1 982/4885CYP19A1 626/4885 |
| US-20020115883-A1 | Novel fluorine-containing monomeric ester compound for base resin in photoresist composition | RFT1, AFF1, AFF4 | TGM2 3761/4885NPSR1 2779/4885CYP19A1 2225/4885 |
| US-20050282985-A1 | FLUORINE-ATOM-CONTAINING POLYMERIZABLE UNSATURATED-MONOMER, FLUORINE-ATOM-CONTAINING POLYMERIC COMPOUND AND PHOTORESIST RESIN COMPOSITION | AFF1, AFF2, FPR1 | TGM2 3671/4885NPSR1 2548/4885CYP19A1 2472/4885 |
| US-20040122255-A1 | Novel fluorine-containing monomeric ester compound for base resin in photoresist composition | RFT1, AFF1, AFF4 | TGM2 3761/4885NPSR1 2779/4885CYP19A1 2225/4885 |
| US-20150037733-A1 | ACRYLIC ACID ESTER DERIVATIVE AND METHOD FOR PRODUCING SAME, INTERMEDIATE AND METHOD FOR PRODUCING SAME, HIGH-MOLECULAR-WEIGHT COMPOUND, AND PHOTORESIST COMPOSITION | GFER, ASH2L, MLLT1 | TGM2 2208/4885NPSR1 2868/4885CYP19A1 2407/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.