SCHEMBL610576

SCHEMBL610576

C=C(C)C(=O)OC(C)CC(CC(=O)O)C(=O)O

nearest known ligand 0.38

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 1/20 0.38
FOLH1 Q04609 2/20 0.36
GRIK1 P39086 1/20 0.34
GRIK2 Q13002 1/20 0.34
MME P08473 3/20 0.33
ALDH1A1 P00352 1/20 0.32
CPA1 P15085 2/20 0.32
ALOX15 P16050 1/20 0.32
CPB1 P15086 1/20 0.32
CPA3 P15088 1/20 0.32
CPB2 Q96IY4 1/20 0.32
LMNA P02545 1/20 0.30
SMN1; SMN2 Q16637 1/20 0.30
CACNA2D1 P54289 2/20 0.30
CACNB3 P54284 1/20 0.30
CACNA1C Q13936 1/20 0.30
PGR P06401 1/20 0.30
ADRA1A P35348 1/20 0.30
HTR2B P41595 1/20 0.30
CACNA2D2 Q9NY47 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17310386 0.85 FOLH1 (0.39) TSHRFOLH1GRIK1GRIK2MME
SCHEMBL28272523 0.83 ALDH1A1 (0.58) TSHRALDH1A1
SCHEMBL6365126 0.82 TSHR (0.45) TSHRALDH1A1ALOX15LMNASMN1; SMN2
SCHEMBL611588 0.81 FOLH1 (0.41) TSHRFOLH1GRIK1GRIK2SLC1A3
SCHEMBL611703 0.81 FOLH1 (0.34) TSHRFOLH1GRIK1GRIK2ALDH1A1
SCHEMBL5627412 0.80 TSHR (0.44) TSHRALDH1A1ALOX15LMNASMN1; SMN2
SCHEMBL2544205 0.80 TSHR (0.50) TSHRALDH1A1LMNASMN1; SMN2
SCHEMBL2013862 0.78 TSHR (0.54) TSHRALDH1A1SMN1; SMN2
SCHEMBL3172857 0.77 TSHR (0.38) TSHRFOLH1GRIK1GRIK2MME
SCHEMBL4275495 0.74 TSHR (0.45) TSHRALDH1A1SMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 233 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20260117058-A1 RESIN COMPOSITION, MOLDING MATERIAL, AND MOLDED BODY MITSUBISHI CHEMICAL CORPORATION (JP) 2026-04-30 US disclosed
EP-4733357-A1 RESIN COMPOSITION, MOLDING MATERIAL, AND MOLDED BODY Mitsubishi Chemical Corporation (JP) 2026-04-29 EP disclosed
CN-120044754-A Photosensitive resin composition, color filter and liquid crystal display device 深圳市容大感光科技股份有限公司 2025-05-27 CN disclosed
CN-119902413-A Photosensitive coloring resin composition, color filter, manufacturing method thereof and liquid crystal display device 奇美实业股份有限公司 2025-04-29 CN disclosed
CN-119126423-A Method for manufacturing color filter, and liquid crystal display device 奇美实业股份有限公司 2024-12-13 CN disclosed
CN-119126285-A Method for manufacturing color filter, and liquid crystal display device 奇美实业股份有限公司 2024-12-13 CN disclosed
WO-2024122565-A1 PHOTOSENSITIVE COLORED RESIN COMPOSITION, CURED PRODUCT, PARTITION WALL, ORGANIC ELECTROLUMINESCENT ELEMENT, COLOR FILTER, AND IMAGE DISPLAY DEVICE 三菱ケミカル株式会社 2024-06-13 WO disclosed
US-20240101899-A1 LIGHT EMITTING DEVICE CITIZEN ELECTRONICS CO., LTD. (JP) 2024-03-28 US disclosed
WO-2024034637-A1 PHOTOSENSITIVE COLORED RESIN COMPOSITION, PIGMENT DISPERSION, CURED PRODUCT, PARTITION WALL, ORGANIC ELECTROLUMINESCENT ELEMENT, COLOR FILTER, AND IMAGE DISPLAY DEVICE 三菱ケミカル株式会社 2024-02-15 WO disclosed
CN-107463067-B Black photosensitive resin composition and application thereof 奇美实业股份有限公司 2024-01-26 CN disclosed
US-20070096056-A1 One component resin composition curable with combination of light and heat and use of the same MITSUI CHEMICALS, INC. (JP) 2007-05-03 US disclosed
EP-1742096-A1 BLUE COLOR COMPOSITION FOR COLOR FILTER, COLOR FILTER, AND COLOR IMAGE DISPLAY DEVICE Mitsubishi Chemical Corporation (JP) 2007-01-10 EP disclosed
US-20060241259-A1 Oxime ester photoinitiators with heteroaromatic groups CIBA CORPORATION 2006-10-26 US disclosed
US-7006172-B2 Color liquid crystal display devices MITSUBISHI CHEMICAL CORPORATION (JP) 2006-02-28 US disclosed
US-20040218115-A1 Color liquid crystal display devices MITSUBISHI CHEMICAL CORPORATION (JP) 2004-11-04 US disclosed
US-6576409-B2 Comprising a resinous compound of an acid-decomposing ester of a monovinyl ether, a (meth)acrylic ester capable of forming a carboxylic acid via decomposition by the action of an acid, an acid generator and a polymerization inhibitor TAIYO INK MANUFACTURING CO., LTD. (JP) 2003-06-10 US disclosed
US-20020102501-A1 Photosensitive resin composition and method for formation of resist pattern by use thereof ICHIKAWA MIYAKO (JP) 2002-08-01 US disclosed
US-6338936-B1 RESIN WITH ESTER GROUP, UNSATURATED BOND, GENERATION OF ACID BY EXPOSURE TO ACID AND CATALYSIS TAIYO INK MANUFACTURING CO., LTD. (JP) 2002-01-15 US disclosed
US-6087050-A Radiation sensitive composition and color filter JSR CORPORATION (JP) 2000-07-11 US disclosed
EP-0881541-A1 Radiation sensitive composition and color filter JSR Corporation (JP) 1998-12-02 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20260117058-A1 RESIN COMPOSITION, MOLDING MATERIAL, AND MOLDED BODY MMAB, MAT2B, TRA2B TSHR 3130/4885FOLH1 4074/4885GRIK1 1518/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.