Predicted protein targets (top 16)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NAAA | Q02083 | 1/20 | 0.62 |
| ▸ | RAD52 | P43351 | 1/20 | 0.53 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.53 |
| ▸ | DGKA | P23743 | 1/20 | 0.52 |
| ▸ | FAAH | O00519 | 2/20 | 0.51 |
| ▸ | HTR2C | P28335 | 1/20 | 0.50 |
| ▸ | EPHX1 | P07099 | 1/20 | 0.48 |
| ▸ | TSHR | P16473 | 3/20 | 0.47 |
| ▸ | PRSS1 | P07477 | 1/20 | 0.45 |
| ▸ | PRSS2 | P07478 | 1/20 | 0.45 |
| ▸ | PRSS3 | P35030 | 1/20 | 0.45 |
| ▸ | HCAR2 | Q8TDS4 | 1/20 | 0.44 |
| ▸ | DNM1 | Q05193 | 1/20 | 0.43 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.43 |
| ▸ | LMNA | P02545 | 1/20 | 0.43 |
| ▸ | ACHE | P22303 | 1/20 | 0.43 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6034709 | 1.00 | NAAA (0.62) | NAAARAD52NPSR1DGKAFAAH | |
| SCHEMBL18140111 | 1.00 | NAAA (0.62) | NAAARAD52NPSR1DGKAFAAH | |
| SCHEMBL8751921 | 1.00 | NAAA (0.62) | NAAARAD52NPSR1DGKAFAAH | |
| SCHEMBL9437256 | 1.00 | NAAA (0.62) | NAAARAD52NPSR1DGKAFAAH | |
| SCHEMBL18140142 | 1.00 | NAAA (0.62) | NAAARAD52NPSR1DGKAFAAH | |
| SCHEMBL18140311 | 1.00 | NAAA (0.62) | NAAARAD52NPSR1DGKAFAAH | |
| SCHEMBL18139769 | 1.00 | NAAA (0.62) | NAAARAD52NPSR1DGKAFAAH | |
| SCHEMBL334070 | 1.00 | NAAA (0.62) | NAAARAD52NPSR1DGKAFAAH | |
| SCHEMBL7588972 | 1.00 | NAAA (0.62) | NAAARAD52NPSR1DGKAFAAH | |
| SCHEMBL6116070 | 0.98 | NAAA (0.60) | NAAARAD52NPSR1DGKAFAAH |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 22 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10428194-B2 | Modified acrylic resin cured product, and laminate thereof, and production methods therefor | MITSUI CHEMICALS, INC. (JP) | 2019-10-01 | — | — | US | disclosed |
| EP-3263635-B1 | MODIFIED ACRYLIC RESIN CURED PRODUCT, AND LAMINATE THEREOF, AND PRODUCTION METHODS THEREFOR | MITSUI CHEMICALS INC (JP) | 2019-09-18 | — | — | EP | disclosed |
| US-20180163056-A1 | HYDROPHILIC CURABLE COMPOSITIONS | MITSUI CHEMICALS, INC. (JP) | 2018-06-14 | — | — | US | disclosed |
| US-20180030230-A1 | MODIFIED ACRYLIC RESIN CURED PRODUCT, AND LAMINATE THEREOF, AND PRODUCTION METHODS THEREFOR | MITSUI CHEMICALS, INC. (JP) | 2018-02-01 | — | — | US | disclosed |
| EP-3263635-A1 | MODIFIED ACRYLIC RESIN CURED PRODUCT, AND LAMINATE THEREOF, AND PRODUCTION METHODS THEREFOR | Mitsui Chemicals, Inc. (JP) | 2018-01-03 | — | — | EP | disclosed |
| US-9760060-B2 | Photopolymer formulations for producing holographic media having highly crosslinked matrix polymers | COVESTRO DEUTSCHLAND AG (DE) | 2017-09-12 | — | — | US | disclosed |
| US-9760060-B2 | Photopolymer formulations for producing holographic media having highly crosslinked matrix polymers | COVESTRO DEUTSCHLAND AG (DE) | 2017-09-12 | — | — | US | disclosed |
| US-20170209345-A1 | DENTAL PROSTHESIS | MITSUI CHEMICALS, INC. (JP) | 2017-07-27 | — | — | US | disclosed |
| US-9671690-B2 | Resist composition, method for forming resist pattern, photo-reactive quencher and compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2017-06-06 | — | — | US | disclosed |
| US-9671690-B2 | Resist composition, method for forming resist pattern, photo-reactive quencher and compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2017-06-06 | — | — | US | disclosed |
| US-20160282717-A1 | RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, PHOTO-REACTIVE QUENCHER AND COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2016-09-29 | — | — | US | disclosed |
| US-9146456-B2 | Photopolymer formulation for producing holographic media having highly crosslinked matrix polymers | BAYER INTELLECTUAL PROPERTY GMBH (DE) | 2015-09-29 | — | — | US | disclosed |
| US-9146456-B2 | Photopolymer formulation for producing holographic media having highly crosslinked matrix polymers | BAYER INTELLECTUAL PROPERTY GMBH (DE) | 2015-09-29 | — | — | US | disclosed |
| US-9040224-B2 | Resist composition, method of forming resist pattern and compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2015-05-26 | — | — | US | disclosed |
| US-9040224-B2 | Resist composition, method of forming resist pattern and compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2015-05-26 | — | — | US | disclosed |
| US-20140178821-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN AND COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2014-06-26 | — | — | US | disclosed |
| US-20140178821-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN AND COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2014-06-26 | — | — | US | disclosed |
| US-20130224634-A1 | PHOTOPOLYMER FORMULATION FOR PRODUCING HOLOGRAPHIC MEDIA HAVING HIGHLY CROSSLINKED MATRIX POLYMERS | BAYER INTELLECTUAL PROPERTY GMBH (DE) | 2013-08-29 | — | — | US | disclosed |
| US-20130224634-A1 | PHOTOPOLYMER FORMULATION FOR PRODUCING HOLOGRAPHIC MEDIA HAVING HIGHLY CROSSLINKED MATRIX POLYMERS | BAYER INTELLECTUAL PROPERTY GMBH (DE) | 2013-08-29 | — | — | US | disclosed |
| EP-2450893-A1 | Photopolymer formula for producing of holographic media with highly networked matrix polymers | Bayer MaterialScience AG (DE) | 2012-05-09 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20160282717-A1 | RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, PHOTO-REACTIVE QUENCHER AND COMPOUND | RER1, RCOR3, RFC2 | NAAA 2786/4885RAD52 214/4885NPSR1 1994/4885 |
| US-20170209345-A1 | DENTAL PROSTHESIS | CAD, OR10J3, PSMA3 | NAAA 3105/4885RAD52 1933/4885NPSR1 4087/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.