Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP1A2 | P05177 | 4/20 | 0.42 |
| ▸ | CYP1A1 | P04798 | 3/20 | 0.42 |
| ▸ | CYP1B1 | Q16678 | 3/20 | 0.42 |
| ▸ | FBP1 | P09467 | 3/20 | 0.40 |
| ▸ | PDPK1 | O15530 | 1/20 | 0.39 |
| ▸ | KCNMA1 | Q12791 | 2/20 | 0.38 |
| ▸ | GCK | P35557 | 1/20 | 0.38 |
| ▸ | ADORA2A | P29274 | 1/20 | 0.37 |
| ▸ | ADORA1 | P30542 | 1/20 | 0.37 |
| ▸ | MAPT | P10636 | 3/20 | 0.36 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.36 |
| ▸ | CASP1 | P29466 | 1/20 | 0.36 |
| ▸ | USP2 | O75604 | 1/20 | 0.36 |
| ▸ | ESR2 | Q92731 | 1/20 | 0.36 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.36 |
| ▸ | MEN1 | O00255 | 2/20 | 0.36 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.36 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.36 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.36 |
| ▸ | CASP3 | P42574 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2029417 | 0.82 | FBP1 (0.45) | CYP1A2CYP1A1CYP1B1FBP1PDPK1 | |
| SCHEMBL11484681 | 0.79 | HSP90AA1 (0.41) | FBP1PDPK1ADORA2AADORA1HSD17B10 | |
| SCHEMBL11896552 | 0.79 | GCK (0.50) | CYP1A2CYP1A1CYP1B1FBP1PDPK1 | |
| SCHEMBL8859981 | 0.79 | FBP1 (0.49) | CYP1A2CYP1A1CYP1B1FBP1PDPK1 | |
| SCHEMBL6309721 | 0.76 | GCK (0.47) | CYP1A2CYP1A1CYP1B1FBP1PDPK1 | |
| SCHEMBL17295781 | 0.76 | FBP1 (0.43) | CYP1A2CYP1A1CYP1B1FBP1PDPK1 | |
| SCHEMBL30278504 | 0.76 | S1PR1 (0.43) | CYP1A2CYP1A1CYP1B1FBP1PDPK1 | |
| SCHEMBL28120090 | 0.76 | KCNMA1 (0.53) | KCNMA1HSD17B10USP2KMT2AMEN1 | |
| SCHEMBL14776519 | 0.74 | F2RL1 (0.40) | CYP1A2CYP1A1CYP1B1FBP1PDPK1 | |
| SCHEMBL409776 | 0.74 | PDPK1 (0.53) | PDPK1ADORA2AADORA1LOXL2CYP2A6 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 20 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12429769-B2 | Photosensitive composition and photoresist dry film made therefrom | DUPONT ELECTRONICS, INC. (US) | 2025-09-30 | — | — | US | disclosed |
| WO-2022174211-A1 | PHOTOSENSITIVE COMPOSITION AND PHOTORESIST DRY FILM MADE | DUPONT ELECTRONICS, INC. (US) | 2022-08-18 | — | — | WO | disclosed |
| US-20220252980-A1 | PHOTOSENSITIVE COMPOSITION AND PHOTORESIST DRY FILM MADE THEREFROM | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2022-08-11 | — | — | US | disclosed |
| CN-1675554-A | Matrix for matrix-assisted laser desorption/ionization and application thereof | NUTRICIA NV (NL) | 2005-09-28 | — | — | CN | disclosed |
| EP-1549958-A2 | MALDI-MATRIX | N.V. Nutricia (NL) | 2005-07-06 | — | — | EP | disclosed |
| WO-2004023147-A3 | MALDI-MATRIX | NUTRICIA NV (NL) | 2005-01-06 | — | — | WO | disclosed |
| WO-2004023147-A2 | MALDI-MATRIX | N.V. NUTRICIA (NL) | 2004-03-18 | — | — | WO | disclosed |
| US-6364465-B1 | PRIOR TO IMAGING TO FORM SAID INK PASSAGEWAYS, COMPRISES AN UNSATURATED COMPOUND, A PHOTOINITIATOR, AND THE POLY(AMIC ACID) PREPARED FROM AT LEAST ONE DIANHYDRIDE AND AT LEAST ONE ALIPHATIC DIAMINE. | E. I. DU PONT DE NEMOURS AND COMPANY | 2002-04-02 | — | — | US | disclosed |
| EP-0740210-B1 | Flexible, aqueous processable, photoimageable permanent coatings for printed circuits | DU PONT (US) | 2000-10-04 | — | — | EP | disclosed |
| EP-0740212-B1 | Aqueous processable, multilayer, photoimageable permanent coatings for printed circuits | DU PONT (US) | 2000-09-13 | — | — | EP | disclosed |
| EP-0740211-B1 | Aqueous processable, multilayer, photoimageable permanent coatings for printed circuits | DU PONT (US) | 1999-08-18 | — | — | EP | disclosed |
| US-5728505-A | FLEXIBLE PHOTOPOLYMERIZABLE COATING WITH ALKALINE DEVELOPERS FOR PROTECTIVE COATINGS | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1998-03-17 | — | — | US | disclosed |
| US-5725970-A | PHOTOHARDENED PHOTOPOLYMER LAYER ON SUPPORT, DIFFUSION LAYERS | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1998-03-10 | — | — | US | disclosed |
| US-5643657-A | Aqueous processable, multilayer, photoimageable permanent coatings for printed circuits | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1997-07-01 | — | — | US | disclosed |
| EP-0740212-A1 | Aqueous processable, multilayer, photoimageable permanent coatings for printed circuits | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1996-10-30 | — | — | EP | disclosed |
| EP-0740211-A1 | Aqueous processable, multilayer, photoimageable permanent coatings for printed circuits | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1996-10-30 | — | — | EP | disclosed |
| EP-0740210-A1 | Flexible, aqueous processable, photoimageable permanent coatings for printed circuits | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1996-10-30 | — | — | EP | disclosed |
| EP-0728328-A1 | BROAD BAND REFLECTION HOLOGRAMS AND A DRY PROCESS FOR MAKING SAME | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1996-08-28 | — | — | EP | disclosed |
| WO-1995013568-A1 | BROAD BAND REFLECTION HOLOGRAMS AND A DRY PROCESS FOR MAKING SAME | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1995-05-18 | — | — | WO | disclosed |
| EP-0352774-A1 | Photopolymerisation sensitizer active at longer wavelength | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1990-01-31 | — | — | EP | disclosed |