SCHEMBL6131328

SCHEMBL6131328

C=C(C)C(=O)OC(C)=Cc1ccccc1

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
AKR1C3 P42330 1/20 0.48
MEN1 O00255 2/20 0.46
KMT2A Q03164 2/20 0.46
ALDH1A1 P00352 1/20 0.44
TSHR P16473 1/20 0.44
ELANE P08246 1/20 0.42
RECQL P46063 1/20 0.42
HTT P42858 1/20 0.41
FBP1 P09467 1/20 0.41
GLA P06280 1/20 0.40
TDP1 Q9NUW8 1/20 0.40
AKR1C1 Q04828 1/20 0.39
MAPT P10636 2/20 0.39
SMN1; SMN2 Q16637 1/20 0.39
MTNR1A P48039 2/20 0.38
MTNR1B P49286 2/20 0.38
NPC1 O15118 1/20 0.38
POLB P06746 1/20 0.38
RAB9A P51151 1/20 0.38
NR1I2 O75469 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27870198 0.84 AKR1C3 (0.47) AKR1C3MEN1KMT2AALDH1A1TSHR
SCHEMBL27565774 0.84 AKR1C3 (0.56) AKR1C3MEN1KMT2AALDH1A1TSHR
SCHEMBL28508560 0.83 AKR1C3 (0.46) AKR1C3MEN1KMT2AALDH1A1TSHR
SCHEMBL8508933 0.81 AKR1C3 (0.52) AKR1C3MEN1KMT2AALDH1A1TSHR
SCHEMBL7557638 0.81 ELANE (0.46) AKR1C3MEN1KMT2AALDH1A1TSHR
SCHEMBL8060180 0.81 ELANE (0.46) AKR1C3MEN1KMT2AALDH1A1TSHR
SCHEMBL28380990 0.81 MEN1 (0.50) AKR1C3MEN1KMT2AALDH1A1TSHR
SCHEMBL27870199 0.81 ALDH1A1 (0.49) AKR1C3MEN1KMT2AALDH1A1TSHR
SCHEMBL3248323 0.81 AKR1C3 (0.55) AKR1C3MEN1KMT2AALDH1A1TSHR
SCHEMBL981803 0.81 AKR1C3 (0.55) AKR1C3MEN1KMT2AALDH1A1TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-104238266-B Photosensitive resin composition, black matrix, color filter and liquid crystal display 奇美实业股份有限公司 2018-03-27 CN disclosed
US-6919411-B2 Process for producing polymer compound FUJI PHOTO FILM CO., LTD. (JP) 2005-07-19 US disclosed
US-20030215745-A1 Process for producing polymer compound FUJI PHOTO FILM CO., LTD. 2003-11-20 US disclosed
EP-1344783-A1 Process for producing polymer compounds by elimination reaction FUJI PHOTO FILM CO., LTD. (JP) 2003-09-17 EP disclosed