SCHEMBL8060180

SCHEMBL8060180

C=C(C)C(=O)O/C(=C\c1ccccc1)C(=O)c1ccccc1

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ELANE P08246 1/20 0.46
AKR1C3 P42330 1/20 0.44
CES2 O00748 4/20 0.44
CES1 P23141 4/20 0.44
MAPT P10636 4/20 0.44
ALDH1A1 P00352 3/20 0.44
AKR1C1 Q04828 1/20 0.43
KMT2A Q03164 2/20 0.42
MEN1 O00255 1/20 0.42
LMNA P02545 2/20 0.42
GAA P10253 1/20 0.42
NPSR1 Q6W5P4 2/20 0.42
XBP1 P17861 1/20 0.42
ATM Q13315 1/20 0.42
SMN1; SMN2 Q16637 1/20 0.42
MTNR1A P48039 2/20 0.42
MTNR1B P49286 2/20 0.42
FBP1 P09467 1/20 0.41
TSHR P16473 1/20 0.41
NPC1 O15118 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7557638 1.00 ELANE (0.46) ELANEAKR1C3CES2CES1MAPT
SCHEMBL27870198 0.87 AKR1C3 (0.47) ELANEAKR1C3MAPTALDH1A1AKR1C1
SCHEMBL16498328 0.85 AKR1C3 (0.48) AKR1C3CES2CES1MAPTALDH1A1
SCHEMBL6131328 0.81 AKR1C3 (0.48) ELANEAKR1C3MAPTALDH1A1AKR1C1
SCHEMBL27565774 0.80 AKR1C3 (0.56) ELANEAKR1C3ALDH1A1KMT2AMEN1
SCHEMBL28508560 0.79 AKR1C3 (0.46) ELANEAKR1C3MAPTALDH1A1AKR1C1
SCHEMBL728021 0.78 ABCG2 (0.51) AKR1C3CES2CES1MAPTALDH1A1
SCHEMBL6129273 0.78 ABCG2 (0.51) AKR1C3CES2CES1MAPTALDH1A1
SCHEMBL28380990 0.77 MEN1 (0.50) ELANEAKR1C3MAPTALDH1A1KMT2A
SCHEMBL27870199 0.77 ALDH1A1 (0.49) ELANEAKR1C3MAPTALDH1A1AKR1C1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0453235-A2 Photosensitive resin composition and method of forming conductive pattern NISSHINBO INDUSTRIES, INC. (JP) 1991-10-23 EP claimed
EP-0729068-B1 Photosensitive resin composition and method of forming conductive pattern NISSHIN SPINNING (JP) 2000-07-05 EP disclosed
EP-0729068-A2 Photosensitive resin composition and method of forming conductive pattern NISSHINBO INDUSTRIES, INC. (JP) 1996-08-28 EP disclosed
US-5506091-A Photosensitive resin composition and method of forming conductive pattern NISSHINBO INDUSTRIES, INC. (JP) 1996-04-09 US disclosed
EP-0453235-A2 Photosensitive resin composition and method of forming conductive pattern NISSHINBO INDUSTRIES, INC. (JP) 1991-10-23 EP disclosed