SCHEMBL6139987

SCHEMBL6139987

CC(C)(C)OC(=O)COc1ccc(S(OS(=O)(=O)c2ccccc2)(c2cccnc2)c2cccnc2)cc1

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SMN1; SMN2 Q16637 2/20 0.46
TSHR P16473 1/20 0.44
NAMPT P43490 1/20 0.43
PTPN1 P18031 1/20 0.42
PKM P14618 1/20 0.41
PSEN1 P49768 1/20 0.41
PSEN2 P49810 1/20 0.41
APH1B Q8WW43 1/20 0.41
NCSTN Q92542 1/20 0.41
APH1A Q96BI3 1/20 0.41
PSENEN Q9NZ42 1/20 0.41
MAPT P10636 2/20 0.40
KEAP1 Q14145 2/20 0.39
NFE2L2 Q16236 2/20 0.39
PTGER2 P43116 2/20 0.39
ALDH1A1 P00352 3/20 0.39
NOTUM Q6P988 1/20 0.39
LMNA P02545 2/20 0.39
TP53 P04637 1/20 0.39
RAB9A P51151 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6140361 0.94 RAB9A (0.46) SMN1; SMN2TSHRPSEN1PSEN2APH1B
SCHEMBL6140933 0.94 RAB9A (0.46) SMN1; SMN2TSHRPSEN1PSEN2APH1B
SCHEMBL3190524 0.91 PTPN1 (0.48) TSHRPTPN1PKMPSEN1PSEN2
SCHEMBL8862182 0.87 PTPN1 (0.45) PTPN1PSEN1PSEN2APH1BNCSTN
SCHEMBL3197712 0.87 PTPN1 (0.45) PTPN1PSEN1PSEN2APH1BNCSTN
SCHEMBL6140229 0.86 LMNA (0.43) SMN1; SMN2TSHRNAMPTPSEN1PSEN2
SCHEMBL8664474 0.85 POLB (0.43) SMN1; SMN2TSHRPTPN1PKMPSEN1
SCHEMBL6140480 0.84 PTPN1 (0.43) TSHRPTPN1PSEN1PSEN2APH1B
SCHEMBL6140188 0.84 PTPN1 (0.43) TSHRPTPN1PSEN1PSEN2APH1B
SCHEMBL3190086 0.84 PSEN1 (0.53) SMN1; SMN2PTPN1PSEN1PSEN2APH1B

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6955939-B1 Memory element formation with photosensitive polymer dielectric ADVANCED MICRO DEVICES, INC. (US) 2005-10-18 US disclosed
US-6878961-B2 Photosensitive polymeric memory elements ADVANCED MICRO DEVICES, INC. (US) 2005-04-12 US disclosed
US-20050045877-A1 PHOTOSENSITIVE POLYMERIC MEMORY ELEMENTS MORGAN STANLEY SENIOR FUNDING, INC. 2005-03-03 US disclosed
US-6825060-B1 Photosensitive polymeric memory elements ADVANCED MICRO DEVICES, INC. 2004-11-30 US disclosed
US-6534243-B1 A coating containing a cleaving compound to trim resist features; permitting a deprotection region to form within an inner portion of the patterned resist; removing coating and deprotection region to provide a second patterned feature ADVANCED MICRO DEVICES, INC. 2003-03-18 US disclosed
US-6492075-B1 COATING WITH CLEAVING COMPOUND TO CONTROLLABLY DECREASE SIZE OF DEVELOPED RESIST ADVANCED MICRO DEVICES, INC. 2002-12-10 US disclosed
US-6274289-B1 Chemical resist thickness reduction process ADVANCED MICRO DEVICES, INC. 2001-08-14 US disclosed
US-5847218-A Sulfonium salts and chemically amplified positive resist compositions SHIN-ETSU CHEMICAL CO., LTD. (JP) 1998-12-08 US disclosed