SCHEMBL6141271

SCHEMBL6141271

C=C(C)C(=O)CC(N)=O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL16140641 0.82 ALDH1A1 (0.45)
Methacrylic Acid SCHEMBL5428114 0.80 TDP1 (0.48)
SCHEMBL25512040 0.77
SCHEMBL1561275 0.77
SCHEMBL515405 0.77
SCHEMBL636797 0.75 LMNA (0.44)
SCHEMBL3459289 0.74
Methacrylic Acid SCHEMBL6153040 0.74 TDP1 (0.46)
SCHEMBL8637190 0.74 TDP1 (0.46)
Tert-Butylamine SCHEMBL7649267 0.71 TDP1 (0.75)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-104042453-B Cosmetic composition 科思创聚合物(中国)有限公司 2018-07-06 CN claimed
CN-105380823-A Aqueous nail polish composition BAYER MAT TECH (CHINA) CO LTD 2016-03-09 CN claimed
CN-104803916-B Hete rocyclic derivatives as SARM (SARMS) 詹森药业有限公司 2017-08-11 CN disclosed
CN-105380823-A Aqueous nail polish composition BAYER MAT TECH (CHINA) CO LTD 2016-03-09 CN disclosed
US-20050113541-A1 Polymer, process for preparing the same, and use of the same NIPPON SHOKUBAI CO., LTD. 2005-05-26 US disclosed
EP-1528071-A1 Polymer, process for preparing the same, and use of the same Nippon Shokubai Co., Ltd. (JP) 2005-05-04 EP disclosed
US-4203898-A ANTICARCINOGENIC ELI LILLY AND COMPANY (US) 1980-05-20 US disclosed