SCHEMBL6143069

SCHEMBL6143069

[SiH3][Si](c1ccccc1)(c1ccccc1)c1ccccc1

nearest known ligand 0.36

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 1/20 0.36
ESR2 Q92731 1/20 0.36
ALDH1A1 P00352 5/20 0.35
TSHR P16473 5/20 0.33
GPR3 P46089 2/20 0.33
RAB9A P51151 2/20 0.33
NPC1 O15118 1/20 0.33
MAPK1 P28482 1/20 0.33
NOTUM Q6P988 1/20 0.32
TDP1 Q9NUW8 4/20 0.32
CA1 P00915 2/20 0.32
CA2 P00918 2/20 0.32
CA9 Q16790 2/20 0.32
MAPT P10636 2/20 0.32
CA12 O43570 1/20 0.32
GLA P06280 1/20 0.32
CA3 P07451 1/20 0.32
CA4 P22748 1/20 0.32
CA14 Q9ULX7 1/20 0.32
LMNA P02545 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2233576 0.74 ESR1 (0.39) ESR1ESR2TSHRGPR3MAPT
SCHEMBL2796775 0.73 ESR1 (0.44) ESR1ESR2ALDH1A1TSHRGPR3
SCHEMBL2799324 0.73 ESR1 (0.44) ESR1ESR2ALDH1A1TSHRGPR3
SCHEMBL9587550 0.73 GAA (0.35) ESR1ESR2ALDH1A1TSHRGPR3
SCHEMBL2456201 0.73 ESR1 (0.39) ESR1ESR2ALDH1A1TSHRGPR3
SCHEMBL433139 0.71 ESR1 (0.42) ESR1ESR2ALDH1A1TSHRRAB9A
SCHEMBL242095 0.69 ALDH1A1 (0.40) ESR1ESR2ALDH1A1TSHRRAB9A
SCHEMBL464991 0.69 ALDH1A1 (0.40) ESR1ESR2ALDH1A1TSHRRAB9A
SCHEMBL704149 0.69 CA1 (0.41) ESR1ESR2ALDH1A1TSHRRAB9A
SCHEMBL15641905 0.69 ESR1 (0.46) ESR1ESR2TSHRGPR3TDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115197239-A Preparation method and application of eribulin intermediate 江苏恒瑞医药股份有限公司 2022-10-18 CN disclosed
CN-114456174-A Nitrogen-containing compound, and electronic component and electronic device comprising same 陕西莱特迈思光电材料有限公司 2022-05-10 CN disclosed
CN-108383930-B Method for preparing poly (vinylidene fluoride-trifluoroethylene-chlorotrifluoroethylene) and poly (vinylidene fluoride-trifluoroethylene) 西安交通大学 2021-03-02 CN disclosed
EP-1593149-A1 FLUORINE-FREE PLASMA CURING PROCESS FOR POROUS LOW-K-MATERIALS Axcelis Technologies, Inc. (US) 2005-11-09 EP disclosed
WO-2004066374-A1 FLUORINE-FREE PLASMA CURING PROCESS FOR POROUS LOW-K-MATERIALS AXCELIS TECHNOLOGIES, INC. (US) 2004-08-05 WO disclosed
EP-0551771-B1 Process for producing polysilanes NIPPON OIL CO LTD (JP) 1997-07-30 EP disclosed
US-5620531-A Photovoltaic element NIPPON OIL CO., LTD. (JP) 1997-04-15 US disclosed
EP-0717451-A2 Photovoltaic element NIPPON OIL CO., LTD. (JP) 1996-06-19 EP disclosed
US-5304622-A Process for producing polysilanes NIPPON OIL COMPANY, LTD. (JP) 1994-04-19 US disclosed
EP-0551771-A2 Process for producing polysilanes NIPPON OIL CO. LTD. (JP) 1993-07-21 EP disclosed