Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ESR1 | P03372 | 1/20 | 0.44 |
| ▸ | ESR2 | Q92731 | 1/20 | 0.44 |
| ▸ | TSHR | P16473 | 3/20 | 0.36 |
| ▸ | NR1H2 | P55055 | 2/20 | 0.35 |
| ▸ | NR1H3 | Q13133 | 2/20 | 0.35 |
| ▸ | ACHE | P22303 | 2/20 | 0.35 |
| ▸ | LMNA | P02545 | 1/20 | 0.35 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.35 |
| ▸ | MAPT | P10636 | 1/20 | 0.34 |
| ▸ | GPR3 | P46089 | 2/20 | 0.33 |
| ▸ | NPC1 | O15118 | 3/20 | 0.32 |
| ▸ | RAB9A | P51151 | 3/20 | 0.32 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.32 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.32 |
| ▸ | CES2 | O00748 | 1/20 | 0.31 |
| ▸ | CES1 | P23141 | 1/20 | 0.31 |
| ▸ | TP53 | P04637 | 1/20 | 0.30 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.30 |
| ▸ | CA4 | P22748 | 1/20 | 0.30 |
| ▸ | BRD4 | O60885 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2796775 | 0.81 | ESR1 (0.44) | ESR1ESR2TSHRNR1H2NR1H3 | |
| SCHEMBL15641905 | 0.77 | ESR1 (0.46) | ESR1ESR2TSHRNR1H2NR1H3 | |
| SCHEMBL9590359 | 0.77 | ESR1 (0.41) | ESR1ESR2TSHRNR1H2NR1H3 | |
| SCHEMBL787696 | 0.75 | ESR1 (0.44) | ESR1ESR2TSHRNR1H2NR1H3 | |
| SCHEMBL239179 | 0.73 | ESR1 (0.48) | ESR1ESR2TSHRNR1H2NR1H3 | |
| SCHEMBL439492 | 0.73 | ESR1 (0.48) | ESR1ESR2TSHRNR1H2NR1H3 | |
| SCHEMBL6143069 | 0.73 | ESR1 (0.36) | ESR1ESR2TSHRACHELMNA | |
| SCHEMBL63526 | 0.73 | ESR1 (0.70) | ESR1ESR2TSHRNR1H2NR1H3 | |
| SCHEMBL2169977 | 0.73 | ESR1 (0.48) | ESR1ESR2TSHRNR1H2NR1H3 | |
| SCHEMBL92396 | 0.73 | ESR1 (0.48) | ESR1ESR2TSHRNR1H2NR1H3 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 19 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-109661717-B | Substrate processing method | 株式会社斯库林集团 | 2023-08-22 | — | — | CN | disclosed |
| CN-115010744-A | Method for synthesizing allyl silicon compound by photo-catalysis of eosin Y | 扬州工业职业技术学院 | 2022-09-06 | — | — | CN | disclosed |
| US-7749563-B2 | Two-layer film for next generation damascene barrier application with good oxidation resistance | APPLIED MATERIALS, INC. (US) | 2010-07-06 | — | — | US | disclosed |
| US-7319068-B2 | Method of depositing low k barrier layers | APPLIED MATERIALS, INC. (US) | 2008-01-15 | — | — | US | disclosed |
| US-20070042610-A1 | METHOD OF DEPOSITING LOW K BARRIER LAYERS | APPLIED MATERIALS, INC. | 2007-02-22 | — | — | US | disclosed |
| US-7125813-B2 | Method of depositing low K barrier layers | APPLIED MATERIALS, INC. (US) | 2006-10-24 | — | — | US | disclosed |
| US-7049249-B2 | Method of improving stability in low k barrier layers | APPLIED MATERIALS (US) | 2006-05-23 | — | — | US | disclosed |
| EP-1588410-A1 | A METHOD OF IMPROVING STABILITY IN LOW K BARRIER LAYERS | Applied Materials, Inc. (US) | 2005-10-26 | — | — | EP | disclosed |
| EP-1558784-A2 | TWO-LAYER FILM FOR NEXT GENERATION DAMASCENE BARRIER APPLICATION WITH GOOD OXIDATION RESISTANCE | Applied Materials, Inc. (US) | 2005-08-03 | — | — | EP | disclosed |
| US-20050042858-A1 | Method of improving stability in low k barrier layers | LI LIHUA (US) | 2005-02-24 | — | — | US | disclosed |
| US-20040198070-A1 | Method of depositing low K barrier layers | APPLIED MATERIALS, INC. | 2004-10-07 | — | — | US | disclosed |
| US-6790788-B2 | Method of improving stability in low k barrier layers | APPLIED MATERIALS INC. | 2004-09-14 | — | — | US | disclosed |
| WO-2004064136-A1 | A METHOD OF IMPROVING STABILITY IN LOW K BARRIER LAYERS | APPLIED MATERIALS, INC. (US) | 2004-07-29 | — | — | WO | disclosed |
| US-20040137756-A1 | METHOD OF IMPROVING STABILITY IN LOW K BARRIER LAYERS | APPLIED MATERIALS, INC. | 2004-07-15 | — | — | US | disclosed |
| US-6759327-B2 | Method of depositing low k barrier layers | APPLIED MATERIALS INC. | 2004-07-06 | — | — | US | disclosed |
| WO-2004033752-A2 | TWO-LAYER FILM FOR NEXT GENERATION DAMASCENE BARRIER APPLICATION WITH GOOD OXIDATION RESISTANCE | APPLIED MATERIALS, INC. (US) | 2004-04-22 | — | — | WO | disclosed |
| US-20040067308-A1 | Two-layer film for next generation damascene barrier application with good oxidation resistance | APPLIED MATERIALS, INC. | 2004-04-08 | — | — | US | disclosed |
| WO-2003043073-A2 | A METHOD OF DEPOSITING LOW K BARRIER LAYERS | APPLIED MATERIALS, INC. (US) | 2003-05-22 | — | — | WO | disclosed |
| US-20030068881-A1 | Method of depositing low k barrier layers | APPLIED MATERIALS, INC. | 2003-04-10 | — | — | US | disclosed |