SCHEMBL614377

SCHEMBL614377

C=C(C)C(=O)OCC(Cl)(Cl)Cl

nearest known ligand 0.48

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
TSHR P16473 4/20 0.48
THRB P10828 1/20 0.45
ALDH1A1 P00352 3/20 0.42
TDP1 Q9NUW8 2/20 0.37
POLB P06746 1/20 0.37
APEX1 P27695 1/20 0.37
HTT P42858 1/20 0.37
CHRM2 P08172 1/20 0.30
CHRM4 P08173 1/20 0.30
CHRM1 P11229 1/20 0.30
CHRM3 P20309 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13415059 0.86 TSHR (0.38) TSHRTHRBALDH1A1TDP1POLB
SCHEMBL1171384 0.83 TSHR (0.45) TSHRTHRBALDH1A1TDP1POLB
SCHEMBL31364543 0.83 TSHR (0.45) TSHRTHRBALDH1A1TDP1POLB
SCHEMBL4965154 0.81 ALDH1A1 (0.31) TSHRALDH1A1POLB
SCHEMBL57880 0.81 TSHR (0.52) TSHRTHRBALDH1A1TDP1POLB
SCHEMBL3363977 0.81 GLO1 (0.32) ALDH1A1POLBCHRM2CHRM4CHRM1
SCHEMBL9230930 0.80 ALDH1A1 (0.34) TSHRALDH1A1POLBCHRM2CHRM4
SCHEMBL1695453 0.79 TSHR (0.47) TSHRTHRBALDH1A1TDP1POLB
SCHEMBL1803423 0.79 TSHR (0.42) TSHRTHRBALDH1A1TDP1POLB
SCHEMBL11677414 0.79 TSHR (0.42) TSHRTHRBALDH1A1TDP1POLB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 586 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116376451-A Fast-curing ash-resistant adhesive layer material for ultrathin cover surface, preparation method and application of material 安徽交控工程集团有限公司 2023-07-04 CN claimed
US-10399893-B2 Photo-elastic compensation of thin glass sheets ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2019-09-03 US claimed
EP-3233745-B1 PHOTO-ELASTIC COMPENSATION OF THIN GLASS SHEETS ROHM & HAAS (US) 2019-04-17 EP claimed
US-10133096-B2 Array substrate, display panel, display apparatus, and method for producing array substrate BOE TECHNOLOGY GROUP CO., LTD. (CN) 2018-11-20 US claimed
EP-3321728-A1 ARRAY SUBSTRATE, DISPLAY PANEL, DISPLAY DEVICE AND METHOD FOR PREPARING ARRAY SUBSTRATE BOE Technology Group Co., Ltd. (CN) 2018-05-16 EP claimed
US-20180031871-A1 ARRAY SUBSTRATE, DISPLAY PANEL, DISPLAY APPARATUS, AND METHOD FOR PRODUCING ARRAY SUBSTRATE BOE TECHNOLOGY GROUP CO., LTD. (CN) 2018-02-01 US claimed
US-20170362120-A1 PHOTO-ELASTIC COMPENSATION OF THIN GLASS SHEETS ROHM & HAAS (US) 2017-12-21 US claimed
EP-3233745-A1 PHOTO-ELASTIC COMPENSATION OF THIN GLASS SHEETS Rohm and Haas Company (US) 2017-10-25 EP claimed
EP-2453270-B1 OPTICAL FIBER AND METHOD FOR MANUFACTURING SAME SEKISUI CHEMICAL CO LTD (JP) 2016-06-22 EP claimed
US-8611714-B2 Optical fiber and method for manufacturing same SEKISUI CHEMICAL CO., LTD. (JP) 2013-12-17 US claimed
EP-1473310-B1 LEUKOCYTE REMOVAL FILTER COMPRISING A POLYMER COATING ASAHI KASEI MEDICAL CO LTD (JP) 2009-03-18 EP claimed
EP-1287047-B1 PHOTO-POLYMERS AND USE THEREOF TERAHERTZ PHOTONICS LTD (GB) 2008-08-13 EP claimed
US-20030114619-A1 Photo-polymers and use thereof TERAHERTZ PHOTONICS LIMITED (GB) 2003-06-19 US claimed
EP-1287047-A1 PHOTO-POLYMERS AND USE THEREOF TeraHertz Photonics Limited (GB) 2003-03-05 EP claimed
WO-2001094430-A1 PHOTO-POLYMERS AND USE THEREOF TERAHERTZ PHOTONICS LIMITED (GB) 2001-12-13 WO claimed
US-6029679-A A SILCON WAFER SUBSTRATE IS COVERED WITH A FILM HAVING ELECTROSTATIC REPULSIVE FORCE OR A SUBSTANCE CAPABLE OF CONTROLLING A ZETA POTENTIAL SO AS TO PREVENT ADHESION OF FINE PARTICLES PRESENT IN A CLEANING OR ETCHING SOLUTION HITACHI, LTD. (JP) 2000-02-29 US claimed
EP-0298174-B1 PROTECTION VARNISH ELF ATOCHEM S.A. (FR) 1992-12-23 EP claimed
EP-0208585-B1 MODIFIED COMPOSITION OF THERMOPLASTIC POLYMERS PREPARED IN BULK ELF ATOCHEM S.A. (FR) 1990-08-29 EP claimed
US-4874646-A APPLYING POLYMER RESIST LAYER TO SUBSTRATE, SELECTIVE MELTING WITH LASER SANYO ELECTRIC CO., LTD. (JP) 1989-10-17 US claimed
US-4268607-A Method of patterning a resist layer for manufacture of a semiconductor element VLSI TECHNOLOGY RESEARCH ASSOCIATION (JP) 1981-05-19 US claimed