SCHEMBL6151994

SCHEMBL6151994

[Fe]C1=C(c2ccccc2)CC(c2ccccc2)=C1c1ccccc1

nearest known ligand 0.43

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
CFTR P13569 1/20 0.43
GOPC Q9HD26 1/20 0.43
KMT2A Q03164 1/20 0.42
PTGS2 P35354 9/20 0.40
PTGS1 P23219 6/20 0.40
ESR1 P03372 1/20 0.40
ESR2 Q92731 1/20 0.40
ALDH1A1 P00352 3/20 0.35
ABCB11 O95342 1/20 0.32
MT-CO2 P00403 1/20 0.32
HTR1A P08908 1/20 0.32
ADORA3 P0DMS8 1/20 0.32
MC4R P32245 1/20 0.32
PDE4B Q07343 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8197843 0.83 CFTR (0.52) CFTRGOPCKMT2APTGS2PTGS1
SCHEMBL147807 0.83 CFTR (0.52) CFTRGOPCKMT2APTGS2PTGS1
SCHEMBL868869 0.74 CFTR (0.68) CFTRGOPCKMT2APTGS2PTGS1
SCHEMBL1044880 0.71 ESR1 (0.42) CFTRGOPCKMT2APTGS2PTGS1
Hydrochloric Acid SCHEMBL7760049 0.71 CFTR (0.41) CFTRGOPCKMT2APTGS2PTGS1
Hydrochloric Acid SCHEMBL9066523 0.70 CFTR (0.40) CFTRGOPCKMT2APTGS2PTGS1
Hydrochloric Acid SCHEMBL7758771 0.68 CFTR (0.43) CFTRGOPCKMT2APTGS2PTGS1
SCHEMBL13191298 0.67 ESR1 (0.49) CFTRGOPCKMT2APTGS2PTGS1
Hydrochloric Acid SCHEMBL3373258 0.67 CFTR (0.41) CFTRGOPCKMT2APTGS2PTGS1
Hydrochloric Acid SCHEMBL3373261 0.67 CFTR (0.46) CFTRGOPCKMT2APTGS2PTGS1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1525513-A2 INFRARED-SENSITIVE COMPOSITION CONTAINING A METALLOCENE DERIVATIVE Kodak Polychrome Graphics (US) 2005-04-27 EP disclosed
WO-2004013699-A2 INFRARED-SENSITIVE COMPOSITION CONTAINING A METALLOCENE DERIVATIVE KODAK POLYCHROME GRAPHICS, LLC (US) 2004-02-12 WO disclosed