Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA4 | P22748 | 2/20 | 0.41 |
| ▸ | CA12 | O43570 | 1/20 | 0.36 |
| ▸ | CA1 | P00915 | 1/20 | 0.36 |
| ▸ | CA2 | P00918 | 1/20 | 0.36 |
| ▸ | CA7 | P43166 | 1/20 | 0.36 |
| ▸ | CA9 | Q16790 | 1/20 | 0.36 |
| ▸ | CA14 | Q9ULX7 | 1/20 | 0.36 |
| ▸ | LTA4H | P09960 | 3/20 | 0.35 |
| ▸ | TSHR | P16473 | 4/20 | 0.33 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.33 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.33 |
| ▸ | LMNA | P02545 | 1/20 | 0.33 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.33 |
| ▸ | ACHE | P22303 | 1/20 | 0.33 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.33 |
| ▸ | PDE4B | Q07343 | 1/20 | 0.31 |
| ▸ | TRPA1 | O75762 | 1/20 | 0.31 |
| ▸ | POLB | P06746 | 1/20 | 0.31 |
| ▸ | IDO1 | P14902 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6152339 | 0.77 | CA4 (0.41) | CA4CA12CA1CA2CA7 | |
| SCHEMBL482784 | 0.77 | CA4 (0.41) | CA4CA12CA1CA2CA7 | |
| SCHEMBL5531675 | 0.74 | CA1 (0.41) | CA4CA12CA1CA2CA7 | |
| SCHEMBL29167891 | 0.72 | CA4 (0.38) | CA4CA12CA1CA2CA7 | |
| SCHEMBL6156243 | 0.65 | TSHR (0.39) | CA4CA12CA1CA2CA7 | |
| SCHEMBL6151849 | 0.65 | TSHR (0.39) | CA4CA12CA1CA2CA7 | |
| SCHEMBL392642 | 0.63 | ALDH1A1 (0.40) | CA4CA12CA1CA2CA7 | |
| SCHEMBL11393230 | 0.61 | CA4 (0.50) | CA4CA12CA1CA2CA7 | |
| Biphenyl SCHEMBL3908169 | 0.60 | ALDH1A1 (0.69) | CA4CA12CA1CA2CA7 | |
| Biphenyl SCHEMBL28881047 | 0.60 | ALDH1A1 (0.69) | CA4CA12CA1CA2CA7 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 19 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11692093-B2 | Resin composition, method for producing three-dimensional molding using same, and three-dimensional molding | Konica Minolta, Inc. (JP) | 2023-07-04 | — | — | US | disclosed |
| WO-2021029422-A1 | RADIATION-SENSITIVE COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | JSR株式会社 | 2021-02-18 | — | — | WO | disclosed |
| CN-104049464-B | Gate insulating film, radiation-sensitive composition, cured film, semiconductor element, method for manufacturing semiconductor element, and display device | JSR株式会社 | 2020-10-30 | — | — | CN | disclosed |
| US-20200333707-A1 | RESIST PATTERN-FORMING METHOD, AND RADIATION-SENSITIVE COMPOSITION AND PRODUCTION METHOD THEREOF | JSR CORPORATION (JP) | 2020-10-22 | — | — | US | disclosed |
| US-20200263023-A1 | RESIN COMPOSITION, METHOD FOR PRODUCING THREE-DIMENSIONAL MOLDING USING SAME, AND THREE-DIMENSIONAL MOLDING | Konica Minolta, Inc. (JP) | 2020-08-20 | — | — | US | disclosed |
| WO-2019193961-A1 | RESIN COMPOSITION, METHOD FOR MANUFACTURING THREE-DIMENSIONALLY SHAPED ARTICLE USING SAME, AND THREE-DIMENSIONALLY SHAPED ARTICLE | コニカミノルタ株式会社 | 2019-10-10 | — | — | WO | disclosed |
| US-20170362412-A1 | COMPOSITION FOR FILM FORMATION, AND PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2017-12-21 | — | — | US | disclosed |
| US-9809489-B2 | Composition for forming a conductive film, a conductive film, a method for producing a plating film, a plating film, and an electronic device | JSR CORPORATION (JP) | 2017-11-07 | — | — | US | disclosed |
| CN-103688221-B | Photosensitive resin composition, cured product and spacer | 三洋化成工业株式会社 | 2016-08-17 | — | — | CN | disclosed |
| US-20160081189-A1 | COMPOSITION FOR FORMING A CONDUCTIVE FILM, A CONDUCTIVE FILM, A METHOD FOR PRODUCING A PLATING FILM, A PLATING FILM, AND AN ELECTRONIC DEVICE | JSR CORPORATION (JP) | 2016-03-17 | — | — | US | disclosed |
| US-20150296646-A1 | PROTECTIVE PLATE AND DISPLAY DEVICE | SHARP KABUSHIKI KAISHA (JP) | 2015-10-15 | — | — | US | disclosed |
| US-20150284539-A1 | COMPOSITION FOR FILM FORMATION, AND PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2015-10-08 | — | — | US | disclosed |
| CN-104049464-A | Grid insulation membrane, radiation sensitivity composition, hardened membrane, semiconductor element, manufacturing method of semiconductor element, and display device | JSR CORP | 2014-09-17 | — | — | CN | disclosed |
| CN-103688221-A | Photosensitive resin composition, cured product and spacer | SANYO CHEMICAL IND LTD | 2014-03-26 | — | — | CN | disclosed |
| CN-102156387-B | Radiation-sensitive composition and cured film | JSR CORP | 2014-01-15 | — | — | CN | disclosed |
| CN-102413597-A | Light-emitting element and composition for forming particle-containing layer | JSR CORP | 2012-04-11 | — | — | CN | disclosed |
| CN-102156387-A | Radiation-sensitive composition and cured film | JSR CORP | 2011-08-17 | — | — | CN | disclosed |
| US-20050153145-A1 | Makes adhesion, printing, coating, or the like on the solid surface easy without directly using a flame treatment | YAMASHITA MIKIO (JP) | 2005-07-14 | — | — | US | disclosed |
| EP-1538234-A2 | Method of modifying solid surface and product obtained | Yasuhiro, Mori (JP) | 2005-06-08 | — | — | EP | disclosed |