SCHEMBL482784

SCHEMBL482784

CO[Ti](OC)(OC)c1ccccc1

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CA4 P22748 2/20 0.41
CA12 O43570 1/20 0.36
CA1 P00915 1/20 0.36
CA2 P00918 1/20 0.36
CA7 P43166 1/20 0.36
CA9 Q16790 1/20 0.36
CA14 Q9ULX7 1/20 0.36
LTA4H P09960 4/20 0.35
TSHR P16473 3/20 0.33
MAPK1 P28482 2/20 0.33
ALDH1A1 P00352 2/20 0.33
LMNA P02545 1/20 0.33
ALOX12 P18054 1/20 0.33
ACHE P22303 1/20 0.33
KDM4E B2RXH2 1/20 0.33
SMN1; SMN2 Q16637 1/20 0.33
PDE4B Q07343 1/20 0.31
TRPA1 O75762 1/20 0.31
POLB P06746 1/20 0.31
KCNN4 O15554 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6152339 0.77 CA4 (0.41) CA4CA12CA1CA2CA7
SCHEMBL6152732 0.77 CA4 (0.41) CA4CA12CA1CA2CA7
SCHEMBL959288 0.76 LTA4H (0.37) CA4LTA4HTSHRALDH1A1ACHE
SCHEMBL5531675 0.74 CA1 (0.41) CA4CA12CA1CA2CA7
SCHEMBL29167891 0.72 CA4 (0.38) CA4CA12CA1CA2CA7
SCHEMBL3609530 0.70 ALDH1A1 (0.35) CA4TSHRALDH1A1LMNA
SCHEMBL18528715 0.67 CA1 (0.34) CA1CA2ALDH1A1SMN1; SMN2
SCHEMBL3614968 0.66 ALDH1A1 (0.38) TSHRALDH1A1LMNAALOX12POLB
SCHEMBL6156243 0.65 TSHR (0.39) CA4CA12CA1CA2CA7
SCHEMBL6151849 0.65 TSHR (0.39) CA4CA12CA1CA2CA7

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 238 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-105452393-B It can be thermally cured coating system 荷兰应用自然科学研究组织TNO 2019-04-09 CN claimed
US-10144848-B2 Thermally curable coating systems NEDERLANDSE ORGANISATIE VOOR TOEGEPAST-NATUURWETENSCHAPPELIJK ONDERZOEK TNO (NL) 2018-12-04 US claimed
EP-2999753-B1 THERMALLY CURABLE COATING SYSTEMS TNO (NL) 2018-07-25 EP claimed
US-20160122584-A1 THERMALLY CURABLE COATING SYSTEMS NEDERLANDSE ORGANISATIE VOOR TOEGEPAST-NATUURWETENSCHAPPELIJK ONDERZOEK TNO (NL) 2016-05-05 US claimed
EP-2999753-A1 THERMALLY CURABLE COATING SYSTEMS Nederlandse Organisatie voor toegepast- natuurwetenschappelijk onderzoek TNO (NL) 2016-03-30 EP claimed
CN-105452393-A Thermally curable coating systems NEDERLANDSE ORGANISATIE VOOR TOEGEPAST-NATUURWETENSCHAPPELIJK ONDERZOEK TNO 2016-03-30 CN claimed
EP-2808364-A1 Thermally curable coating systems Nederlandse Organisatie voor toegepast -natuurwetenschappelijk onderzoek TNO (NL) 2014-12-03 EP claimed
WO-2014189373-A1 THERMALLY CURABLE COATING SYSTEMS NEDERLANDSE ORGANISATIE VOOR TOEGEPAST-NATUURWETENSCHAPPELIJK ONDERZOEK TNO (NL) 2014-11-27 WO claimed
US-20240030448-A1 CONDUCTIVE MATERIAL DISPERSION, AND METHODS FOR MANUFACTURING POSITIVE ELECTRODE FOR LITHIUM ION SECONDARY BATTERY AND LITHIUM ION SECONDARY BATTERY USING SAME MIKUNI SHIKISO KABUSHIKI KAISHA (JP) 2024-01-25 US disclosed
US-11692093-B2 Resin composition, method for producing three-dimensional molding using same, and three-dimensional molding Konica Minolta, Inc. (JP) 2023-07-04 US disclosed
EP-3685989-B1 OBJECT-GRIPPING ATTACHMENT AND INDUSTRIAL ROBOT USING OBJECT-GRIPPING ATTACHMENT KONICA MINOLTA INC (JP) 2023-03-15 EP disclosed
CN-112657447-B Chemical conversion process 荷兰应用自然科学研究组织TNO 2023-02-17 CN disclosed
EP-4120399-A1 CONDUCTIVE MATERIAL DISPERSION, AND METHODS FOR MANUFACTURING POSITIVE ELECTRODE FOR LITHIUM ION SECONDARY BATTERY AND LITHIUM ION SECONDARY BATTERY USING SAME Mikuni Shikiso Kabushiki Kaisha (JP) 2023-01-18 EP disclosed
CN-115280556-A Conductive material dispersion liquid, positive electrode for lithium ion secondary battery using same, and method for producing lithium ion secondary battery 御国色素株式会社 2022-11-01 CN disclosed
US-6096479-A IMAGE FORMING MATERIAL COMPRISES AN INFRARED LIGHT ABSORBING AGENT HAVING A HYDROPHOBIC GROUP WHICH CHANGES TO HYDROPHILIC DUE TO HEAT; CAN BE DIRECTLY PREPARED; LASER DECOMPOSES THE INFRARED LIGHT ABSORBING AGENT, GENERATING ACID FUJI PHOTO FILM CO., LTD. (JP) 2000-08-01 US disclosed
EP-0965885-A1 INORGANIC-CONTAINING PHOTOSENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING INORGANIC PATTERN Kansai Research Institute (JP) 1999-12-22 EP disclosed
EP-0963789-A2 Photocatalyst-containing coating composition JAPAN as represented by DIRECTOR GENERAL OF AGENCY OF INDUSTRIAL SCIENCE AND TECHNOLOGY (JP) 1999-12-15 EP disclosed
US-5981425-A A PHOTOCATALYST CONTAINING CALCIUM PHOSPHATE AND TITANIUM OXIDE; PROTECTIVE COATING; WEATHERPROOFING, NONDESTRUCTIVE; DURABILITY AND OXIDATION RESISTANCE AGENCY OF INDUSTRIAL SCIENCE & TECH. (JP) 1999-11-09 US disclosed
EP-0938972-A1 Photosensitive lithographic form plate using an image-forming material FUJI PHOTO FILM CO., LTD. (JP) 1999-09-01 EP disclosed
EP-0903224-A2 Radiation-sensitive planographic plate FUJI PHOTO FILM CO., LTD. (JP) 1999-03-24 EP disclosed