⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL24499062 | 0.80 | — | — | |
| SCHEMBL20572370 | 0.80 | — | — | |
| SCHEMBL6057942 | 0.78 | — | — | |
| SCHEMBL11130262 | 0.77 | — | — | |
| SCHEMBL10983528 | 0.77 | — | — | |
| SCHEMBL10774589 | 0.77 | — | — | |
| SCHEMBL24499436 | 0.76 | — | — | |
| SCHEMBL268102 | 0.74 | ALDH1A1 (0.48) | — | |
| SCHEMBL29279605 | 0.74 | — | — | |
| SCHEMBL5408152 | 0.74 | DGAT1 (0.36) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2024150677-A1 | ACTIVE-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION | 富士フイルム株式会社 | 2024-07-18 | — | — | WO | disclosed |
| WO-2024150676-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION | 富士フイルム株式会社 | 2024-07-18 | — | — | WO | disclosed |
| US-20140284306-A1 | METHOD FOR MANUFACTURING POROUS STRUCTURE AND METHOD FOR FORMING PATTERN | KABUSHIKI KAISHA TOSHIBA (JP) | 2014-09-25 | — | — | US | disclosed |
| US-8778201-B2 | Method for manufacturing porous structure and method for forming pattern | KABUSHIKI KAISHA TOSHIBA (JP) | 2014-07-15 | — | — | US | disclosed |
| US-8435416-B2 | Method for manufacturing porous structure and method for forming pattern | KABUSHIKI KAISHA TOSHIBA (JP) | 2013-05-07 | — | — | US | disclosed |
| US-8394877-B2 | Method for manufacturing porous structure and method for forming pattern | KABUSHIKA KAISHA TOSHIBA (JP) | 2013-03-12 | — | — | US | disclosed |
| US-20120037594-A1 | METHOD FOR MANUFACTURING POROUS STRUCTURE AND METHOD FOR FORMING PATTERN | ASAKAWA KOJI (JP) | 2012-02-16 | — | — | US | disclosed |
| US-20120041121-A1 | METHOD FOR MANUFACTURING POROUS STRUCTURE AND METHOD FOR FORMING PATTERN | ASAKAWA KOJI (JP) | 2012-02-16 | — | — | US | disclosed |
| US-20120037595-A1 | METHOD FOR MANUFACTURING POROUS STRUCTURE AND METHOD FOR FORMING PATTERN | ASAKAWA KOJI (JP) | 2012-02-16 | — | — | US | disclosed |
| US-8043520-B2 | Method for manufacturing porous structure and method for forming pattern | KABUSHIKI KAISHA TOSHIBA (JP) | 2011-10-25 | — | — | US | disclosed |
| US-20090130380-A1 | METHOD FOR MANUFACTURING POUROUS STRUCTURE AND METHOD FOR FORMING PATTERN | ASAKAWA KOJI | 2009-05-21 | — | — | US | disclosed |
| US-7517466-B2 | Method for manufacturing porous structure and method for forming pattern | KABUSHIKI KAISHA TOSHIBA (JP) | 2009-04-14 | — | — | US | disclosed |
| US-20060231525-A1 | Forming microphase-separated structure in film of graft or block copolymer with a chain of polyacrylonitrile, polycyclohexadiene derivative, polybutadiene, polysilane, polysiloxane, polyamic acid or polyaniline and thermally decomposable polymer chain; heating to decompose the decomposable phase; etching | ASAKAWA KOJI | 2006-10-19 | — | — | US | disclosed |
| US-7097781-B2 | Method for manufacturing porous structure and method for forming pattern | KABUSHIKI KAISHA TOSHIBA (JP) | 2006-08-29 | — | — | US | disclosed |
| US-7090784-B2 | Forming pattern using graft polymer containing metal particles; overcoating substrates; removal polymer | KABUSHIKI KAISHA TOSHIBA (JP) | 2006-08-15 | — | — | US | disclosed |
| US-20040050816-A1 | Forming pattern using graft polymer containing metal particles; overcoating substrates; removal polymer | KABUSHIKI KAISHA TOSHIBA (JP) | 2004-03-18 | — | — | US | disclosed |
| US-20030222048-A1 | Method for manufacturing porous structure and method for forming pattern | KABUSHIKI KAISHA TOSHIBA (JP) | 2003-12-04 | — | — | US | disclosed |
| US-6565763-B1 | Method for manufacturing porous structure and method for forming pattern | KABUSHIKI KAISHA TOSHIBA (JP) | 2003-05-20 | — | — | US | disclosed |