Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.45 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.45 |
| ▸ | LTB4R | Q15722 | 1/20 | 0.44 |
| ▸ | TAAR1 | Q96RJ0 | 4/20 | 0.44 |
| ▸ | ADORA1 | P30542 | 1/20 | 0.44 |
| ▸ | SLC6A4 | P31645 | 3/20 | 0.43 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.43 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.43 |
| ▸ | MAPT | P10636 | 1/20 | 0.43 |
| ▸ | MPO | P05164 | 1/20 | 0.42 |
| ▸ | SLC6A2 | P23975 | 2/20 | 0.42 |
| ▸ | SLC6A3 | Q01959 | 2/20 | 0.42 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.42 |
| ▸ | CMA1 | P23946 | 1/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29375993 | 1.00 | ALDH1A1 (0.45) | ALDH1A1HSD17B10LTB4RTAAR1ADORA1 | |
| SCHEMBL3283994 | 0.86 | ALDH1A1 (0.41) | ALDH1A1HSD17B10LTB4RTAAR1SLC6A4 | |
| SCHEMBL6945769 | 0.80 | ALDH1A1 (0.48) | ALDH1A1HSD17B10LTB4RTAAR1ADORA1 | |
| SCHEMBL6942147 | 0.77 | CALM1 (0.49) | ALDH1A1HSD17B10LTB4RTAAR1ADORA1 | |
| SCHEMBL6939968 | 0.77 | ALDH1A1 (0.51) | ALDH1A1HSD17B10LTB4RTAAR1ADORA1 | |
| SCHEMBL109195 | 0.75 | TAAR1 (0.64) | ALDH1A1TAAR1SLC6A4CYP1A2CYP3A4 | |
| SCHEMBL6942102 | 0.74 | ALDH1A1 (0.46) | ALDH1A1HSD17B10LTB4RTAAR1ADORA1 | |
| SCHEMBL29352001 | 0.74 | ADORA2A (0.47) | ALDH1A1HSD17B10ADORA1CYP1A2CYP3A4 | |
| SCHEMBL391704 | 0.74 | ADORA2A (0.47) | ALDH1A1HSD17B10ADORA1CYP1A2CYP3A4 | |
| SCHEMBL6942293 | 0.73 | ALDH1A1 (0.51) | ALDH1A1HSD17B10LTB4RTAAR1SLC6A4 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1136 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10254646-B2 | Composition sensitive to radiation in electromagnetic spectrum ranges for printing purposes, printing plate comprising said composition, use of said composition and image development process | IBF INDUSTRIA BRASILEIRA DE FILMES S/A (BR) | 2019-04-09 | — | — | US | claimed |
| US-10108089-B2 | Photosensitive resin composition and method for forming quantum dot pattern using the same | BOE TECHNOLOGY GROUP CO., LTD. (CN) | 2018-10-23 | — | — | US | claimed |
| US-20180031912-A1 | METHODS OF FABRICATING QUANTUM DOT COLOR FILM SUBSTRATES | SHENZHEN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO. | 2018-02-01 | — | — | US | claimed |
| CN-103728837-B | Photosensitve resin composition and the method preparing quantum dot pattern with Photosensitve resin composition | 京东方科技集团股份有限公司 | 2016-08-31 | — | — | CN | claimed |
| US-20160062180-A1 | COLOR FILTER COMPOSITION AND LIQUID CRYSTAL DISPLAY INCLUDING THE SAME | SAMSUNG DISPLAY CO., LTD. (KR) | 2016-03-03 | — | — | US | claimed |
| US-20160060527-A1 | COLOR FILTER COMPOSITION AND LIQUID CRYSTAL DISPLAY INCLUDING THE SAME | SAMSUNG DISPLAY CO LTD (KR) | 2016-03-03 | — | — | US | claimed |
| CN-105353555-A | Manufacturing method of quantum dot color film substrate | SHENZHEN CHINA STAR OPTOELECT | 2016-02-24 | — | — | CN | claimed |
| US-20160026080-A1 | COMPOSITION SENSITIVE TO RADIATION IN ELECTROMAGNETIC SPECTRUM RANGES FOR PRINTING PURPOSES, PRINTING PLATE COMPRISING SAID COMPOSITION, USE OF SAID COMPOSITION AND IMAGE DEVLOPMENT PROCESS | IBF INDUSTRIA BRASILEIRA DE FILMES S/A (BR) | 2016-01-28 | — | — | US | claimed |
| US-9244354-B2 | Method for producing thick film photoresist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2016-01-26 | — | — | US | claimed |
| US-20160011506-A1 | PHOTOSENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING QUANTUM DOT PATTERN USING THE SAME | BOE TECHNOLOGY GROUP CO., LTD. (CN) | 2016-01-14 | — | — | US | claimed |
| EP-2937733-A1 | COMPOSITION SENSITIVE TO RADIATION IN ELECTROMAGNETIC SPECTRUM RANGES FOR PRINTING PURPOSES, PRINTING PLATE COMPRISING SAID COMPOSITION, USE OF SAID COMPOSITION AND IMAGE DEVELOPMENT PROCESS | IBF - Indústria Brasileira de Filmes S/A (BR) | 2015-10-28 | — | — | EP | claimed |
| US-8945815-B2 | Alkaline soluble resin and light sensible resin composition comprising same and use thereof | BOE TECHNOLOGY GROUP CO., LTD. (CN) | 2015-02-03 | — | — | US | claimed |
| CN-102653581-B | Alkali soluble resin, preparation method thereof, photosensitive resin composite and photoresist | BOE TECHNOLOGY GROUP CO LTD | 2014-12-17 | — | — | CN | claimed |
| CN-102875745-B | Alkali soluble resin, photosensitive resin composition containing it and application thereof | BOE TECHNOLOGY GROUP CO LTD | 2014-07-09 | — | — | CN | claimed |
| CN-102778813-B | Photosensitive resin composition | BOE TECHNOLOGY GROUP CO LTD | 2014-04-16 | — | — | CN | claimed |
| US-20130171566-A1 | ALKALINE SOLUBIE RESIN AND LIGHT SENSIBLE RESIN COMPOSITION COMPRISING SAME AND USE THEREOF | BOE TECHNOLOGY GROUP CO., LTD. (CN) | 2013-07-04 | — | — | US | claimed |
| US-6723493-B2 | 4-PIPERONYL- 2,6-BIS(TRICHLOROMETHYL)-S-TRIAZINE AS FREE RADICAL INITIATOR; LEUCOMALACHITE GREEN AS EXPOSURE INDICATING DYE; OLEOPHILIC POLYMER AND CURABLE MONOMER | ROHM AND HAAS ELECTRONIC MATERIALS LLC | 2004-04-20 | — | — | US | claimed |
| US-20030165777-A1 | Negative lithographic printing plate comprising a specific compound in the photosensitive layer | ROHM AND HAAS ELECTRONIC MATERIALS LLC | 2003-09-04 | — | — | US | claimed |
| EP-0933681-A1 | Positive-tone photoimageable crosslinkable coating | MORTON INTERNATIONAL, INC. (US) | 1999-08-04 | — | — | EP | claimed |
| US-5496903-A | PHOTPOLYMERIZABLE COATING | NIPPON PAINT COMPANY, LTD. (JP) | 1996-03-05 | — | — | US | claimed |