SCHEMBL6205463

SCHEMBL6205463

COC([O])CC1CCCCC1

nearest known ligand 0.46

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
CTSK P43235 8/20 0.37
CTSL P07711 5/20 0.35
CTSB P07858 5/20 0.35
CTSH P09668 4/20 0.34
CYP1A2 P05177 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9205347 0.76 CYP1A2 (0.36) CTSKCTSLCTSBCTSHCYP1A2
SCHEMBL14537236 0.74 CTSK (0.45) CTSKCTSLCTSBCTSHCYP1A2
SCHEMBL9819745 0.73 CTSK (0.40) CTSKCTSLCTSBCTSHCYP1A2
SCHEMBL8020386 0.73 CTSK (0.40) CTSKCTSLCTSBCTSHCYP1A2
SCHEMBL6205465 0.73 CTSK (0.37) CTSKCTSLCTSBCTSHCYP1A2
SCHEMBL10433960 0.73 CTSK (0.33) CTSKCTSLCTSBCTSHCYP1A2
SCHEMBL11239152 0.71 CTSK (0.42) CTSKCTSLCTSBCTSHCYP1A2
SCHEMBL28997818 0.71 CTSK (0.36) CTSKCTSLCTSBCTSHCYP1A2
SCHEMBL8020431 0.70
SCHEMBL15732817 0.70 CTSK (0.31) CTSKCYP1A2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 24 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-102243386-B Liquid crystal display cells, positive radiation line sensitive compositions, interlayer dielectric used for liquid crystal display element and forming method thereof JSR株式会社 2016-08-10 CN disclosed
CN-102870047-B Positive radiation-sensitive composition, display element interlayer dielectric and forming method thereof JSR CORP. (JP) 2016-03-02 CN disclosed
CN-102870045-B Positive Radiation-sensitive Composition For Discharge Nozzle Coating Method, Interlayer Insulating Film For Display Element, And Formation Method For Same JSR CORP 2014-11-19 CN disclosed
CN-102213918-B Positive type radiation-sensitive composition, inter-layer insulating film and forming method therefor JSR CORP 2014-07-16 CN disclosed
CN-101646718-B Curable resin composition, protective film, and method for forming protective film JSR CORP JP 2013-04-03 CN disclosed
CN-102967970-A Array substrate, liquid display element, and method for manufacturing array subsrtate JSR CORP 2013-03-13 CN disclosed
CN-102870045-A Positive Radiation-sensitive Composition For Discharge Nozzle Coating Method, Interlayer Insulating Film For Display Element, And Formation Method For Same JSR CORP 2013-01-09 CN disclosed
CN-102870047-A Positive radiation-sensitive composition, interlayer insulating film for display element, and formation method for same JSR CORP 2013-01-09 CN disclosed
CN-102859439-A Positive radiation-sensitive composition, interlayer insulating film for display element, and formation method for same JSR CORP 2013-01-02 CN disclosed
CN-101153121-B Radiation-sensitive resin composition for spacer, spacer and method for forming the same JSR CORP 2012-11-14 CN disclosed
CN-102213918-A Positive type radiation-sensitive composition, inter-layer insulating film and forming method therefor JSR CORP 2011-10-12 CN disclosed
CN-101186740-B Hot curing resin composition and color filter protection film JSR CORP 2011-05-25 CN disclosed
CN-101646718-A The formation method of curable resin composition, protective membrane and protective membrane JSR CORP JP 2010-02-10 CN disclosed
CN-100506877-C Curable resin composition, protective film, and method for forming same JSR CORP (JP) 2009-07-01 CN disclosed
CN-101186740-A Hot curing resin composition and color filter protection film JSR CORP (JP) 2008-05-28 CN disclosed
CN-101153121-A Radiation-sensitive resin composition for spacer, spacer and method for forming the same JSR CORP (JP) 2008-04-02 CN disclosed
CN-101025567-A Radiation-sensitive resin composition, method for forming spacer and spacer JSR CORP (JP) 2007-08-29 CN disclosed
CN-1898291-A Curable resin composition, overcoats, and process for formation thereof JSR CORP (JP) 2007-01-17 CN disclosed
EP-1506175-A1 N-SUBSTITUTED TRICYCLIC 3-AMINOPYRAZOLES AS PDGF RECEPTOR INHIBITORS JANSSEN PHARMACEUTICA N.V. (BE) 2005-02-16 EP disclosed
WO-2003097609-A1 N-SUBSTITUTED TRICYCLIC 3-AMINOPYRAZOLES AS PDFG RECEPTOR INHIBITORS JANSSEN PHARMACEUTICA N.V. (BE) 2003-11-27 WO disclosed