SCHEMBL62199

SCHEMBL62199

c1ccc([B-](c2ccccc2)(c2ccccc2)c2ccccc2)cc1.c1ccc([I+]c2ccccc2)cc1

nearest known ligand 0.35

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.35
MEN1 O00255 1/20 0.30
CYP2C19 P33261 1/20 0.30
KMT2A Q03164 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11707018 0.82 ALDH1A1 (0.50) ALDH1A1
Benzene SCHEMBL31091106 0.82 ALDH1A1 (0.50) ALDH1A1
SCHEMBL30445784 0.82 KDM1A (0.39) ALDH1A1MEN1KMT2A
SCHEMBL36560 0.82 ALDH1A1 (0.40) ALDH1A1CYP2C19
SCHEMBL143876 0.82 ALDH1A1 (0.50) ALDH1A1
SCHEMBL3711718 0.81 ALDH1A1 (0.33) ALDH1A1
Fluoride Ion SCHEMBL25292299 0.78 ALDH1A1 (0.39) ALDH1A1CYP2C19
SCHEMBL404594 0.78 ALDH1A1 (0.47) ALDH1A1MEN1KMT2A
SCHEMBL225363 0.78 ALDH1A1 (0.47) ALDH1A1MEN1KMT2A
Silver SCHEMBL333097 0.78 ALDH1A1 (0.47) ALDH1A1MEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 288 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10254646-B2 Composition sensitive to radiation in electromagnetic spectrum ranges for printing purposes, printing plate comprising said composition, use of said composition and image development process IBF INDUSTRIA BRASILEIRA DE FILMES S/A (BR) 2019-04-09 US claimed
US-20160026080-A1 COMPOSITION SENSITIVE TO RADIATION IN ELECTROMAGNETIC SPECTRUM RANGES FOR PRINTING PURPOSES, PRINTING PLATE COMPRISING SAID COMPOSITION, USE OF SAID COMPOSITION AND IMAGE DEVLOPMENT PROCESS IBF INDUSTRIA BRASILEIRA DE FILMES S/A (BR) 2016-01-28 US claimed
EP-2937733-A1 COMPOSITION SENSITIVE TO RADIATION IN ELECTROMAGNETIC SPECTRUM RANGES FOR PRINTING PURPOSES, PRINTING PLATE COMPRISING SAID COMPOSITION, USE OF SAID COMPOSITION AND IMAGE DEVELOPMENT PROCESS IBF - Indústria Brasileira de Filmes S/A (BR) 2015-10-28 EP claimed
US-12517430-B2 Lithographic printing plate precursor ECO3 BV (BE) 2026-01-06 US disclosed
US-12487526-B2 Lithographic printing plate precursor ECO3 BV (BE) 2025-12-02 US disclosed
EP-3875271-B1 A LITHOGRAPHIC PRINTING PLATE PRECURSOR ECO3 BV (BE) 2025-10-15 EP disclosed
EP-4129682-B1 A LITHOGRAPHIC PRINTING PLATE PRECURSOR ECO3 BV (BE) 2025-10-01 EP disclosed
US-12403686-B2 Lithographic printing plate precursor ECO3 BV (BE) 2025-09-02 US disclosed
EP-4171958-B1 LITHOGRAPHIC PRINTING PLATE PRECURSOR, METHOD FOR MAKING A PRINTING PLATE PRECURSOR AND METHOD FOR MAKING A PRINTING PLATE ECO3 BV (BE) 2025-08-13 EP disclosed
EP-3960455-B1 A LITHOGRAPHIC PRINTING PLATE PRECURSOR, A METHOD FOR MAKING A LITHOGRAPHIC PRINTING PLATE PRECURSOR AND A METHOD FOR MAKING A LITHOGRAPHIC PRINTING PLATE ECO3 BV (BE) 2025-08-06 EP disclosed
US-20250199411-A1 Method and Apparatus for Processing a Lithographic Printing Plate Precursor ECO3 BV (BE) 2025-06-19 US disclosed
EP-0719293-A1 LATENT, THERMAL CURE ACCELERATORS FOR EPOXY-AROMATIC AMINE RESINS MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1996-07-03 EP disclosed
WO-1995005411-A2 LATENT, THERMAL CURE ACCELERATORS FOR EPOXY-AROMATIC AMINE RESINS MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1995-02-23 WO disclosed
US-5200529-A Blocked monomer and polymers therefrom for use as photoresists HOECHST CELANESE CORPORATION (US) 1993-04-06 US disclosed
US-5081001-A Blocked monomer and polymers therefrom for use as photoresists HOECHST CELANESE CORPORATION (US) 1992-01-14 US disclosed
US-4962171-A Blocked monomer and polymers therefrom for use as photoresists HOECHST CELANESE CORPORATION (US) 1990-10-09 US disclosed
US-4810613-A Blocked monomer and polymers therefrom for use as photoresists HOECHST CELANESE CORPORATION (US) 1989-03-07 US disclosed
EP-0120601-B1 OXIDATIVE IMAGING MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1988-10-19 EP disclosed
EP-0040978-B1 FIXING OF TETRA(ORGANO)BORATE SALT IMAGING SYSTEMS MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1984-08-01 EP disclosed
US-4343891-A CONVERTING TO COMPOUND HAVING FEWER THAN FOUR CARBON-TO-BORON BONDS MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1982-08-10 US disclosed