Water

Water

SCHEMBL6230760

[Ce+3].[O-2].[OH-]

nearest known ligand 0.00

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

GABRA1GABRA2GABRA3GABRA4GABRA5GABRA6GABRB1GABRB2GABRB3GABRDGABREGABRG1GABRG2GABRG3GABRPGABRQ

The experimentally established mechanism targets of Water. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Water SCHEMBL23002030 1.00
Potassium Ion SCHEMBL8568013 0.87
Ammonia Solution, Strong SCHEMBL2818329 0.87
Water SCHEMBL19326858 0.87
SCHEMBL10578288 0.82
SCHEMBL7544479 0.82
SCHEMBL30882005 0.82
SCHEMBL7548349 0.82
SCHEMBL3455590 0.82
SCHEMBL30692877 0.82

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 27 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115651403-B Flame-retardant cyanate and preparation method thereof 扬州天启新材料股份有限公司 2023-11-10 CN claimed
EP-4605458-A1 STABILIZED POLYETHER-ETHER-KETONE (PEEK) COMPOSITION Treibacher Industrie AG (AT) 2025-08-27 EP disclosed
CN-120051522-A Stable Polyetheretherketone (PEEK) compositions 特莱巴赫工业有限公司 2025-05-27 CN disclosed
CN-119332301-A High-durability composite proton exchange membrane and preparation method thereof 上海恩捷新材料科技有限公司 2025-01-21 CN disclosed
WO-2024185432-A1 GLASS ARTICLE WITH EASY-TO-CLEAN COATING 日本板硝子株式会社 2024-09-12 WO disclosed
WO-2024185431-A1 GLASS ARTICLE WITH EASY-CLEAN COATING AND METHOD FOR PRODUCING GLASS ARTICLE WITH EASY-CLEAN COATING 日本板硝子株式会社 2024-09-12 WO disclosed
WO-2024083750-A1 STABILIZED POLYETHER-ETHER-KETONE (PEEK) COMPOSITION TREIBACHER INDUSTRIE AG (AT) 2024-04-25 WO disclosed
EP-4357399-A1 STABILIZED POLYETHER-ETHER-KETONE (PEEK) COMPOSITION Treibacher Industrie AG (AT) 2024-04-24 EP disclosed
CN-117396239-A Sorbent regeneration cartridge for dialysis 迪亚利蒂股份有限公司 2024-01-12 CN disclosed
CN-115651403-B Flame-retardant cyanate and preparation method thereof 扬州天启新材料股份有限公司 2023-11-10 CN disclosed
US-20180304235-A1 ZIRCONIA-BASED COMPOSITIONS FOR USE AS THREE WAY CATALYSTS MAGNESIUM ELEKTRON LIMITED (GB) 2018-10-25 US disclosed
EP-3368481-A1 ZIRCONIA-BASED COMPOSITIONS FOR USE AS THREE WAY CATALYSTS Magnesium Elektron Limited (GB) 2018-09-05 EP disclosed
CN-1699444-A Polishing compositions for controlling metal interconnect removal rate in semiconductor wafers ROHM & HAAS ELECT MAT (US) 2005-11-23 CN disclosed
EP-0952494-B1 Black non-magnetic composite particles for black toner and black toner containing the same TODA KOGYO CORP (JP) 2005-04-06 EP disclosed
US-6491837-B1 MIXTURE OF PARTICLES; NITRIC ACID OR ALUMINUM-, NICKEL-, MAGNESIUM-, ZINC-, OR AMMONIUM NITRATE OXIDIZER; CO-OXIDIZER; AND WATER; NICKEL-PLATED HARD DISK DRIVES PRAXAIR S.T. TECHNOLOGY, INC. 2002-12-10 US disclosed
EP-1118647-A1 Polishing slurry Praxair S.T. Technology, Inc. (US) 2001-07-25 EP disclosed
US-6251555-B1 MIXTURE OF OXIDES AND POLYSILOXANES TODA KOGYO CORPORATION (JP) 2001-06-26 US disclosed
US-6130017-A Black non-magnetic composite particles for black toner and black toner using the same TODA KOGYO CORPORATION (JP) 2000-10-10 US disclosed
EP-0952494-A2 Black non-magnetic composite particles for black toner and black toner using the same TODA KOGYO CORP. (JP) 1999-10-27 EP disclosed
EP-0950926-A2 Black magnetic composite particles for black magnetic toner and black magnetic toner using the same TODA KOGYO CORP. (JP) 1999-10-20 EP disclosed