Triaziquone

Triaziquone

SCHEMBL6243103

CC(S)CC(=O)O.O=C1C=C(N2CC2)C(=O)C(N2CC2)=C1N1CC1

nearest known ligand 0.36

Full drug profile on Sugi Atlas →

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
DNMT1 P26358 1/20 0.36
TP53 P04637 1/20 0.34
MAPT P10636 1/20 0.34
STAT3 P40763 1/20 0.34
HTT P42858 1/20 0.34
SMN1; SMN2 Q16637 1/20 0.34
ITGB3 P05106 1/20 0.31
ITGA2B P08514 1/20 0.31
NSD2 O96028 2/20 0.31
APAF1 O14727 1/20 0.31
TDP2 O95551 1/20 0.31
HKDC1 Q2TB90 1/20 0.31
KDM4E B2RXH2 1/20 0.30
TTR P02766 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Triaziquone SCHEMBL19976110 0.87 DNMT1 (0.36) DNMT1TP53MAPTSTAT3HTT
Triaziquone SCHEMBL112498 0.85 DNMT1 (0.39) DNMT1TP53MAPTSTAT3HTT
Triaziquone SCHEMBL10527880 0.85 HTT (0.36) DNMT1TP53MAPTSTAT3HTT
Triaziquone SCHEMBL11545270 0.84 DNMT1 (0.42) DNMT1TP53MAPTSTAT3HTT
Triaziquone SCHEMBL11583629 0.82 DNMT1 (0.41) DNMT1TP53MAPTSTAT3HTT
Triaziquone SCHEMBL8965684 0.82 HTT (0.39) DNMT1TP53MAPTSTAT3HTT
Triaziquone SCHEMBL983045 0.82 DNMT1 (0.38) DNMT1TP53MAPTSTAT3HTT
Triaziquone SCHEMBL4745473 0.82 SMN1; SMN2 (0.43) DNMT1TP53MAPTSTAT3HTT
Triaziquone SCHEMBL6535620 0.81 DNMT1 (0.40) DNMT1TP53MAPTSTAT3HTT
Triaziquone SCHEMBL9016339 0.81 DNMT1 (0.36) DNMT1TP53MAPTSTAT3HTT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 615 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-118244576-A Photosensitive resin composition and cured film thereof 罗门哈斯电子材料韩国有限公司 2024-06-25 CN claimed
WO-2024079597-A1 METHOD FOR THREE-DIMENSIONAL PRINTING OF FIBER COMPOSITE MATERIALS MOI COMPOSITES S.R.L. (IT) 2024-04-18 WO claimed
CN-117757349-A Waterproof UV (ultraviolet) coating and preparation method thereof 韦尔通科技股份有限公司 2024-03-26 CN claimed
CN-114345273-B Preparation method of photo-curing composition 南京恒桥化学技术材料有限公司 2024-03-08 CN claimed
CN-117143551-B Low-metal corrosion, high-weather-resistance, high-strength and low-temperature rapid curing adhesive and preparation method thereof 信泰永合(烟台)新材料有限公司 2024-01-09 CN claimed
CN-117229747-A Ultraviolet light curing adhesive capable of automatically falling off after boiling in water, and preparation method and application thereof 韦尔通科技股份有限公司 2023-12-15 CN claimed
CN-117143551-A Low-metal corrosion, high-weather-resistance, high-strength and low-temperature rapid curing adhesive and preparation method thereof 信泰永合(烟台)新材料有限公司 2023-12-01 CN claimed
CN-113999637-B Single-component low-temperature epoxy adhesive and preparation method thereof 韦尔通科技股份有限公司 2023-08-04 CN claimed
CN-114929796-A Latex composition, molded article, and method for producing molded article 昭和电工株式会社 2022-08-19 CN claimed
CN-114426787-A Active energy ray-curable composition 阪田油墨股份有限公司 2022-05-03 CN claimed
CN-113260909-A Liquid crystal aligning agent, liquid crystal alignment film, and liquid crystal display element 日产化学株式会社 2021-08-13 CN claimed
WO-2021141011-A1 LATEX COMPOSITION, MOLDED BODY AND METHOD FOR PRODUCING MOLDED BODY 昭和電工株式会社 2021-07-15 WO claimed
CN-108779191-B Active energy ray-curable composition and cured product thereof 昭和电工株式会社 2021-06-22 CN claimed
CN-111971117-A Thiol-epoxide based aerogels 汉高股份有限及两合公司 2020-11-20 CN claimed
CN-111655750-A Thiourethane-based aerogels 汉高股份有限及两合公司 2020-09-11 CN claimed
CN-107001632-B Active energy ray-curable composition and use thereof 昭和电工株式会社 2020-06-19 CN claimed
CN-111187379-A Composition for forming quantum dot layer, quantum dot film, backlight unit, and liquid crystal display 新亚T&C公司 2020-05-22 CN claimed
CN-104823108-B Negative photosensitive resin composition, resin cured film, partition wall, and optical element AGC株式会社 2020-02-21 CN claimed
EP-1478668-A2 THIOL COMPOUND, PHOTOPOLYMERIZATION INITIATOR COMPOSITION AND PHOTOSENSITIVE COMPOSITION Showa Denko K.K. (JP) 2004-11-24 EP claimed
WO-2003072614-A2 THIOL COMPOUND, PHOTOPOLYMERIZATION INITIATOR COMPOSITION AND PHOTOSENSITIVE COMPOSITION SHOWA DENKO K.K. (JP) 2003-09-04 WO claimed