SCHEMBL6243255

SCHEMBL6243255

C=C(OCCOCCO)C(=O)OC

nearest known ligand 0.42

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 3/20 0.42
KMT2A Q03164 3/20 0.42
THRB P10828 2/20 0.40
TSHR P16473 6/20 0.39
MAPK1 P28482 1/20 0.39
ALDH1A1 P00352 5/20 0.37
TP53 P04637 2/20 0.36
HIF1A Q16665 2/20 0.36
HSD17B10 Q99714 1/20 0.36
HTT P42858 1/20 0.35
MAPT P10636 1/20 0.35
EPHX2 P34913 1/20 0.33
ACHE P22303 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27499880 1.00 MEN1 (0.42) MEN1KMT2ATHRBTSHRMAPK1
SCHEMBL6826218 1.00 MEN1 (0.42) MEN1KMT2ATHRBTSHRMAPK1
SCHEMBL863788 0.88 ALDH1A1 (0.42) KMT2ATHRBTSHRALDH1A1HSD17B10
SCHEMBL27721017 0.86 THRB (0.41) MEN1KMT2ATHRBTSHRALDH1A1
SCHEMBL27721014 0.86 THRB (0.41) MEN1KMT2ATHRBTSHRALDH1A1
SCHEMBL27766585 0.86 ALDH1A1 (0.41) KMT2ATHRBTSHRALDH1A1HSD17B10
SCHEMBL28963874 0.86 MEN1 (0.48) MEN1KMT2ATHRBTSHRMAPK1
SCHEMBL9184473 0.85 THRB (0.44) MEN1KMT2ATHRBTSHRMAPK1
SCHEMBL9190025 0.85 THRB (0.44) MEN1KMT2ATHRBTSHRMAPK1
SCHEMBL138942 0.85 THRB (0.44) MEN1KMT2ATHRBTSHRMAPK1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 394 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-108883309-A Non-aqueous topical compositions comprising halogenated salicylanilides 德克抗生素股份公司 2018-11-23 CN claimed
CN-106497230-B It is a kind of to utilize the digital printing UV inks for regulating and controlling resin 传美讯电子科技(珠海)有限公司 2018-02-13 CN claimed
CN-102947243-B The reinforcing mortar of free redical polymerization with silane additives 费希尔厂有限责任两合公司 2017-09-05 CN claimed
CN-106497230-A A kind of digital printing UV inks using regulation and control resin 传美讯电子科技(珠海)有限公司 2017-03-15 CN claimed
CN-106281052-A A kind of photocuring Adhesive composition 北京鼎材科技有限公司 2017-01-04 CN claimed
CN-104031366-B Cellulose coupling nano-metal-oxide strengthens poly-lactic acid material and preparation method thereof CHONGQING UNIVERSITY (CN) 2016-05-04 CN claimed
CN-101534870-B Hydrogel wound dressing and biomaterials formed in situ and their uses ULURU INC 2015-04-08 CN claimed
CN-1867734-A Temporary wet strength additives PROCTER & GAMBLE (US) 2006-11-22 CN claimed
US-5863989-A ACRYLATE-CONTAINING ADHESIVES, LOW ODOR, DURABILITY DENKI KAGAKU KOGYO KABUSHIKI KAISHA (JP) 1999-01-26 US claimed
WO-2025036743-A1 THERMO-CURABLE GEL COAT RESIN COMPOSITION ALLNEX BELGIUM, S.A. (BE) 2025-02-20 WO disclosed
EP-4509541-A1 THERMO-CURABLE RESIN COMPOSITION Allnex Belgium, S.A. (BE) 2025-02-19 EP disclosed
CN-110831991-B Copolymers based on poly (meth) acrylamide containing phosphorylcholine 爱尔康公司 2022-05-24 CN disclosed
WO-2022102493-A1 COPOLYMER FOR ANTIFOULING COATING COMPOSITIONS, AND ANTIFOULING COATING COMPOSITION 日東化成株式会社 2022-05-19 WO disclosed
US-20210253895-A1 AQUEOUS SURFACE COATING SOLUTION COMPOSITION AND POLYESTER FILM STRUCTURE NAN YA PLASTICS CORPORATION (TW) 2021-08-19 US disclosed
CN-1243601-A Mounting structure and mounting process for semiconductor devices LOCTITE CORP (US) 2000-02-02 CN disclosed
US-5858616-A Photosensitive resin composition, photosensitive film and process for preparing fluorescent pattern using the same, and phosphor subjected to surface treatment and process for preparing the same HITACHI CHEMICAL COMPANY, LTD. (JP) 1999-01-12 US disclosed
EP-0785565-A1 Phosphor pattern, processes for preparing the same and photosensitive element to be used for the same Hitachi Chemical Co., Ltd. (JP) 1997-07-23 EP disclosed
EP-0768573-A1 Phosphor-containing photosensitive resin composition for use in manufacturing plasma display panel Hitachi Chemical Co., Ltd. (JP) 1997-04-16 EP disclosed
CN-1107276-A Lithographic printing original plate and method for making plate using the same ASAHI CHEMICAL IND (JP) 1995-08-23 CN disclosed
US-3976614-A Inherrently water-dispersible, selfcrosslinking interpolymers useful as coatings THE DOW CHEMICAL COMPANY (US) 1976-08-24 US disclosed