SCHEMBL6246796

SCHEMBL6246796

Cc1cccc2cc3ccccc3c(Oc3ccccc3)c12

nearest known ligand 0.45

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP1A2 P05177 5/20 0.45
ALDH1A1 P00352 3/20 0.45
HPGD P15428 2/20 0.45
HSD17B10 Q99714 2/20 0.45
KDM4E B2RXH2 2/20 0.43
MAPT P10636 2/20 0.43
GLA P06280 1/20 0.43
KMT2A Q03164 1/20 0.43
CYP2A6 P11509 2/20 0.41
ERBB2 P04626 1/20 0.40
FYN P06241 1/20 0.40
MAOA P21397 1/20 0.40
ACHE P22303 1/20 0.40
AHR P35869 1/20 0.40
LMNA P02545 2/20 0.38
HTT P42858 1/20 0.38
L3MBTL1 Q9Y468 1/20 0.37
TUBB4A P04350 1/20 0.36
TUBB P07437 1/20 0.36
TUBA3C P0DPH7 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28627795 0.80 KDM4E (0.63) CYP1A2ALDH1A1HPGDHSD17B10KDM4E
SCHEMBL28677270 0.75 KDM4E (0.49) CYP1A2ALDH1A1HPGDHSD17B10KDM4E
SCHEMBL27615297 0.75 KDM4E (0.51) CYP1A2ALDH1A1HPGDHSD17B10KDM4E
SCHEMBL27615313 0.75 KMT2A (0.44) CYP1A2ALDH1A1HPGDHSD17B10KDM4E
SCHEMBL3700827 0.74 CYP1A2 (0.41) CYP1A2ALDH1A1HPGDHSD17B10MAPT
SCHEMBL11578247 0.74 MAPT (0.44) CYP1A2ALDH1A1KDM4EMAPTGLA
SCHEMBL10524314 0.73 CYP1A2 (0.55) CYP1A2ALDH1A1HPGDHSD17B10MAPT
SCHEMBL10695350 0.73 ALDH1A1 (0.41) CYP1A2ALDH1A1HPGDHSD17B10KDM4E
SCHEMBL3694800 0.73 ALDH1A1 (0.41) CYP1A2ALDH1A1HPGDHSD17B10KDM4E
SCHEMBL9487846 0.72 LTA4H (0.52) KDM4EMAPTGLAKMT2AMAOA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1366511-B1 METAL PATTERN FORMATION ATOTECH DEUTSCHLAND GMBH (DE) 2005-08-10 EP disclosed
US-20040069636-A1 Metal pattern formation ATOTECH DEUTSCHLAND GMBH (DE) 2004-04-15 US disclosed
EP-1366511-A1 METAL PATTERN FORMATION ATOTECH Deutschland GmbH (DE) 2003-12-03 EP disclosed
US-6593249-B2 Method for forming a metal pattern on a dielectric substrate ATOTECH DEUTSCHLAND GMBH (DE) 2003-07-15 US disclosed
US-20030036288-A1 Method for forming a metal pattern on a dielectric substrate ATOTECH DEUTSCHLAND GMBH & CO. KG (F/K/A ATOTECH DEUTSCHLAND GMBH) (DE) 2003-02-20 US disclosed
WO-2002071466-A1 METAL PATTERN FORMATION ATOTECH DEUTSCHLAND GMBH (DE) 2002-09-12 WO disclosed