Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 1/20 | 0.33 |
| ▸ | LTA4H | P09960 | 2/20 | 0.32 |
| ▸ | PCSK9 | Q8NBP7 | 1/20 | 0.32 |
| ▸ | PTGS2 | P35354 | 1/20 | 0.31 |
| ▸ | KCNN4 | O15554 | 1/20 | 0.31 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.30 |
| ▸ | HPGD | P15428 | 1/20 | 0.30 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.30 |
| ▸ | SIGMAR1 | Q99720 | 1/20 | 0.30 |
| ▸ | CES2 | O00748 | 1/20 | 0.30 |
| ▸ | CES1 | P23141 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL225939 | 0.88 | TSHR (0.38) | TSHRLTA4HPCSK9PTGS2SMN1; SMN2 | |
| SCHEMBL8756194 | 0.86 | TSHR (0.35) | TSHRLTA4HPCSK9PTGS2SMN1; SMN2 | |
| Ammonia Solution, Strong SCHEMBL9771941 | 0.86 | TSHR (0.37) | TSHRLTA4HPCSK9PTGS2SMN1; SMN2 | |
| SCHEMBL7092511 | 0.86 | TSHR (0.37) | TSHRLTA4HPCSK9PTGS2SMN1; SMN2 | |
| SCHEMBL5078343 | 0.86 | TSHR (0.37) | TSHRLTA4HPCSK9PTGS2SMN1; SMN2 | |
| SCHEMBL8772308 | 0.86 | TSHR (0.37) | TSHRLTA4HPCSK9PTGS2SMN1; SMN2 | |
| Lithium Ion SCHEMBL503758 | 0.86 | TSHR (0.37) | TSHRLTA4HPCSK9PTGS2SMN1; SMN2 | |
| Ammonia Solution, Strong SCHEMBL8571366 | 0.84 | TSHR (0.36) | TSHRLTA4HPCSK9PTGS2SMN1; SMN2 | |
| SCHEMBL1130143 | 0.82 | KCNH2 (0.33) | SMN1; SMN2 | |
| SCHEMBL8567042 | 0.82 | SIGMAR1 (0.36) | TSHRLTA4HPCSK9PTGS2SMN1; SMN2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 222 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10254646-B2 | Composition sensitive to radiation in electromagnetic spectrum ranges for printing purposes, printing plate comprising said composition, use of said composition and image development process | IBF INDUSTRIA BRASILEIRA DE FILMES S/A (BR) | 2019-04-09 | — | — | US | claimed |
| US-20160026080-A1 | COMPOSITION SENSITIVE TO RADIATION IN ELECTROMAGNETIC SPECTRUM RANGES FOR PRINTING PURPOSES, PRINTING PLATE COMPRISING SAID COMPOSITION, USE OF SAID COMPOSITION AND IMAGE DEVLOPMENT PROCESS | IBF INDUSTRIA BRASILEIRA DE FILMES S/A (BR) | 2016-01-28 | — | — | US | claimed |
| EP-2937733-A1 | COMPOSITION SENSITIVE TO RADIATION IN ELECTROMAGNETIC SPECTRUM RANGES FOR PRINTING PURPOSES, PRINTING PLATE COMPRISING SAID COMPOSITION, USE OF SAID COMPOSITION AND IMAGE DEVELOPMENT PROCESS | IBF - Indústria Brasileira de Filmes S/A (BR) | 2015-10-28 | — | — | EP | claimed |
| US-20240227382-A1 | A Lithographic Printing Plate Precursor | ECO3 BV (BE) | 2024-07-11 | — | — | US | disclosed |
| US-20240109281-A1 | A Lithographic Printing Plate Precursor | AGFA OFFSET BV (BE) | 2024-04-04 | — | — | US | disclosed |
| EP-3587112-B1 | A LITHOGRAPHIC PRINTING PLATE PRECURSOR | ECO3 BV (BE) | 2024-04-03 | — | — | EP | disclosed |
| US-11845259-B2 | Lithographic printing plate precursor | AGFA OFFSET BV (BE) | 2023-12-19 | — | — | US | disclosed |
| US-20230382100-A1 | A Lithographic Printing Plate Precursor | AGFA OFFSET BV (BE) | 2023-11-30 | — | — | US | disclosed |
| US-11813838-B2 | Lithographic printing plate precursor | AGFA OFFSET BV (BE) | 2023-11-14 | — | — | US | disclosed |
| EP-3892469-B1 | LITHOGRAPHIC PRINTING PLATE PRECURSOR | ECO3 BV (BE) | 2023-11-08 | — | — | EP | disclosed |
| US-20230350291-A1 | A Lithographic Printing Plate Precursor | AGFA OFFSET BV (BE) | 2023-11-02 | — | — | US | disclosed |
| US-6548222-B2 | Cationic polymerizable monomer, a cationic initiator, and an infrared absorber; hardens upon exposure to infrared radiation and soluble or dispersable in ink and/or fountain solution | ROHM AND HAAS ELECTRONIC MATERIALS LLC | 2003-04-15 | — | — | US | disclosed |
| US-6495310-B2 | OVERCOAT IS SUBSTANTIALLY CONFORMALLY COATED ON THE PHOTOSENSITIVE LAYER SURFACE SO THAT THE SURFACE OF THE OVERCOAT HAS PEAKS AND VALLEYS SUBSTANTIALLY CORRESPONDING TO THE MAJOR PEAKS AND VALLEYS OF THE SUBSTRATE MICROSCOPIC | ROHM AND HAAS ELECTRONIC MATERIALS LLC | 2002-12-17 | — | — | US | disclosed |
| US-6455207-B1 | COLOR FILTER WITH PIXELS ON TRANSPARENT SUBSTRATE COMPRISING PHOTOSENSITIVE COLORING COMPOSITION COMPRISING TRANSPARENT POLYMER SOLUBLE IN SOLVENT OR AQUEOUS ALKALINE SOLUTION, UNSATURATED COMPOUND, PIGMENT, PHOTOPOLYMERIZATION INITIATOR | SHOWA DENKO KABUSHIKI KAISHA (JP) | 2002-09-24 | — | — | US | disclosed |
| US-20020098447-A1 | Overcoat is substantially conformally coated on the photosensitive layer surface so that the surface of the overcoat has peaks and valleys substantially corresponding to the major peaks and valleys of the substrate microscopic | ROHM AND HAAS ELECTRONIC MATERIALS LLC | 2002-07-25 | — | — | US | disclosed |
| US-20020068240-A1 | Cationic polymerizable monomer, a cationic initiator, and an infrared absorber; hardens upon exposure to infrared radiation and soluble or dispersable in ink and/or fountain solution | ROHM AND HAAS ELECTRONIC MATERIALS LLC | 2002-06-06 | — | — | US | disclosed |
| EP-1031579-A2 | Photopolymerization initiator for color filter, photosensitive coloring composition, and color filter | SHOWA DENKO KABUSHIKI KAISHA (JP) | 2000-08-30 | — | — | EP | disclosed |
| EP-0555058-B1 | (Oxo)sulfonium complex, polymerizable composition containing the complex, and method of polymerizing composition | TOYO INK MFG CO (JP) | 1997-05-07 | — | — | EP | disclosed |
| US-5500453-A | INITIATOR FOR PHOTOSENSITIVE FREE RADICAL CURING/ POLYMERIZATION OF UNSATURATED COMPOUNDS | TOYO INK MANUFACTURING CO., LTD. (JP) | 1996-03-19 | — | — | US | disclosed |
| EP-0555058-A1 | (Oxo)sulfonium complex, polymerizable composition containing the complex, and method of polymerizing composition | TOYO INK MANUFACTURING CO., LTD. (JP) | 1993-08-11 | — | — | EP | disclosed |