Lithium Ion

Lithium Ion

SCHEMBL503758

CCCC[B-](c1ccccc1)(c1ccccc1)c1ccccc1.[Li+]

nearest known ligand 0.43

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

GSK3AGSK3BIMPA1

The experimentally established mechanism targets of Lithium Ion. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
TSHR P16473 1/20 0.37
LTA4H P09960 2/20 0.36
PCSK9 Q8NBP7 1/20 0.36
PTGS2 P35354 1/20 0.35
CES2 O00748 2/20 0.34
CES1 P23141 2/20 0.34
SMN1; SMN2 Q16637 1/20 0.34
SIGMAR1 Q99720 1/20 0.34
TP53 P04637 1/20 0.33
HSD11B1 P28845 1/20 0.33
TDP1 Q9NUW8 1/20 0.33
GPR84 Q9NQS5 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL225939 0.98 TSHR (0.38) TSHRLTA4HPCSK9PTGS2CES2
Ammonia Solution, Strong SCHEMBL9771941 0.95 TSHR (0.37) TSHRLTA4HPCSK9PTGS2CES2
SCHEMBL7092511 0.95 TSHR (0.37) TSHRLTA4HPCSK9PTGS2CES2
SCHEMBL5078343 0.95 TSHR (0.37) TSHRLTA4HPCSK9PTGS2CES2
SCHEMBL8772308 0.95 TSHR (0.37) TSHRLTA4HPCSK9PTGS2CES2
Ammonia Solution, Strong SCHEMBL8571366 0.93 TSHR (0.36) TSHRLTA4HPCSK9PTGS2CES2
Tetramethylammonium Ion SCHEMBL1276928 0.91 DNM1 (0.39) TSHRLTA4HPCSK9PTGS2CES2
SCHEMBL8756194 0.91 TSHR (0.35) TSHRLTA4HPCSK9PTGS2CES2
SCHEMBL8567042 0.91 SIGMAR1 (0.36) TSHRLTA4HPCSK9PTGS2CES2
SCHEMBL4532567 0.91 LTA4H (0.38) TSHRLTA4HPCSK9CES2CES1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 76 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4310976-A1 NON-AQUEOUS ELECTROLYTE SOLUTION AND HIGH-VOLTAGE LITHIUM BATTERY CONTAINING SAME Zhangjiagang Guotai-Huarong New Chemical Materials Co., Ltd (CN) 2024-01-24 EP claimed
US-20240014444-A1 NON-AQUEOUS ELECTROLYTE SOLUTION AND LITHIUM BATTERY ZHANGJIAGANG GUOTAI-HUARONG NEW CHEMICAL MATERIALS CO., LTD (CN) 2024-01-11 US claimed
EP-4199168-A1 NON-AQUEOUS ELECTROLYTE SOLUTION AND LITHIUM BATTERY Zhangjiagang Guotai-Huarong New Chemical Materials Co., Ltd (CN) 2023-06-21 EP claimed
JP-9328487-A None JP disclosed
WO-2026100697-A1 PHOTOCURABLE EPISULFIDE COMPOSITION, CURED PRODUCT, LAMINATE, AND METHOD FOR PRODUCING CURED PRODUCT 三井化学株式会社 2026-05-15 WO disclosed
EP-4310976-A1 NON-AQUEOUS ELECTROLYTE SOLUTION AND HIGH-VOLTAGE LITHIUM BATTERY CONTAINING SAME Zhangjiagang Guotai-Huarong New Chemical Materials Co., Ltd (CN) 2024-01-24 EP disclosed
US-20240014444-A1 NON-AQUEOUS ELECTROLYTE SOLUTION AND LITHIUM BATTERY ZHANGJIAGANG GUOTAI-HUARONG NEW CHEMICAL MATERIALS CO., LTD (CN) 2024-01-11 US disclosed
EP-4199168-A1 NON-AQUEOUS ELECTROLYTE SOLUTION AND LITHIUM BATTERY Zhangjiagang Guotai-Huarong New Chemical Materials Co., Ltd (CN) 2023-06-21 EP disclosed
US-20230112218-A1 THREE-COMPONENT PHOTO INITIATING SYSTEMS FOR THE RED AND NEAR INFRARED CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE (FR) 2023-04-13 US disclosed
CN-115873224-A Catalyst composition for polyester, hydrolysis-resistant polyester film and preparation method 中国石油化工股份有限公司 2023-03-31 CN disclosed
CN-115772257-A Modifier for high-heat-resistance polyester, preparation method of modifier, polyester preparation method adopting modifier and polyester obtained by modifier 中国石油化工股份有限公司 2023-03-10 CN disclosed
US-20030212162-A1 Photopolymerization using photoinitiators TOYO INK MFG. CO., LTD. (JP) 2003-11-13 US disclosed
JP-2000212195-A PRODUCTION OF ORGANIC BORON COMPOUND HOKKO CHEM IND CO LTD 2000-08-02 JP disclosed
JP-H09328487-A BIPYRIDINIUM COMPLEX TOYO INK MFG CO LTD 1997-12-22 JP disclosed
EP-0555058-B1 (Oxo)sulfonium complex, polymerizable composition containing the complex, and method of polymerizing composition TOYO INK MFG CO (JP) 1997-05-07 EP disclosed
US-5500453-A INITIATOR FOR PHOTOSENSITIVE FREE RADICAL CURING/ POLYMERIZATION OF UNSATURATED COMPOUNDS TOYO INK MANUFACTURING CO., LTD. (JP) 1996-03-19 US disclosed
EP-0353030-B1 Photopolymerization initiator and photosensitive composition employing the same CANON KK (JP) 1995-03-15 EP disclosed
EP-0555058-A1 (Oxo)sulfonium complex, polymerizable composition containing the complex, and method of polymerizing composition TOYO INK MANUFACTURING CO., LTD. (JP) 1993-08-11 EP disclosed
US-5124235-A Photopolymerization initiator and photosensitive composition employing the same CANON KABUSHIKI KAISHA (JP) 1992-06-23 US disclosed
EP-0353030-A2 Photopolymerization initiator and photosensitive composition employing the same CANON KABUSHIKI KAISHA (JP) 1990-01-31 EP disclosed